公开(公告)号：US20110168888A1

公开(公告)日：2011-07-14

申请号：US12987803

申请日：2011-01-10

Applicant: Bryan W. Reed ,  Richard M. Shuttlesworth ,  Thomas B. Lagrange ,  David J. Gibson

Inventor： Bryan W. Reed ,  Richard M. Shuttlesworth ,  Thomas B. Lagrange ,  David J. Gibson

IPC: G01N23/04 ,  H01J37/26

CPC classification number: H01J37/04 ,  H01J37/045 ,  H01J37/26 ,  H01J2237/0432 ,  H01J2237/1415

Abstract: A dynamic transmission electron microscope (DTEM) according to one embodiment includes an electron gun positioned at a top of a column for emitting electrons; an accelerator for accelerating the electrons; a C0 lens positioned below the accelerator for focusing greater than about 95% of the electrons exiting the accelerator; a drift space positioned below the C0 lens; a condenser lens system positioned below the drift space; and a camera chamber positioned below the condenser lens system, the camera chamber for housing a single electron sensitive camera. Additional systems and methods are also presented.

Abstract translation: 根据一个实施例的动态透射电子显微镜（DTEM）包括位于用于发射电子的柱的顶部的电子枪; 用于加速电子的加速器; 位于加速器下方的用于聚焦大于约95％离开加速器的电子的C0透镜; 位于C0镜头下方的漂移空间; 位于漂移空间下方的聚光透镜系统; 以及位于聚光透镜系统下方的照相机室，用于容纳单个电子敏感照相机的相机室。 还介绍了其他系统和方法。

公开(公告)号：US07952071B2

公开(公告)日：2011-05-31

申请号：US12162071

申请日：2007-01-24

Applicant: Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Masahiro Hatakeyama ,  Kenji Terao ,  Takeshi Murakami ,  Katsuya Okumura ,  Tatsuhiko Higashiki

Inventor： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Masahiro Hatakeyama ,  Kenji Terao ,  Takeshi Murakami ,  Katsuya Okumura ,  Tatsuhiko Higashiki

IPC: G01N23/00

CPC classification number: H01J37/29 ,  H01J37/045 ,  H01J2237/2446

Abstract: Provided is a defect inspection apparatus and an inspection (or evaluation) method with highly improved accuracy, which would not be provided by the prior art, in the defect inspection apparatus used in a manufacturing process of a semiconductor device.Provided is a method for inspecting a sample surface with a projection type electron beam inspection apparatus, comprising the steps of: forming such an irradiation area on the sample surface by an electron beam generated from an electron gun 21 that has approximately a circular or elliptical shape of a size larger than a pattern on the sample surface; irradiating the electron beam substantially onto a center of the pattern on the sample surface; and forming an image on an electron detection plane of a detector from secondary electrons emanating from the sample surface in response to the irradiation of the electron beam for inspecting the sample surface.

Abstract translation: 提供了在半导体器件的制造工艺中使用的缺陷检查装置中，现有技术不能提供高精度的缺陷检查装置和检查（或评价）方法。 提供一种用投影型电子束检查装置检查样品表面的方法，包括以下步骤：通过由具有大致圆形或椭圆形的电子枪21产生的电子束在样品表面上形成这样的照射区域 尺寸大于样品表面上的图案; 将电子束基本上照射到样品表面上的图案的中心; 以及响应于用于检查样品表面的电子束的照射，从从样品表面发射的二次电子在检测器的电子检测平面上形成图像。

公开(公告)号：US07728308B2

公开(公告)日：2010-06-01

申请号：US11628196

申请日：2005-05-13

Applicant: Tao Zhang

Inventor： Tao Zhang

IPC: H01J3/26

CPC classification number: G21K1/087 ,  H01J37/045 ,  H01J37/09 ,  H01J37/1472 ,  H01J37/15 ,  H01J2237/028 ,  H01J2237/0451 ,  H01J2237/3175

Abstract: A beam blanking unit (1) comprises first and second blanking plates (2, 3) mounted to a support plate (15). A stopper (4) is mechanically and electrically connected to the first blanking plate (2).

Abstract translation: 光束消隐单元（1）包括安装到支撑板（15）的第一和第二消隐板（2,3）。 制动器（4）机械地和电连接到第一冲裁板（2）。

公开(公告)号：US20100098922A1

公开(公告)日：2010-04-22

申请号：US12642615

申请日：2009-12-18

Applicant: Michael John Zani ,  Mark Joseph Bennahmias ,  Mark Anthony Mayse ,  Jeffrey Winfield Scott

Inventor： Michael John Zani ,  Mark Joseph Bennahmias ,  Mark Anthony Mayse ,  Jeffrey Winfield Scott

IPC: B32B5/16 ,  H01L21/302 ,  H01L21/265 ,  B32B3/00

CPC classification number: H01J37/3056 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/047 ,  H01J2237/30472 ,  H01J2237/31713 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01J2237/3175 ,  H01J2237/31766 ,  H01L21/265 ,  H01L21/26513 ,  H01L21/76267 ,  H01L21/84 ,  H01L27/0629 ,  H01L29/66462 ,  H01L29/66659 ,  Y10T428/24802 ,  Y10T428/24893

Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.

Abstract translation: 用于将工件暴露于带电粒子的室包括用于产生带电粒子流的带电粒子源，准直器，被配置为沿着轴准直和引导带电粒子流从带电粒子源流出，准直器下游的光束数字化器 被配置为通过调整沿着轴的带电粒子之间的纵向间隔来创建包括至少一个带电粒子的组的数字光束，所述光束数字转换器的下游的偏转器包括沿轴线纵向设置以偏转数字光束的一系列偏转级， 以及构造成保持工件的偏转器下游的工件台。

公开(公告)号：US07609815B2

公开(公告)日：2009-10-27

申请号：US11757137

申请日：2007-06-01

Applicant: Ka-Ngo Leung ,  Qing Ji ,  William A. Barletta ,  Ximan Jiang ,  Lili Ji

Inventor： Ka-Ngo Leung ,  Qing Ji ,  William A. Barletta ,  Ximan Jiang ,  Lili Ji

IPC: H01J35/06

CPC classification number: G01N23/203 ,  B82Y10/00 ,  B82Y40/00 ,  G01V5/0008 ,  H01J3/025 ,  H01J3/04 ,  H01J27/024 ,  H01J35/00 ,  H01J37/045 ,  H01J37/077 ,  H01J37/08 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2235/06 ,  H01J2235/068 ,  H01J2237/0435 ,  H01J2237/061 ,  H01J2237/06366 ,  H01J2237/06375 ,  H01J2237/3171

Abstract: Techniques for controllably directing beamlets to a target substrate are disclosed. The beamlets may be either positive ions or electrons. It has been shown that beamlets may be produced with a diameter of 1 μm, with inter-aperture spacings of 12 μm. An array of such beamlets, may be used for maskless lithography. By step-wise movement of the beamlets relative to the target substrate, individual devices may be directly e-beam written. Ion beams may be directly written as well. Due to the high brightness of the beamlets from extraction from a multicusp source, exposure times for lithographic exposure are thought to be minimized. Alternatively, the beamlets may be electrons striking a high Z material for X-ray production, thereafter collimated to provide patterned X-ray exposures such as those used in CAT scans. Such a device may be used for remote detection of explosives.

Abstract translation: 公开了用于将子束可控地引导到目标衬底的技术。 子束可以是正离子或电子。 已经表明，可以制造直径为1um的子束，孔径间隔为12μm。 这种子束的阵列可用于无掩模光刻。 通过子束相对于目标衬底的逐步运动，各个器件可以被直接电子束写入。 离子束也可以直接写入。 由于从多焦源提取的子束的高亮度，认为光刻曝光的曝光时间被最小化。 或者，子束可以是撞击高Z材料用于X射线产生的电子，然后准直以提供图案化的X射线曝光，例如在CAT扫描中使用的那些。 这种装置可用于远程检测炸药。

公开(公告)号：US07547899B2

公开(公告)日：2009-06-16

申请号：US11445677

申请日：2006-06-02

Applicant: John W. Vanderpot ,  Yongzhang Huang

Inventor： John W. Vanderpot ,  Yongzhang Huang

IPC: G21K5/10 ,  H01J37/08

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/09 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/028 ,  H01J2237/30433 ,  H01J2237/31705

Abstract: A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end station are provided, wherein an ion beam is formed from the ion source and travels through the mass analyzer to the end station. An ion beam dump assembly comprising a particle collector, particle attractor, and shield are associated with the mass analyzer, wherein an electrical potential of the particle attractor is operable to attract and constrain contamination particles within the particle collector, and wherein the shield is operable to shield the electrical potential of the particle attractor from an electrical potential of an ion beam within the mass analyzer.

Abstract translation: 提供了一种用于减少离子注入期间污染的系统，方法和装置。 提供了位于离子源和终端之间的离子源，端站和质量分析器，其中离子束由离子源形成并通过质量分析器传送到终端站。 包括粒子收集器，颗粒吸引子和屏蔽的离子束转储组件与质量分析器相关联，其中，所述粒子吸引子的电位可操作以吸引和约束所述颗粒收集器内的污染颗粒，并且其中所述屏蔽件可操作为 屏蔽质子分析仪内离子束电位的吸引子的电位。

公开(公告)号：US07501644B2

公开(公告)日：2009-03-10

申请号：US11841593

申请日：2007-08-20

Applicant: Michael John Zani ,  Mark Joseph Bennahmias ,  Mark Anthony Mayse ,  Jeffrey Winfield Scott

Inventor： Michael John Zani ,  Mark Joseph Bennahmias ,  Mark Anthony Mayse ,  Jeffrey Winfield Scott

IPC: G21K5/10 ,  H01J37/08

CPC classification number: H01J37/3056 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/047 ,  H01J2237/30472 ,  H01J2237/31713 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01J2237/3175 ,  H01J2237/31766 ,  H01L21/265 ,  H01L21/26513 ,  H01L21/76267 ,  H01L21/84 ,  H01L27/0629 ,  H01L29/66462 ,  H01L29/66659 ,  Y10T428/24802 ,  Y10T428/24893

Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.

公开(公告)号：US07495245B2

公开(公告)日：2009-02-24

申请号：US11841724

申请日：2007-08-20

Applicant: Michael John Zani ,  Mark Joseph Bennahmias ,  Mark Anthony Mayse ,  Jeffrey Winfield Scott

Inventor： Michael John Zani ,  Mark Joseph Bennahmias ,  Mark Anthony Mayse ,  Jeffrey Winfield Scott

IPC: G21K5/10 ,  H01J37/08

CPC classification number: H01J37/3056 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/047 ,  H01J2237/30472 ,  H01J2237/31713 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01J2237/3175 ,  H01J2237/31766 ,  H01L21/265 ,  H01L21/26513 ,  H01L21/76267 ,  H01L21/84 ,  H01L27/0629 ,  H01L29/66462 ,  H01L29/66659 ,  Y10T428/24802 ,  Y10T428/24893

Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.

公开(公告)号：US07488960B2

公开(公告)日：2009-02-10

申请号：US11841608

申请日：2007-08-20

Applicant: Michael John Zani ,  Mark Joseph Bennahmias ,  Mark Anthony Mayse ,  Jeffrey Winfield Scott

Inventor： Michael John Zani ,  Mark Joseph Bennahmias ,  Mark Anthony Mayse ,  Jeffrey Winfield Scott

IPC: G21K5/10 ,  H01J37/08

CPC classification number: H01J37/3056 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/047 ,  H01J2237/30472 ,  H01J2237/31713 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01J2237/3175 ,  H01J2237/31766 ,  H01L21/265 ,  H01L21/26513 ,  H01L21/76267 ,  H01L21/84 ,  H01L27/0629 ,  H01L29/66462 ,  H01L29/66659 ,  Y10T428/24802 ,  Y10T428/24893

Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.

公开(公告)号：US20090026912A1

公开(公告)日：2009-01-29

申请号：US11829034

申请日：2007-07-26

Applicant: Vincenzo Lordi ,  Kirkwood Rough ,  Xuefeng Liu ,  Shem-Tov Levi

Inventor： Vincenzo Lordi ,  Kirkwood Rough ,  Xuefeng Liu ,  Shem-Tov Levi

IPC: H01J37/302 ,  H01J29/51 ,  H01J37/30

CPC classification number: H01J37/063 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/073 ,  H01J37/075 ,  H01J37/3174 ,  H01J2237/0432

Abstract: Method and apparatus for achieving an intensity modulated electron blanker are disclosed. An apparatus includes a cathode exposed to an activation source to generate an electron beam. Cathode control circuitry adjusts a cathode control amplifier to regulate cathode voltage and the potential of the electron beam. In some approaches the electron beam potential is used to control the blanking frequency, switching speeds, and duty cycle. In another approach electron generating beams directed on to the cathode are modulated to control the electron beam.

Abstract translation: 公开了用于实现强度调制的电子消除器的方法和装置。 一种装置包括暴露于激活源的阴极以产生电子束。 阴极控制电路调节阴极控制放大器以调节阴极电压和电子束的电位。 在一些方法中，电子束电位用于控制消隐频率，开关速度和占空比。 在另一种方法中，调节指向阴极的电子产生光束以控制电子束。