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公开(公告)号：US20190313519A1
公开(公告)日：2019-10-10
申请号：US16434196
申请日：2019-06-07
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU , Osamu WAKABAYASHI
Abstract: An extreme ultraviolet light generation system includes: a target supply unit configured to output a target toward a predetermined region; a drive laser configured to output a drive laser beam in a first duration; a guide laser configured to output a guide laser beam; a beam combiner configured to substantially align the optical path axes of the drive and guide laser beams and output the laser beams; a laser beam focusing optical system configured to focus the laser beams output from the beam combiner to the predetermined region; an actuator configured to change the focusing positions of the laser beams through the laser beam focusing optical system; an optical sensor configured to detect reflected light of the guide laser beam from the target; and a control unit configured to control the actuator so that the light amount of the reflected light thus detected increases in a second duration.
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公开(公告)号：US20190283177A1
公开(公告)日：2019-09-19
申请号：US16429091
申请日：2019-06-03
Applicant: Gigaphoton Inc.
Inventor： Kouji KAKIZAKI , Osamu WAKABAYASHI
IPC: B23K26/0622 , H03K7/08 , H01S3/094 , G02B21/36
Abstract: A laser processing system includes a wavelength tunable laser apparatus capable of changing the wavelength of pulsed laser light to be outputted, an optical system irradiating a workpiece with the pulsed laser light, a reference wavelength acquisition section acquiring a reference wavelength corresponding to photon absorption according to the material of the workpiece, a laser processing controller controlling the wavelength tunable laser apparatus to perform preprocessing before final processing performed on the workpiece, changes the wavelength of the pulsed laser light over a predetermined range containing the reference wavelength, and performs wavelength search preprocessing at a plurality of wavelengths, a processed state measurer measuring a processed state on a wavelength basis achieved by the wavelength search preprocessing performed at the plurality of wavelengths, and an optimum wavelength determination section assessing the processed state on a wavelength basis to determine an optimum wavelength used in the final processing.
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公开(公告)号：US20190074655A1
公开(公告)日：2019-03-07
申请号：US16178382
申请日：2018-11-01
Applicant: Gigaphoton Inc.
Inventor： Natsushi SUZUKI , Osamu WAKABAYASHI , Hiroaki TSUSHIMA , Masanori YASHIRO
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US20180351320A1
公开(公告)日：2018-12-06
申请号：US16058180
申请日：2018-08-08
Applicant: GIGAPHOTON INC.
Inventor： Tatsuya YANAGIDA , Osamu WAKABAYASHI
CPC classification number: H01S3/10061 , H01S3/08054 , H01S3/08059 , H01S3/2308 , H01S3/2383 , H01S2301/20 , H05G2/003 , H05G2/008
Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.
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公开(公告)号：US20180242441A1
公开(公告)日：2018-08-23
申请号：US15956983
申请日：2018-04-19
Applicant: Gigaphoton Inc.
Inventor： Tatsuya YANAGIDA , Osamu WAKABAYASHI
IPC: H05G2/00 , H01S3/223 , H01S3/23 , H01S3/107 , H01S3/06 , H01S3/08 , H01S3/11 , H01S3/16 , H01S3/00
Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.
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Patent Agency Ranking
公开(公告)号：US20180146536A1
公开(公告)日：2018-05-24
申请号：US15860137
申请日：2018-01-02
Applicant: Gigaphoton Inc.
Inventor： Toru SUZUKI , Tamotsu ABE , Osamu WAKABAYASHI , Tatsuya YANAGIDA
CPC classification number: H05G2/008 , G03F7/70033 , H05G2/003 , H05G2/005
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.
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公开(公告)号：US20180052059A1
公开(公告)日：2018-02-22
申请号：US15800329
申请日：2017-11-01
Applicant: Gigaphoton Inc.
Inventor： Masato MORIYA , Osamu WAKABAYASHI , Yoshinobu WATABE
CPC classification number: G01J11/00 , G01J1/0414 , G01J1/0429 , G01J1/0477 , G01J1/4257 , G01J4/04 , G01J2001/4261 , G02B5/3066 , G02B27/148 , H01S3/0014 , H01S3/134 , H01S3/2366
Abstract: A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF2.
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公开(公告)号：US20170365475A1
公开(公告)日：2017-12-21
申请号：US15679022
申请日：2017-08-16
Applicant: Kyushu University , Gigaphoton Inc.
Inventor： Tomoyuki OHKUBO , Hiroshi IKENOUE , Akihiro IKEDA , Tanemasa ASANO , Osamu WAKABAYASHI
CPC classification number: H01L21/0455 , H01L21/268 , H01S3/005 , H01S3/0057 , H01S3/09702 , H01S3/10038 , H01S3/10046 , H01S3/225
Abstract: The laser doping apparatus may irradiate a predetermined region of a semiconductor material with a pulse laser beam to perform doping. The laser doping apparatus may include: a solution supplying system configured to supply dopant-containing solution to the predetermined region, and a laser system including at least one laser device configured to output the pulse laser beam to be transmitted by the dopant-containing solution, and a time-domain pulse waveform changing apparatus configured to control a time-domain pulse waveform of the pulse laser beam.
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19.发明申请SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS 审中-公开用于产生极光紫外线灯和激光装置的系统和方法公开(公告)号：US20170063020A1
公开(公告)日：2017-03-02
申请号：US15352543
申请日：2016-11-15
Applicant: GIGAPHOTON INC.
Inventor： Tatsuya YANAGIDA , Osamu WAKABAYASHI
CPC classification number: H01S3/10061 , H01S3/08054 , H01S3/08059 , H01S3/2308 , H01S3/2383 , H01S2301/20 , H05G2/003 , H05G2/008
Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.
Abstract translation: 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。
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公开(公告)号：US20170055336A1
公开(公告)日：2017-02-23
申请号：US15347716
申请日：2016-11-09
Applicant: GIGAPHOTON INC.
Inventor： Shinji NAGAI , Tamotsu ABE , Hitoshi NAGANO , Osamu WAKABAYASHI
CPC classification number: H05G2/008 , B23K10/00 , B23K26/12 , B23K26/36 , G03B27/32 , G03F7/70025 , G03F7/70033 , G21K1/067 , G21K5/00 , G21K5/02 , G21K2201/064 , H05G2/005
Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 设置在蚀刻气体通过的室的蚀刻气体引入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。
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