公开(公告)号：US20220375715A1

公开(公告)日：2022-11-24

申请号：US17771761

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jian ZHANG ,  Ning YE ,  Yixiang WANG ,  Jie FANG

IPC: H01J37/22 ,  H01J37/28

Abstract: An apparatus for and a method of inspecting a substrate in which a charged particle beam is arranged to impinge on a portion of the substrate and a first light beam having a first wavelength and a second light beam having a second wavelength different from the first wavelength are also arranged to impinge on the portion of the substrate.

公开(公告)号：US20200211817A1

公开(公告)日：2020-07-02

申请号：US16727706

申请日：2019-12-26

Applicant: ASML Netherlands B.V.

Inventor： Jie FANG ,  Yixiang WANG ,  Qirong ZHANG ,  Haojie ZHANG ,  Jinmei YANG ,  Fenghui ZHU

IPC: H01J37/26 ,  C25F3/14

Abstract: A method of processing a workpiece may include forming a first layer on a first side of a base layer. The base layer may be part of a substrate including a plurality of layers. The method may also include forming a second layer on the first layer. A material of the second layer may include metal. The method may also include forming an opening in the second layer, forming an opening in the first layer by etching, and removing the second layer. The method may include dry etching of the first layer.