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公开(公告)号：US06774550B2
公开(公告)日：2004-08-10
申请号：US10413176
申请日：2003-04-14
IPC分类号： H01J1900
CPC分类号： H01J27/024 , H01J27/022 , H01J37/08 , H01J37/3053 , H01J2237/061 , H01J2237/3151
摘要： A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.
摘要翻译： 带有电荷的粒子装置，具有多个导电半球栅格电极，栅格电极安装在介电安装环中，具有隐藏的区域或区域，以在栅电极和安装环之间形成溅射沉积，以维持栅电极之间的电隔离。 栅格电极通过槽和紧固销安装到安装环上，这些插槽和紧固销允许网格电极和安装环之间的滑动热膨胀和收缩，同时基本上保持网格开口的对准和栅格电极之间的间隔。 不对称的紧固销便于滑动热膨胀同时限制栅格电极。 电接触器通过弹簧加载的滑动触点来提供和维持栅格电极的电位，而基本上不影响栅格电极的热特性。
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公开(公告)号：US06590324B1
公开(公告)日：2003-07-08
申请号：US09390841
申请日：1999-09-07
IPC分类号： H01J2700
CPC分类号： H01J27/024 , H01J27/022 , H01J37/08 , H01J37/3053 , H01J2237/061 , H01J2237/3151
摘要： A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.
摘要翻译： 带有电荷的粒子装置，具有多个导电半球栅格电极，栅格电极安装在介电安装环中，具有隐藏的区域或区域，以在栅电极和安装环之间形成溅射沉积，以维持栅电极之间的电隔离。 栅格电极通过槽和紧固销安装到安装环上，这些插槽和紧固销允许网格电极和安装环之间的滑动热膨胀和收缩，同时基本上保持网格开口的对准和栅格电极之间的间隔。 不对称的紧固销便于滑动热膨胀同时限制栅格电极。 电接触器通过弹簧加载的滑动触点来提供和维持栅格电极的电位，而基本上不影响栅格电极的热特性。
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公开(公告)号：US06545580B2
公开(公告)日：2003-04-08
申请号：US09150274
申请日：1998-09-09
IPC分类号： C23C1400
CPC分类号： H01J37/32623 , H01J37/3178 , H01J37/3266
摘要： An electromagnetic field generator and method of operation for ion beam deposition of magnetic thin-film materials is presented. A combination of open frame electromagnetic field generator elements provides precise control of magnetic field directionality. This control enables deposition of oriented magnetic films with minimal directionality error. The magnetic field direction may be oriented to enable the deposition of alternating layers of directionally oriented magnetic films. An open frame element reduces the weight of the electromagnetic field generator while truncated corners reduce diagonal clearance that may be required in a vacuum chamber. An open frame design also enables the electromagnetic field generator to surround and thus remain clear of the active deposition area; the electromagnetic field generator can thus be shielded from accumulation of sputtered material. Shielding from accumulation of sputter material reduces maintenance requirements.
摘要翻译： 提出了一种用于磁性薄膜材料的离子束沉积的电磁场发生器和操作方法。 开放式电磁场发生器元件的组合提供了磁场方向性的精确控制。 该控制使得能够以最小的方向性误差沉积取向的磁性膜。 磁场方向可以被定向成能够沉积定向取向的膜的交替层。 开放式框架元件减小了电磁场发生器的重量，而截顶角减小了真空室中可能需要的对角线间隙。 开放式框架设计还使得电磁场发生器能够围绕并因此保持远离有效沉积区域; 因此电磁场发生器可以被屏蔽以免溅射材料的积聚。 防止溅射材料积聚减少维护要求。
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14.发明授权公开(公告)号：US06464891B1
公开(公告)日：2002-10-15
申请号：US09270998
申请日：1999-03-17
申请人： Boris L. Druz , Kurt E. Williams , Alan V. Hayes
发明人： Boris L. Druz , Kurt E. Williams , Alan V. Hayes
IPC分类号： B44C122
CPC分类号： C23C14/221 , C23C14/0605 , C23C14/564 , H01J37/321 , H01L21/67069
摘要： A method is provided for a repetitive deposition and etch of a substrate using a carbon containing ion beam in a gridded ion source. The method includes the actual ion beam processing step combined with the thermal and chemical conditioning of the ion source and a special cleaning step(s). The special cleaning step(s) effect robust removal of the precipitates accumulated in the operating source due to the decomposition of carbon containing gases such as hydrocarbons and halocarbons Precipitate removal is achieved by employing ions and radicals formed in an inert gas plasma or a mixture of inert gas and oxygen to reactively etch or bombard the precipitates.
摘要翻译： 提供了一种用于在网格离子源中使用含碳离子束重复沉积和蚀刻基底的方法。 该方法包括与离子源的热和化学调节结合的实际离子束处理步骤和特殊的清洁步骤。 由于碳氢化合物和卤代烃等含碳气体的分解，特殊的清洗步骤可以有效地除去积聚在操作源中的沉淀物。通过使用在惰性气体等离子体中形成的离子和自由基 惰性气体和氧气以反应性蚀刻或轰击沉淀物。
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公开(公告)号：US6150755A
公开(公告)日：2000-11-21
申请号：US358454
申请日：1999-07-21
CPC分类号： H01J27/16
摘要： A charged particle source includes a vessel defining an interior for containing a plasma, the vessel having an inlet communicating with the interior of the vessel and connected to a source of atoms, and an aperture through which a charged particle beam is discharged, an energy generator for communicating with the atoms in the interior of the vessel and effecting ionization of the atoms in the vessel and creating the plasma, an electrode assembly disposed in the interior of the vessel, the electrode assembly including a conductive electrode support member, a tray member associated with the support member, a conductive liquid disposed in the tray member, the liquid having a surface area and a conductor connected between the conductive liquid and a voltage source, and an ion optics assembly disposed adjacent the vessel for accelerating plasma-generated charged particles having the same polarity as the conductive liquid in the vessel while maintaining charged particles of the opposite polarity within the vessel.
摘要翻译： 带电粒子源包括限定用于容纳等离子体的内部的容器，所述容器具有与容器的内部连通并连接到原子源的入口以及放电带电粒子束通过的孔，能量发生器 用于与容器内部的原子连通并且实现容器中原子的离子化并产生等离子体，设置在容器内部的电极组件，电极组件包括导电电极支撑构件， 与所述支撑构件一起设置在所述托盘构件中的导电液体，所述液体具有连接在所述导电液体和电压源之间的表面积和导体，以及邻近所述容器设置的离子光学组件，用于加速等离子体产生的带电粒子，所述带电粒子具有 与容器中的导电液体具有相同的极性，同时保持相反极性的带电粒子 船内的荣耀。
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16.发明授权Charged-particle source, control system, and process using gating to extract the ion beam 失效带电粒子源，控制系统和使用门控提取离子束的过程
公开(公告)号：US5982101A
公开(公告)日：1999-11-09
申请号：US883696
申请日：1997-06-27
申请人： Roger P. Fremgen, Jr. , John Jacob , Alan V. Hayes , Victor Kanarov , Edward W. Ostan , Abraham J. Navy , Emmanuel N. Lakios , Genrikh Treyger
发明人： Roger P. Fremgen, Jr. , John Jacob , Alan V. Hayes , Victor Kanarov , Edward W. Ostan , Abraham J. Navy , Emmanuel N. Lakios , Genrikh Treyger
CPC分类号： H01J37/08 , H01J27/022
摘要： A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam "on" and beam "off" states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction.
摘要翻译： 提出了一种用于操作带电粒子源的控制系统和过程，其实现了带有电荷的粒子束的门控，而没有机械快门，并且在光束“开”状态和光束“关闭”状态之间具有非常短的转换。 过程和控制系统提供对带电粒子提取持续时间的非常精确的控制。
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公开(公告)号：US08158016B2
公开(公告)日：2012-04-17
申请号：US12037598
申请日：2008-02-26
申请人： Alan V. Hayes , Rustam Yevtukhov , Viktor Kanarov , Boris L. Druz
发明人： Alan V. Hayes , Rustam Yevtukhov , Viktor Kanarov , Boris L. Druz
CPC分类号： H01J37/08 , H01J27/18 , H01J37/3053 , H01J2237/061 , H01J2237/083 , H01J2237/24542 , H01L21/67069
摘要： Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.
摘要翻译： 操作离子源的电磁体的方法，用于产生具有可控离子电流密度分布的离子束。 所述方法可以包括在离子源的放电空间中产生等离子体，通过向有效限定等离子体密度分布的电磁体施加电流来产生和放电放电空间中的磁场，从等离子体提取离子束， 测量离子束密度的分布曲线，并将实际分布分布与用于离子束密度的期望分布分布进行比较。 基于比较，可以手动或自动地调节施加到电磁体的电流，以改变放电空间中的磁场，从而改变等离子体密度分布。
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公开(公告)号：US07879201B2
公开(公告)日：2011-02-01
申请号：US10915745
申请日：2004-08-11
CPC分类号： C23C14/044 , C23C14/221
摘要： Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.
摘要翻译： 用高能粒子束处理衬底的方法和装置。 光束从源极通过定位在源极和衬底之间的屏蔽件中的矩形孔引导到衬底移动平面中的处理区域。 衬底上的特征与矩形孔的主要尺寸平行排列，并且衬底与孔的主要尺寸正交地移动。 光束在运动过程中通过光圈撞击基板。 衬底可以周期性地旋转大约180°以重新定向相对于矩形孔的主要尺寸的特征。 所得到的处理轮廓关于朝向矩形孔的主要尺寸的特征的侧面对称。
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19.发明申请Method and Apparatus for Surface Processing of a Substrate Using an Energetic Particle Beam 审中-公开使用能量粒子束对基体进行表面处理的方法和装置公开(公告)号：US20090098306A1
公开(公告)日：2009-04-16
申请号：US12212844
申请日：2008-09-18
申请人： Boris Druz , Roger P. Fremgen, JR. , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss , Piero Sferlazzo
发明人： Boris Druz , Roger P. Fremgen, JR. , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss , Piero Sferlazzo
IPC分类号： C23C14/24
CPC分类号： H01J37/3488 , C23C14/044 , C23C14/221 , C23C14/46 , H01J37/20 , H01J37/302 , H01J37/317 , H01J37/32752 , H01J37/3441 , H01J37/3476 , H01J2237/0245 , H01J2237/045 , H01J2237/20207 , H01J2237/20214 , H01J2237/20221 , H01J2237/30472 , H01J2237/3146
摘要： Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.
摘要翻译： 用能量粒子束处理衬底的方法和设备。 衬底上的特征相对于能量粒子束定向，并且通过能量粒子束扫描衬底。 衬底围绕其方位角对称轴周期性地被索引，同时被屏蔽以免暴露于能量粒子束，以相对于梁的主要尺寸重新定向特征。
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公开(公告)号：US07414355B2
公开(公告)日：2008-08-19
申请号：US11207656
申请日：2005-08-18
CPC分类号： H01J27/024 , H01J27/022 , H01J37/08 , H01J37/3053 , H01J2237/061 , H01J2237/3151
摘要： A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.
摘要翻译： 带有电荷的粒子装置，具有多个导电半球栅格电极，栅格电极安装在介电安装环中，具有隐藏的区域或区域，以在栅电极和安装环之间形成溅射沉积，以维持栅电极之间的电隔离。 栅格电极通过槽和紧固销安装到安装环上，这些插槽和紧固销允许网格电极和安装环之间的滑动热膨胀和收缩，同时基本上保持网格开口的对准和栅格电极之间的间隔。 不对称的紧固销便于滑动热膨胀同时限制栅格电极。 电接触器通过弹簧加载的滑动触点来提供和维持栅格电极的电位，而基本上不影响栅格电极的热特性。
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