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11.发明授权公开(公告)号：US11415900B2
公开(公告)日：2022-08-16
申请号：US17022910
申请日：2020-09-16
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Nitesh Pandey , Vasco Tomas Tenner , Willem Marie Julia Marcel Coene , Patrick Warnaar
Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US11143970B2
公开(公告)日：2021-10-12
申请号：US16943296
申请日：2020-07-30
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson Middlebrooks , Markus Gerardus Martinus Maria Van Kraaij , Adrianus Cornelis Matheus Koopman , Stefan Hunsche , Willem Marie Julia Marcel Coene
Abstract: A method and apparatus of detection, registration and quantification of an image is described. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
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13.发明申请Metrology Method and Inspection Apparatus, Lithographic System and Device Manufacturing Method 有权计量方法和检验仪器，平版印刷系统和器件制造方法公开(公告)号：US20160033877A1
公开(公告)日：2016-02-04
申请号：US14824696
申请日：2015-08-12
Applicant: ASML Netherlands B.V.
Inventor： Hendrik Jan Hidde SMILDE , Arno Jan Bleeker , Willem Marie Julia Marcel Coene , Patrick Warnaar , Michael Kubis
CPC classification number: G03F7/70633 , G03F7/70483 , G03F7/70625 , G03F7/70641 , G06N99/005
Abstract: Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus.
Abstract translation: 公开了用于测量由基板上的光刻工艺形成的目标结构的方法。 目标内的光栅结构小于测量光学系统的照明点和视场。 光学系统具有通向光瞳平面成像传感器的第一分支和通向基板平面成像传感器的第二分支。 空间光调制器被布置在光学系统的第二分支的中间光瞳平面中。 SLM赋予可编程的衰减模式，其可用于校正第一和第二照明模式或成像之间的不对称性。 通过使用特定的目标设计和机器学习过程，衰减模式也可以被编程为充当滤波器功能，增强对诸如焦点的特定参数的敏感性。
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公开(公告)号：US10732513B2
公开(公告)日：2020-08-04
申请号：US16561096
申请日：2019-09-05
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson Middlebrooks , Markus Gerardus Martinus Maria Van Kraaij , Adrianus Cornelis Matheus Koopman , Stefan Hunsche , Willem Marie Julia Marcel Coene
Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
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15.发明申请公开(公告)号：US20190107781A1
公开(公告)日：2019-04-11
申请号：US16150879
申请日：2018-10-03
Applicant: Stichting VU , Stichting Nederlandse Wetenschappelijk Onderzoek Instituten , Universiteit van Amsterdam , ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Nitesh Pandey , Vasco Tomas Tenner , Willem Marie Julia Marcel Coene , Patrick Warnaar
Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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Patent Agency Ranking
公开(公告)号：US20220026811A1
公开(公告)日：2022-01-27
申请号：US17497207
申请日：2021-10-08
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson MIDDLEBROOKS , Markus Gerardus Martinus Maria Van Kraaij , Adrianus Cornelis Matheus Koopman , Stefan Hunsche , Willem Marie Julia Marcel Coene
Abstract: A method and apparatus of detection, registration and quantification of an image is described. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
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公开(公告)号：US10890540B2
公开(公告)日：2021-01-12
申请号：US16490091
申请日：2018-03-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Adrianus Cornelis Matheus Koopman , Scott Anderson Middlebrooks , Willem Marie Julia Marcel Coene
IPC: G06F30/398 , G01N21/956 , G03F7/20
Abstract: A method including selecting a shaped feature from a set of shaped features, each shaped feature of the set of shaped features having a set of points on a perimeter of the shape of the shaped feature, creating a plurality of shape context descriptors for the selected shaped feature, wherein each shape context descriptor provides an indication of a location in a shape context descriptor framework of a first focus point of the set of points in relation to a second point of the set of points, and identifying a shaped feature from the set of shaped features having a same or similar shape as the selected shaped feature based on data from the plurality of shape context descriptors.
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18.发明授权公开(公告)号：US10816909B2
公开(公告)日：2020-10-27
申请号：US16150879
申请日：2018-10-03
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Nitesh Pandey , Vasco Tomas Tenner , Willem Marie Julia Marcel Coene , Patrick Warnaar
Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US10607334B2
公开(公告)日：2020-03-31
申请号：US15533614
申请日：2015-11-13
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson Middlebrooks , Markus Gerardus Martinus Maria Van Kraaij , Maxim Pisarenco , Adrianus Cornelis Matheus Koopman , Stefan Hunsche , Willem Marie Julia Marcel Coene
Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
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公开(公告)号：US10585363B2
公开(公告)日：2020-03-10
申请号：US15575069
申请日：2016-03-14
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef , Alessandro Polo , Patricius Aloysius Jacobus Tinnemans , Adrianus Johannes Hendrikus Schellekens , Elahe Yeganegi Dastgerdi , Willem Marie Julia Marcel Coene , Erik Willem Bogaart , Simon Reinald Huisman
Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.
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