Dynamic semiconductor memory device of a twisted bit line system having
improved reliability of readout
    12.
    发明授权
    Dynamic semiconductor memory device of a twisted bit line system having improved reliability of readout 失效
    扭转位线系统的动态半导体存储器件具有改进的读出可靠性

    公开(公告)号:US4977542A

    公开(公告)日:1990-12-11

    申请号:US400898

    申请日:1989-08-30

    CPC classification number: G11C7/14 G11C7/18 G11C8/14

    Abstract: An arrangement for providing a compensation of capacitance coupling between word lines and bit lines in a memory structure including twisted bit lines. Two dummy word lines maintained at a predetermined potential are formed at a twisted portion of a pair of bit lines. Dummy cells are provided at respective twisted portions of the dummy word lines and the bit lines. A plurality of word lines are formed in a direction intersecting with the bit lines and the word lines are divided into four word line groups according to positions of the twisted portions of the bit line pairs. When an arbitrary word line is selected, a potential of at least one dummy word line corresponding to the word line group to which the selected word line belongs is lowered. Consequently, the rise of the potential of the bit lines caused by the selection of the word line is compensated for by the lowering of the potential of at least one dummy word line, making it possible to decrease errors in reading. Particular cell layer arrangements simplify increase in integration density in the combination of dummy cell compensation with the twisted bit line balancing of capacitance coupling.

    Abstract translation: 一种用于在包括扭转位线的存储器结构中提供字线和位线之间的电容耦合补偿的装置。 保持在预定电位的两个虚拟字线形成在一对位线的扭转部分。 在虚拟字线和位线的相应扭转部分设置虚拟单元。 在与位线相交的方向上形成多个字线,并且根据位线对的扭绞部分的位置将字线分成四个字线组。 当选择任意字线时,与所选字线所属的字线组对应的至少一个虚拟字线的电位降低。 因此,通过降低至少一个虚拟字线的电位来补偿由字线的选择引起的位线的电位的上升,使得可以减少读取中的误差。 特殊的单元层布置简化了虚拟单元补偿与电容耦合的扭转位线平衡组合的集成密度的增加。

    Semiconductor memory device having stacked memory capacitors and method
for manufacturing the same
    13.
    发明授权
    Semiconductor memory device having stacked memory capacitors and method for manufacturing the same 失效
    具有层叠存储电容器的半导体存储器件及其制造方法

    公开(公告)号:US4855953A

    公开(公告)日:1989-08-08

    申请号:US158323

    申请日:1988-02-19

    Abstract: A dynamic RAM comprises an array of memory cells, each of the memory cells comprising a single access transistor and a charge storage region. The charge storage region comprises a first capacitor memory including a P.sup.+ region serving as an opposite electrode formed in the inner surface of a trench formed in a P type silicon substrate, a first capacitor dielectric film formed on the P.sup.+ region and a common electrode layer serving as a memory terminal formed on the first capacitor dielectric film, and a second memory capacitor including the common electrode layer, a second capacitor dielectric film formed on the common electrode layer and a cell plate electrode formed on the second capacitor dielectric film. The memory terminal and a drain region of the access transistor are connected in a self-aligning manner by an electrode having a sidewall shape which is in contact with an end of the memory terminal. Thus, a contact hole need not be formed in the first capacitor dielectric film, so that decrease of the electrical reliability of the first capacitor dielectric film can be prevented. The drain region of the access transistor may be formed by self-alignment with the contact portion of the common electrode layer.

    Abstract translation: 动态RAM包括存储器单元的阵列,每个存储器单元包括单个存取晶体管和电荷存储区域。 电荷存储区域包括第一电容器存储器,其包括形成在形成于P型硅衬底中的沟槽的内表面中的用作相对电极的P +区,形成在P +区上的第一电容器电介质膜和用于 作为形成在第一电容器电介质膜上的存储器端子,以及包括公共电极层的第二存储电容器,形成在公共电极层上的第二电容器电介质膜和形成在第二电容器电介质膜上的单元板电极。 存取晶体管的存储器端子和漏极区域通过具有与存储器端子的端部接触的侧壁形状的电极以自对准的方式连接。 因此,不需要在第一电容器电介质膜中形成接触孔,从而可以防止第一电容器电介质膜的电可靠性的降低。 存取晶体管的漏极区可以通过与公共电极层的接触部分进行自对准而形成。

    Semiconductor device
    15.
    发明授权
    Semiconductor device 失效
    半导体器件

    公开(公告)号:US4672582A

    公开(公告)日:1987-06-09

    申请号:US738262

    申请日:1985-05-28

    CPC classification number: G11C29/34

    Abstract: A semiconductor device is provided which can be efficiently subjected to a function test at a high speed by write/read operations for each plurality of bits. The semiconductor device according to the present invention comprises an encoder for encoding a 1-bit signal to a signal of a plurality of bits and a decoder receiving a signal of a plurality of bits for decoding the same to a 1-bit signal in response to the states thereof, so as to simultaneously write each bit of the plurality of bits from the encoder in each corresponding memory cell of a plurality of simultaneously selected memory cells in a writing test mode, and to simultaneously read information signals stored in the plurality of simultaneously selected memory cells in a reading test mode thereby to decode the signals to a 1-bit signal corresponding to the plurality of information signals.

    Abstract translation: 提供一种半导体器件,其能够通过每个位的写入/读取操作而被高效率地进行功能测试。 根据本发明的半导体器件包括:编码器,用于将1比特信号编码为多个比特的信号;以及解码器,其接收多个比特的信号,以将其解码为1比特信号,以响应于 其状态,以便以写入测试模式在多个同时选择的存储单元的每个对应的存储单元中同时从编码器写入多个位的每一位,并同时读取同时存储在多个存储单元中的信息信号 在读取测试模式中选择的存储单元,从而将信号解码为对应于多个信息信号的1位信号。

    Method of manufacturing semiconductor device
    18.
    发明授权
    Method of manufacturing semiconductor device 失效
    制造半导体器件的方法

    公开(公告)号:US06214664B1

    公开(公告)日:2001-04-10

    申请号:US09443016

    申请日:1999-11-18

    CPC classification number: H01L27/10852

    Abstract: In a semiconductor device and a method of manufacturing the same, an isolating and insulating film is provided at an end neighboring to a second impurity region with a groove extended to a semiconductor substrate. This removes a crystal defect existed at the end of the isolating and insulating film, and thus prevents leak of a current at this portion from a storage node. Consequently, provision of the groove at the edge portion of the isolating oxide film neighboring to the impurity region removes a crystal defect at this region, and thus eliminates a possibility of leak of a current.

    Abstract translation: 在半导体器件及其制造方法中,隔离绝缘膜设置在与第二杂质区相邻的端部处,并且沟槽延伸到半导体衬底。 这消除了隔离和绝缘膜末端存在的晶体缺陷,从而防止在该部分处的电流从存储节点泄漏。 因此,在与杂质区相邻的隔离氧化膜的边缘部分处设置沟槽消除了该区域的晶体缺陷,从而消除了电流泄漏的可能性。

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