公开(公告)号：US07126141B2

公开(公告)日：2006-10-24

申请号：US11168425

申请日：2005-06-29

Applicant: Haruhito Ono ,  Masato Muraki

Inventor： Haruhito Ono ,  Masato Muraki

IPC: G21K5/00

CPC classification number: H01J37/12 ,  G01N23/00 ,  H01J9/14 ,  H01J9/18 ,  H01J37/3007 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1534 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: A charged-particle beam exposure apparatus includes a charged-particle beam source for emitting a charged-particle beam, an electrooptic system array which has a plurality of electron lenses and forms a plurality of intermediate images of the charged-particle beam source by the plurality of electron lenses, and a projection electrooptic system for projecting on a substrate the plurality of intermediate images formed by the electrooptic system array. The electrooptic system array includes at least two electrodes arranged along paths of a plurality of charged-particle beams, each of the at least two electrodes having a plurality of apertures on the paths of the plurality of charged-particle beams, and a shield electrode which is interposed between the at least two electrodes and has a plurality of shields corresponding to the respective paths of the plurality of charged-particle beams.

Abstract translation: 带电粒子束曝光装置包括用于发射带电粒子束的带电粒子束源，具有多个电子透镜并由多个电子透镜形成带电粒子束源的多个中间图像的电光系统阵列 的电子透镜，以及用于在基板上投影由电光系统阵列形成的多个中间图像的投射电光系统。 电光系统阵列包括沿着多个带电粒子束的路径布置的至少两个电极，所述至少两个电极中的每一个在所述多个带电粒子束的路径上具有多个孔，以及屏蔽电极， 设置在所述至少两个电极之间并且具有对应于所述多个带电粒子束的相应路径的多个屏蔽。

公开(公告)号：US20060192141A1

公开(公告)日：2006-08-31

申请号：US10543175

申请日：2004-01-23

Applicant: Hans Wilfred Koops

Inventor： Hans Wilfred Koops

IPC: G21G5/00

CPC classification number: H01J37/317 ,  H01J9/02 ,  H01J2237/1205 ,  H01J2237/31735

Abstract: The invention pertains to a process for the production of particle beam systems (10-10″″, 12-12″), in which at least one first particle beam system (10-10″″) is produced on a first substrate (14) by computer-guided particle beam-induced deposition, and the minimum of one first particle beam system (10-10″″) is used to produce at least one second particle beam system (12-12″) on at least one second substrate (16) by computer-guided particle beam-induced deposition. The inventive process makes it possible to produce a large number of particle beam systems in a relatively short time.

Abstract translation: 本发明涉及生产粒子束系统（10-10“，”12-12“）的方法，其中至少一个第一粒子束系统（10-10”）在 通过计算机引导的粒子束诱导沉积的第一衬底（14），并且使用最小的一个第一粒子束系统（10-10“）来产生至少一个第二粒子束系统（12-12” '）通过计算机引导的粒子束诱导沉积在至少一个第二基底（16）上。 本发明的方法使得可以在相对短的时间内产生大量的粒子束系统。

公开(公告)号：US07081630B2

公开(公告)日：2006-07-25

申请号：US10799836

申请日：2004-03-12

Applicant: Rahul Saini ,  Zoran Jandric

Inventor： Rahul Saini ,  Zoran Jandric

IPC: G01K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01L21/44 ,  H05K1/00

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: A microcolumn including an assembly substrate and a plurality of beam modification components. The assembly substrate includes a plurality of sockets, and the beam modification components each include a connector coupled to a corresponding one of the sockets. Assembly of the beam modification components to the assembly substrate may employ automation and/or automated calibration, including automated motion of robotic stages in a substantially automated manner.

Abstract translation: 包括组装衬底和多个束修改组件的微柱。 组装衬底包括多个插座，并且光束修改部件各自包括连接到对应的一个插座的连接器。 将束修改部件组装到组装衬底可以采用自动化和/或自动校准，包括基本自动化的机器人级的自动运动。

公开(公告)号：US07038226B2

公开(公告)日：2006-05-02

申请号：US10454576

申请日：2003-06-05

Applicant: Haruhito Ono ,  Masato Muraki

Inventor： Haruhito Ono ,  Masato Muraki

IPC: H01J3/14 ,  H01J37/00 ,  A61N5/00 ,  G21G5/00

CPC classification number: H01J37/12 ,  G01N23/00 ,  H01J9/14 ,  H01J9/18 ,  H01J37/3007 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1534 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: A semiconductor manufacturing factory includes a plurality of semiconductor manufacturing apparatuses including an exposure apparatus for exposing a substrate by using a plurality of charged particle beams, a local area network for connecting the plurality of semiconductor manufacturing apparatuses, and a gateway for connecting the local area network to an external network of the semiconductor manufacturing factory. The exposure apparatus includes a lens array, which has a plurality of lenses and directs a plurality of charged particle beams onto a substrate. The lens array includes at least two electrodes having a plurality of apertures on the paths of the plurality of charged-particle beams, and a shield electrode interposed between the at least two electrodes.

Abstract translation: 一种半导体制造工厂包括多个半导体制造装置，其包括通过使用多个带电粒子束使基板曝光的曝光装置，用于连接多个半导体制造装置的局域网，以及用于连接局域网 到半导体制造工厂的外部网络。 曝光装置包括具有多个透镜并将多个带电粒子束引导到基板上的透镜阵列。 透镜阵列包括在多个带电粒子束的路径上具有多个孔的至少两个电极以及插在该至少两个电极之间的屏蔽电极。

公开(公告)号：US20050266322A1

公开(公告)日：2005-12-01

申请号：US11174891

申请日：2005-07-01

Applicant: Sang Choi ,  Dae Kim

Inventor： Sang Choi ,  Dae Kim

IPC: G02B3/00 ,  H01J1/02 ,  H01J3/18 ,  H01J9/02 ,  H01J9/14 ,  H01J37/12

CPC classification number: H01J9/02 ,  H01J3/18 ,  H01J9/14 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31754 ,  Y10T29/49117

Abstract: Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.

公开(公告)号：US20050092929A1

公开(公告)日：2005-05-05

申请号：US10983566

申请日：2004-11-08

Applicant: Conrad Schneiker

Inventor： Conrad Schneiker

IPC: G21K1/08

CPC classification number: G21K1/08 ,  B33Y80/00 ,  G21K5/04 ,  H01J1/304 ,  H01J3/021 ,  H01J9/025 ,  H01J37/065 ,  H01J37/073 ,  H01J37/12 ,  H01J2201/30407 ,  H01J2237/062 ,  H01J2237/06341 ,  H01J2237/06375 ,  H01J2237/1205 ,  H01J2237/1207

Abstract: A solid state sub-nanometer-scale electron beam emitter comprising a multi-layered structure having a nano-tip electron emitter and tunnel emission junction formed on substrate, an initial electron beam extraction electrode, a “nano-sandwich Einzel” electrode, and a topmost protective layer.

Abstract translation: 一种固态亚纳米级电子束发射器，包括在基底上形成的具有纳米尖端电子发射体和隧道发射结的多层结构，初始电子束提取电极，“纳米夹心Einzel”电极和 最上层的保护层。

公开(公告)号：US06872950B2

公开(公告)日：2005-03-29

申请号：US09819669

申请日：2001-03-29

Applicant: Yasuhiro Shimada ,  Takayuki Yagi ,  Haruhito Ono

Inventor： Yasuhiro Shimada ,  Takayuki Yagi ,  Haruhito Ono

IPC: G03F7/20 ,  H01J37/12 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  H01J37/304

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J2237/1205

Abstract: This invention relates to an electron optical system array having a plurality of electron lenses. The electron optical system array includes a plurality of electrodes arranged along the paths of a plurality of charged-particle beams. Each of the plurality of electrodes has a membrane in which a plurality of apertures are formed on the paths of the plurality of charged-particle beams, and a support portion which supports the membrane. At least two of the plurality of electrodes are arranged to form a nested structure.

Abstract translation: 本发明涉及具有多个电子透镜的电子光学系统阵列。 电子光学系统阵列包括沿着多个带电粒子束的路径布置的多个电极。 多个电极中的每个电极具有多个孔径形成在多个带电粒子束的路径上的膜和支撑膜的支撑部分。 多个电极中的至少两个布置成形成嵌套结构。

公开(公告)号：US06841787B2

公开(公告)日：2005-01-11

申请号：US10289209

申请日：2002-11-07

Applicant: Gilad Almogy

Inventor： Gilad Almogy

IPC: G21K5/04 ,  G03F7/20 ,  H01J37/073 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  G21K5/10

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/70275 ,  G03F7/70375 ,  H01J37/073 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31779

Abstract: A high resolution and high data rate spot grid array printer system is provided, wherein an image representative of patterns to be recorded on a reticle or on a layer of a semiconductor die is formed by scanning a substrate with electron beams. Embodiments include a printer comprising an optical radiation source for irradiating a photon-electron converter with a plurality of substantially parallel optical beams, the optical beams being individually modulated to correspond to an image to be recorded on the substrate. The photon-electron converter produces an intermediate image composed of an array of electron beams corresponding to the modulated optical beams. A de-magnifier is interposed between the photon-electron converter and the substrate, for reducing the size of the intermediate image. A movable stage introduces a relative movement between the substrate and the photon-electron converter, such that the substrate is scanned by the electron beams.

Abstract translation: 提供了高分辨率和高数据速率点阵阵列打印机系统，其中通过用电子束扫描基板来形成表示要记录在掩模版上或半导体管芯层上的图案的图像。 实施例包括一种打印机，其包括用于用多个基本上平行的光束照射光子 - 电子转换器的光辐射源，所述光束被单独调制以对应于待记录在基板上的图像。 光子 - 电子转换器产生由对应于调制光束的电子束阵列组成的中间图像。 在光子 - 电子转换器和衬底之间插入放大镜，用于减小中间图像的尺寸。 可移动台引入衬底和光子 - 电子转换器之间的相对运动，使得衬底被电子束扫描。

公开(公告)号：US20040061064A1

公开(公告)日：2004-04-01

申请号：US10615955

申请日：2003-07-10

Applicant: CANON KABUSHIKI KAISHA ,  HITACHI, LTD.

Inventor： Haruhito Ono ,  Kenichi Nagae ,  Masaki Takakuwa ,  Yoshinori Nakayama ,  Harunobu Muto

IPC: G21K001/08 ,  H01J003/14

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205

Abstract: There is provided a multi-charged beam lens constituted by stacking, via fiber chips serving as insulator members along the optical path of a charged beam, a plurality of electrodes having a charged beam passing region where a plurality of charged beam apertures are formed. The electrodes have shield apertures between the charged beam passing region and the fiber chips. A conductive shield extends through the shield apertures without contacting the electrodes, and cuts off a straight path which connects the charged beam passing region and the fiber chips serving as insulator members. This prevents the influence of charge-up of the insulator members on an electron beam in the multi-charged beam lens.

Abstract translation: 提供了一种多带电波束透镜，其通过沿着带电波束的光路用作绝缘体构件的光纤芯片堆叠，具有形成有多个带电束孔的带电光束通过区域的多个电极构成。 电极在带电光束通过区域和光纤芯片之间具有屏蔽孔。 导电屏蔽层不会接触电极而延伸通过屏蔽孔，并且切断连接充电光束通过区域和用作绝缘体构件的光纤芯片的直线路径。 这样可以防止绝缘体的充电对多电荷束透镜中的电子束的影响。

公开(公告)号：US06570320B1

公开(公告)日：2003-05-27

申请号：US09701894

申请日：2000-12-04

Applicant: Klaus Burkhardt ,  Wolfgang Eckhardt ,  Silvia Gohlke ,  Ruth Männer ,  Wolfram Wersing

Inventor： Klaus Burkhardt ,  Wolfgang Eckhardt ,  Silvia Gohlke ,  Ruth Männer ,  Wolfram Wersing

IPC: H01J6304

CPC classification number: H01J9/18 ,  H01J37/12 ,  H01J2237/06375 ,  H01J2237/1205

Abstract: The invention is directed to an extremely low-capacitance device for shaping an electron beam. The device is based on a ceramic body having a monolithic multi-layer structure. The manufacture of the ceramic body ensues with the assistance of LTCC technology, whereby this method is designationally modified. The body is constructed of pre-sintered ceramic layers whose lateral shrinkage is suppressed. The through apertures of the electrodes for the electron beam are thus arranged exactly coaxially, and the tolerances of the electrode dimensions are decoupled from the shrinkage during sintering. The electron beam of an electron gun is focused and the intensity thereof is modulated with the assistance of such a device.

Abstract translation: 本发明涉及用于成形电子束的极低电容器件。 该装置基于具有单片多层结构的陶瓷体。 在LTCC技术的帮助下，陶瓷体的制造是由这种方法进行的。 本体由预烧结的陶瓷层构成，其横向收缩被抑制。 因此，用于电子束的电极的通孔精确地同轴布置，并且电极尺寸的公差与烧结期间的收缩率分离。 聚焦电子枪的电子束，并借助这种装置调制其强度。