公开(公告)号：US20170248782A1

公开(公告)日：2017-08-31

申请号：US15594849

申请日：2017-05-15

Applicant: Gigaphoton Inc.

Inventor： Kouji KAKIZAKI ,  Akira SUWA ,  Osamu WAKABAYASHI

IPC: G02B26/10 ,  H01L21/02 ,  H01L27/12 ,  G21K5/08 ,  G21K5/10

CPC classification number: G02B26/10 ,  B23K26/0676 ,  B23K26/352 ,  G02B26/101 ,  G02B26/12 ,  G21K5/08 ,  G21K5/10 ,  G21K2201/067 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02592 ,  H01L21/0268 ,  H01L21/02686 ,  H01L21/02691 ,  H01L27/1285

Abstract: A laser irradiation device may include: a laser device configured to emit a pulse laser beam; beam scan optics configured to allocate the pulse laser beam emitted from the laser device to optical paths; beam homogenizers provided in the respective optical paths, each of the beam homogenizers being configured to homogenize distribution of light intensity of the pulse laser beam allocated to a corresponding optical path of the optical paths; and a controller configured to control the beam scan optics to allocate, for each pulse, the pulse laser beam emitted from the laser device to the corresponding optical path of the optical paths.

公开(公告)号：US20170149199A1

公开(公告)日：2017-05-25

申请号：US15428165

申请日：2017-02-09

Applicant: Gigaphoton Inc.

Inventor： Daisuke TEI ,  Takahito KUMAZAKI ,  Takeshi OHTA ,  Osamu WAKABAYASHI

IPC: H01S3/08 ,  H01S3/23 ,  H01S3/225

CPC classification number: H01S3/0346 ,  G02B27/283 ,  H01S3/0071 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08054 ,  H01S3/08072 ,  H01S3/0971 ,  H01S3/10092 ,  H01S3/1308 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2308 ,  H01S3/2366 ,  H01S2301/203 ,  H01S2301/206

Abstract: A laser apparatus includes: an oscillator configured to output seed light; an amplifier including a laser chamber provided in an optical path of the seed light and a pair of discharge electrodes provided inside the laser chamber; and a transform optical system provided in the optical path of the seed light between the oscillator and the amplifier and configured to transform the seed light in a way that suppresses a decrease in purity of polarization of a laser beam that is outputted from the amplifier.

公开(公告)号：US20170103895A1

公开(公告)日：2017-04-13

申请号：US15383050

申请日：2016-12-19

Applicant: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION ,  GIGAPHOTON INC.

Inventor： Yousuke WATANABE ,  Hiroshi IKENOUE ,  Osamu WAKABAYASHI

IPC: H01L21/223 ,  H01L21/324 ,  H01L21/67 ,  H01L21/268

CPC classification number: H01L21/2236 ,  B23K26/0006 ,  B23K26/0093 ,  B23K26/032 ,  B23K26/0622 ,  B23K26/53 ,  B23K2103/56 ,  H01J37/32825 ,  H01L21/0455 ,  H01L21/268 ,  H01L21/324 ,  H01L21/67115 ,  H01L29/1608 ,  H01L29/8611 ,  H05H2001/483

Abstract: A laser irradiation apparatus may include a plasma generator, a laser unit configured to output a pulsed laser light beam, and a controller. The plasma generator may be configured to supply an atmospheric pressure plasma containing a dopant to a predetermined region on a semiconductor material. The controller may be configured to control the plasma generator and the laser unit to perform one of first and second controls to thereby perform doping of the dopant into the semiconductor material. The first control may cause irradiation of the predetermined region with one or more pulses of the pulsed laser light beam from start to finish of supply of the atmospheric pressure plasma to the predetermined region. The second control may cause irradiation of the predetermined region with one or more pulses of the pulsed laser light beam after supply of the atmospheric pressure plasma to the predetermined region.

公开(公告)号：US20170093119A1

公开(公告)日：2017-03-30

申请号：US15379192

申请日：2016-12-14

Applicant: Gigaphoton Inc.

Inventor： Akiyoshi SUZUKI ,  Osamu WAKABAYASHI ,  Masaki ARAKAWA ,  Koji ASHIKAWA ,  Yasuhiro KAMBA

IPC: H01S3/23 ,  H01S3/00 ,  G02B27/12 ,  B23K26/00 ,  H01L21/67 ,  H01L21/02 ,  H01L27/12 ,  H01S3/081 ,  G02B27/10

CPC classification number: H01S3/23 ,  B23K26/0006 ,  B23K26/032 ,  B23K26/0608 ,  B23K26/0622 ,  B23K26/082 ,  B23K26/352 ,  B23K26/707 ,  B23K2101/40 ,  B23K2103/50 ,  B23K2103/56 ,  G02B27/106 ,  G02B27/123 ,  G02B27/126 ,  H01L21/02532 ,  H01L21/02592 ,  H01L21/02686 ,  H01L21/67115 ,  H01L27/1285 ,  H01S3/0071 ,  H01S3/081 ,  H01S3/225 ,  H01S3/2383

Abstract: A laser system may include a plurality of laser apparatuses, a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled laser beam, and a controller configured to control operated laser apparatuses of the plurality of laser apparatuses such that, at a change in a number representing how many laser apparatuses are operated, a beam parameter of the bundled laser beam emitted from the beam delivery device approaches a beam parameter of the bundled laser beam emitted before the change.

公开(公告)号：US20170064800A1

公开(公告)日：2017-03-02

申请号：US15347241

申请日：2016-11-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji NAGAI ,  Tamotsu ABE ,  Hitoshi NAGANO ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G03F7/20 ,  G21K1/06

CPC classification number: H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US20170063025A1

公开(公告)日：2017-03-02

申请号：US15353235

申请日：2016-11-16

Applicant: Gigaphoton Inc.

Inventor： Osamu WAKABAYASHI ,  Masaki ARAKAWA ,  Kouji KAKIZAKI

IPC: H01S3/13 ,  G01J1/42 ,  H01S3/00 ,  H01S3/23 ,  H01S3/139

CPC classification number: H01S3/1305 ,  G01J1/4257 ,  G01J2001/4261 ,  H01S3/0014 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/1394 ,  H01S3/225 ,  H01S3/2383

Abstract: The laser system may include a plurality of laser apparatuses, a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled pulse laser beam, and a beam parameter measuring device provided in an optical path of the bundled pulse laser beam to measure a beam parameter of each one of the pulse laser beams and a beam parameter of the bundled pulse laser beam.

Abstract translation: 激光系统可以包括多个激光装置，束传送装置，其配置为捆扎从多个激光装置的各个激光装置发射的脉冲激光束以发射捆扎的脉冲激光束;以及光束参数测量装置，其设置在光学 束脉冲激光束的路径，以测量每一个脉冲激光束的光束参数和束脉冲激光束的光束参数。

公开(公告)号：US20160359291A1

公开(公告)日：2016-12-08

申请号：US15240162

申请日：2016-08-18

Applicant: Gigaphoton Inc.

Inventor： Takeshi ASAYAMA ,  Hiroaki TSUSHIMA ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI

IPC: H01S3/038 ,  H01S3/00 ,  H01S3/225 ,  H01S3/036

CPC classification number: H01S3/038 ,  G03F7/70025 ,  H01S3/0014 ,  H01S3/036 ,  H01S3/08009 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/225

Abstract: A gas laser apparatus includes a chamber containing a laser gas, a pair of electrodes disposed within the chamber, a fan disposed within the chamber, a motor connected to a rotating shaft of the fan, and a rotating speed control unit configured to control a rotating speed of the fan based on a wear-out parameter of the pair of electrodes.

Abstract translation: 气体激光装置包括：包含激光气体的腔室，设置在腔室内的一对电极;设置在腔室内的风扇;与风扇的旋转轴连接的电动机;以及旋转速度控制单元， 基于该对电极的磨损参数来确定风扇的速度。

公开(公告)号：US20160341601A1

公开(公告)日：2016-11-24

申请号：US15224894

申请日：2016-08-01

Applicant: Gigaphoton Inc.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: G01J1/42 ,  G01J1/44 ,  G03F7/20 ,  H05G2/00

CPC classification number: G01J1/4257 ,  G01J1/0429 ,  G01J1/429 ,  G01J1/44 ,  G01J9/00 ,  G03F7/70258 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.

Abstract translation: 一种用于产生极紫外光的系统可以包括：室，被配置成将目标材料供应到所述室中的目标供应装置，被配置为输出激光束以照射所述目标材料的激光装置;波前调整器， 所述激光束，被配置为聚焦由所述目标材料反射的激光束的成像光学系统;被配置为捕获由所述成像光学系统聚焦的所述激光束的图像的图像检测器;以及控制器，被配置为基于 捕获的图像。

公开(公告)号：US20160336713A1

公开(公告)日：2016-11-17

申请号：US15218294

申请日：2016-07-25

Applicant: Gigaphoton Inc.

Inventor： Seiji NOGIWA ,  Osamu WAKABAYASHI

IPC: H01S3/13 ,  G02B19/00 ,  H05G2/00 ,  H01S3/23 ,  H01S3/223

CPC classification number: H01S3/1305 ,  G02B19/0095 ,  G03F7/70033 ,  H01S3/13 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2366 ,  H05G2/003 ,  H05G2/008

Abstract: A laser apparatus may include a beam splitter configured to split a pulse laser beam into a first beam path and a second beam path, an optical sensor provided in the first beam path, an amplifier including an amplification region provided in the second beam path and being configured to amplify and emit the pulse laser beam incident thereon along the second beam path, a wavefront controller provided in the second beam path between the beam splitter and the amplifier, and a processor configured to receive an output signal from the optical sensor and transmit a control signal to the wavefront controller.

Abstract translation: 激光装置可以包括分束器，其被配置为将脉冲激光束分成第一光束路径和第二光束路径，设置在第一光束路径中的光学传感器，放大器，包括设置在第二光束路径中的放大区域， 被配置为放大并发射沿着第二光束路径入射到其上的脉冲激光束，设置在分束器和放大器之间的第二光束路径中的波前控制器，以及被配置为从光学传感器接收输出信号并发送 控制信号到波前控制器。

公开(公告)号：US20160313564A1

公开(公告)日：2016-10-27

申请号：US15201782

申请日：2016-07-05

Applicant: Gigaphoton Inc.

Inventor： Osamu WAKABAYASHI ,  Kouji KAKIZAKI ,  Junichi FUJIMOTO

IPC: G02B27/10 ,  H01S3/23 ,  G02B19/00 ,  B23K26/06 ,  H01L21/02 ,  H01L21/268 ,  H01L21/324 ,  H01L27/12 ,  H01S3/00 ,  G02B27/09

CPC classification number: G02B27/1086 ,  B23K26/0608 ,  B23K26/0643 ,  B23K26/0652 ,  B23K2103/172 ,  B23K2103/56 ,  G02B19/0047 ,  G02B27/0905 ,  G02B27/0944 ,  G02B27/0961 ,  G02B27/0977 ,  G02B27/48 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02592 ,  H01L21/02686 ,  H01L21/268 ,  H01L21/324 ,  H01L27/1285 ,  H01S3/005 ,  H01S3/225 ,  H01S3/23 ,  H01S3/2383

Abstract: A laser exposure system may include a plurality of laser devices configured to output laser beams with which an irradiated subject is irradiated, and at least one beam property adjustment unit disposed on optical paths of the laser beams outputted from the plurality of laser devices, and configured to allow beam properties of the laser beams to be approximately a same as each other.

Abstract translation: 激光曝光系统可以包括多个激光装置，其被配置为输出照射对象被照射的激光束;以及至少一个光束特性调整单元，设置在从多个激光装置输出的激光束的光路上，并且被配置 以允许激光束的光束特性彼此大致相同。