公开(公告)号：US20220084780A1

公开(公告)日：2022-03-17

申请号：US17533078

申请日：2021-11-22

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/22 ,  H01J37/244

Abstract: An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.

公开(公告)号：US20210142979A1

公开(公告)日：2021-05-13

申请号：US17026044

申请日：2020-09-18

Applicant: ASML Netherlands B.V.

Inventor： Frank Nan ZHANG ,  Zhongwei CHEN ,  Yixiang WANG ,  Ying Crystal SHEN

IPC: H01J37/26 ,  H01J37/04 ,  H01J37/28

Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.

公开(公告)号：US20200273662A1

公开(公告)日：2020-08-27

申请号：US16652352

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Qing Jiu CHEN ,  Yixiang WANG

IPC: H01J37/22 ,  G01N21/95 ,  G01N21/956 ,  G02B27/09

Abstract: A system and method for advanced charge control of a light beam is provided. The system comprising a laser source comprising a laser diode for emitting a beam and a beam homogenizer to homogenize the emitted beam. The system and methods further comprise a beam shaper configured to shape the emitted beam using an anamorphic prism group and a driver configured to direct the shaped beam to a specified position on a wafer, wherein the laser source, the beam shaper, and the driver are coaxially aligned.

公开(公告)号：US20230246568A1

公开(公告)日：2023-08-03

申请号：US18132617

申请日：2023-04-10

Applicant: ASML Netherlands B.V.

Inventor： Jan-Gerard Cornelis VAN DER TOORN ,  Jeroen Gertruda Antonius HUINCK ,  Han Willem Hendrik SEVERT ,  Allard Eelco KOOIKER ,  Michael Johannes Christiaan RONDE ,  Arno Maria WELLINK ,  Shibing LIU ,  Ying LUO ,  Yixiang WANG ,  Chia-Yao CHEN ,  Bohang ZHU ,  Jurgen VAN SOEST

IPC: H02N13/00 ,  G03F7/20

CPC classification number: H02N13/00 ,  G03F7/70708 ,  G03F7/70716

Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

公开(公告)号：US20230178406A1

公开(公告)日：2023-06-08

申请号：US17913149

申请日：2021-03-18

Applicant: ASML Netherlands B.V.

Inventor： Yixiang WANG ,  Shibing LIU ,  Ying LUO

IPC: H01L21/683 ,  H01J37/20

CPC classification number: H01L21/6833 ,  H01J37/20 ,  H01J2237/2817 ,  H01J2237/24592 ,  H01J2237/20285

Abstract: An electrostatic chuck control system configured to be utilized during an inspection process of a wafer, the electrostatic chuck control system comprising an electrostatic chuck of a stage configured to be undocked during the inspection process, wherein the electrostatic chuck comprises a plurality of components configured to influence an interaction between the wafer and the electrostatic chuck during the inspection process, a first sensor configured to generate measurement data between at least some of the plurality of components and the wafer, and a controller including circuitry configured to receive the measurement data to determine characteristics of the wafer relative to the electrostatic chuck and to generate adjustment data to enable adjusting, while the stage is undocked, at least some of the plurality of components based on the determined characteristics.

公开(公告)号：US20230096657A1

公开(公告)日：2023-03-30

申请号：US17911398

申请日：2021-02-25

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Yan WANG ,  Liang TANG ,  Yixiang WANG

IPC: H01J37/20 ,  H01J37/244 ,  G01B11/06 ,  H01J37/21 ,  H01J37/22

Abstract: An improved leveling sensor and method for adjusting a sample height in a charged-particle beam inspection system are disclosed. An improved leveling sensor comprises a light source configured to project a first pattern onto a sample and a detector configured to capture an image of a projected pattern after the first pattern is projected on the sample. The first pattern can comprise an irregularity to enable a determination of a vertical displacement of the sample.

公开(公告)号：US20220375715A1

公开(公告)日：2022-11-24

申请号：US17771761

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jian ZHANG ,  Ning YE ,  Yixiang WANG ,  Jie FANG

IPC: H01J37/22 ,  H01J37/28

Abstract: An apparatus for and a method of inspecting a substrate in which a charged particle beam is arranged to impinge on a portion of the substrate and a first light beam having a first wavelength and a second light beam having a second wavelength different from the first wavelength are also arranged to impinge on the portion of the substrate.

公开(公告)号：US20220122803A1

公开(公告)日：2022-04-21

申请号：US17516654

申请日：2021-11-01

Applicant: ASML Netherlands B.V.

Inventor： Yixiang WANG ,  Frank Nan ZHANG

IPC: H01J37/28 ,  G01N23/203 ,  G01N23/2251 ,  H01J37/26

Abstract: Disclosed herein is a method comprising depositing a first amount of electric charges into a region of a sample, during a first time period; depositing a second amount of electric charges into the region, during a second time period; while scanning a probe spot generated on the sample by a beam of charged particles, recording from the probe spot signals representing interactions of the beam of charged particles and the sample; wherein an average rale of deposition during the first time period, and an average rate of deposition during the second time period are different.

公开(公告)号：US20200278524A1

公开(公告)日：2020-09-03

申请号：US16650862

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: G02B21/02 ,  H01J37/22 ,  H01J37/28 ,  G02B13/18 ,  G02B9/00

Abstract: An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive power.

公开(公告)号：US20200211817A1

公开(公告)日：2020-07-02

申请号：US16727706

申请日：2019-12-26

Applicant: ASML Netherlands B.V.

Inventor： Jie FANG ,  Yixiang WANG ,  Qirong ZHANG ,  Haojie ZHANG ,  Jinmei YANG ,  Fenghui ZHU

IPC: H01J37/26 ,  C25F3/14

Abstract: A method of processing a workpiece may include forming a first layer on a first side of a base layer. The base layer may be part of a substrate including a plurality of layers. The method may also include forming a second layer on the first layer. A material of the second layer may include metal. The method may also include forming an opening in the second layer, forming an opening in the first layer by etching, and removing the second layer. The method may include dry etching of the first layer.