公开(公告)号：US4857743A

公开(公告)日：1989-08-15

申请号：US229158

申请日：1988-08-04

Applicant: Kenneth Lambert

Inventor： Kenneth Lambert

IPC: G01Q30/02 ,  G01Q30/16 ,  H01J37/09

CPC classification number: H01J37/09

Abstract: A spray aperture disk designed for insertion into a column liner of an electron microscope having a substantially circular shape, a plurality of tabs or extensions located on the circumferential periphery of the disk and a small central aperture. The disk is inserted into the tapered end of a column liner and then deformed by a tool which pushes the disk into position within the column liner. The disk may be removed by inserting a rod of appropriate length and width into the column liner and pushing the disks out. The disks are self centering and require no separate carrier. The disks are made from inexpensive materials and are disposable.

公开(公告)号：US4523971A

公开(公告)日：1985-06-18

申请号：US626097

申请日：1984-06-28

Applicant: Jerome J. Cuomo ,  James M. E. Harper ,  Harold R. Kaufman ,  James L. Speidell

Inventor： Jerome J. Cuomo ,  James M. E. Harper ,  Harold R. Kaufman ,  James L. Speidell

IPC: H01J37/08 ,  B23K15/00 ,  C23C14/46 ,  H01J37/09 ,  H01J37/30 ,  H01J37/305 ,  H01J37/317 ,  H01L21/265 ,  B44C1/22 ,  C03C15/00 ,  C03C25/06

CPC classification number: C23C14/46 ,  H01J37/09 ,  H01J37/3053 ,  H01J37/3178

Abstract: This ion beam system provides an ion beam pattern which is produced without the need for a mask. A programmable grid is used in combination with an ion beam source, where the apertures of the programmable grid can have electrical potentials associated therewith which either extract ions or impede the movement of ions through the apertures. Depending upon the electrical biasing provided to each of the apertures of the grid, different patterns of ions can be extracted through the grid. By changing the electrical bias at different locations on the programmable grid, these different patterns are produced. The patterns can be used for many applications, including patterned deposition, patterned etching, and patterned treatment of surfaces.

Abstract translation: 该离子束系统提供在不需要掩模的情况下产生的离子束图案。 可编程栅格与离子束源组合使用，其中可编程栅格的孔可以具有与其相关联的电势，其提取离子或阻止离子通过孔的移动。 取决于提供给栅格的每个孔的电偏压，可以通过栅格提取不同的离子图案。 通过改变可编程网格上不同位置的电气偏压，产生这些不同的图案。 这些图案可以用于许多应用，包括图案化沉积，图案化蚀刻和表面图案化处理。

公开(公告)号：US4445041A

公开(公告)日：1984-04-24

申请号：US269170

申请日：1981-06-02

Applicant: John Kelly ,  Huei P. Kuo ,  Bernard M. Oliver ,  Jack D. Foster ,  Wayne C. Haase

Inventor： John Kelly ,  Huei P. Kuo ,  Bernard M. Oliver ,  Jack D. Foster ,  Wayne C. Haase

IPC: G01R31/302 ,  H01J3/26 ,  H01J37/04 ,  H01J37/09 ,  H01J37/153 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

CPC classification number: H01J37/045 ,  H01J37/09 ,  H01L21/30

Abstract: An electron beam blanker for use in electron beam lithography systems is disclosed which is capable of providing exposure rates on the order of 300MHz at beam currents of approximately 600nA. A condensing lens and a stigmator are provided to bring the electron beam to a small image in a plane perpendicular to the beam direction. An etched silicon knife-edge, coated with gold, is located in this image plane in close proximity to the beam, to provide a sharp cut-off as the beam is swept past its edge. In accordance with aspects of the invention, a deflector plate structure provides an electromagnetic field whose geometry ensures that the velocity of a beam electron, as it exits the field, is substantially directly proportional to the undeflected beam electron's position vector relative to the beam cross-over in the image plane of the condenser lens. Since the image plane of the condensing lens becomes the object plane for a final lens which forms the spot on a point on the resist, the above geometry substantially eliminates spot motion during the blanker rise time.

Abstract translation: 公开了一种用于电子束光刻系统的电子束消隐器，其能够在约600nA的束电流下提供大约300MHz的曝光率。 提供了一个聚光透镜和一个荧光标记器，以使电子束在垂直于光束方向的平面内呈现小的图像。 涂有金的蚀刻硅刀刃位于靠近光束的该图像平面中，以在光束被扫过其边缘时提供尖锐的截止。 根据本发明的方面，偏转板结构提供了电磁场，其几何形状确保了射束电子离开场的速度基本上与未偏转的束电子的位置矢量相对于光束横截面成正比， 在聚光镜的图像平面中。 由于聚光透镜的像面成为在抗蚀剂上形成点的最终透镜的物平面，所以上述几何形状基本上消除了遮光器上升时间期间的光斑运动。

公开(公告)号：US4316090A

公开(公告)日：1982-02-16

申请号：US154824

申请日：1980-05-30

Applicant: Noriyuki Sakudo ,  Katsumi Tokiguchi ,  Hidemi Koike ,  Ichiro Kanomata

Inventor： Noriyuki Sakudo ,  Katsumi Tokiguchi ,  Hidemi Koike ,  Ichiro Kanomata

IPC: H01J27/02 ,  H01J27/16 ,  H01J27/18 ,  H01J37/08 ,  H01J37/09 ,  H01J27/00

CPC classification number: H01J27/18 ,  H01J37/08 ,  H01J37/09

Abstract: A microwave plasma ion source according to this invention is characterized by the construction of the extracting electrode in contact with the discharge chamber. The electrode is divided into a part substantially exposed to a plasma and a remaining part which is not exposed to the plasma. Moreover, both these parts are held in a state in which they are electrically connected with each other.As a result, very little P or As deposits on the surface of the electrode, and a stable high-current ion beam can be supplied over a long period of time.

Abstract translation: 根据本发明的微波等离子体离子源的特征在于与放电室接触的提取电极的结构。 电极被分成基本上暴露于等离子体的部分和不暴露于等离子体的剩余部分。 此外，这两个部件保持在彼此电连接的状态。 结果，可以在长时间内供给在电极表面上沉积很少的P或As和稳定的高电流离子束。

公开(公告)号：US4263514A

公开(公告)日：1981-04-21

申请号：US75354

申请日：1979-09-13

Applicant: John W. Reeds, Jr.

Inventor： John W. Reeds, Jr.

IPC: G21K5/04 ,  H01J37/09 ,  H01J37/30 ,  H01J37/305 ,  H01L21/30 ,  H01J37/147

CPC classification number: H01J37/09 ,  H01J37/3007

Abstract: Electron beam lens 22 can be operated in a first mode to demagnify and focus the image of electron source 14 at image plane 32. Electron optical lens 34 and 46 further demagnify the image plate 32 through the focal point 60 on the face of target 58 to provide a scannable exposure spot. Electron optical lens 22 can be operated in the second mode which floods aperture 32 so that the image of the aperture is demagnified and focused on target 58 to provide a large exposure area.

Abstract translation: 电子束透镜22可以以第一模式操作，以将图像平面32上的电子源14的图像缩小并聚焦。电子光学透镜34和46进一步使图像板32通过目标58的表面上的焦点60缩小到 提供可扫描曝光点。 电子光学透镜22可以在使孔32泛光的第二模式中操作，使得孔径的图像被缩小并聚焦在目标58上以提供较大的曝光面积。

公开(公告)号：US3984687A

公开(公告)日：1976-10-05

申请号：US559275

申请日：1975-03-17

Applicant: Karl H. Loeffler ,  Hans C. Pfeiffer

Inventor： Karl H. Loeffler ,  Hans C. Pfeiffer

IPC: H01J37/09 ,  H01J37/141 ,  H01J37/147 ,  H01J37/30 ,  H01L21/027 ,  H01J37/00

CPC classification number: H01J37/1475 ,  H01J37/09 ,  H01J37/141

Abstract: A shielded magnetic lens and deflection yoke structure for an electron beam column which minimizes aberrations in the lens system caused by winding asymmetry in the field coil, as well as aberrations due to eddy currents created within the magnetic circuit of the lens by interaction with the field of the deflection yoke. The shield includes a polepiece structure for the magnetic electron lens generally comprising a hollow cylinder formed of a plurality of precisely machined magnetic discs stacked concentrically with precisely machined nonmagnetic discs in alternating sequence with the lens coil positioned adjacent the periphery of the cylinder and the deflection yoke positioned within the cylinder or proximate to either end thereof. In one preferred embodiment of the invention the magnetic discs are formed of a nonconductive material such as ferrite and the nonmagnetic discs are formed of alumina.

Abstract translation: 一种用于电子束柱的屏蔽磁透镜和偏转线圈结构，其使由磁场线圈中的不对称性引起的透镜系统中的像差最小化，以及由于通过与场相互作用而在透镜的磁路内产生的涡流造成的像差 的偏转线圈。 屏蔽件包括用于磁性电子透镜的极靴结构，通常包括由多个精密机加工的磁盘形成的中空圆柱体，该多个精密机械加工的磁盘与精密加工的非磁性圆盘同心地堆叠，其中透镜线圈邻近圆柱体的周边定位，偏转线圈 定位在气缸内或靠近其任一端。 在本发明的一个优选实施例中，磁盘由诸如铁氧体的非导电材料形成，非磁性圆盘由氧化铝形成。

公开(公告)号：US3889114A

公开(公告)日：1975-06-10

申请号：US44984474

申请日：1974-03-11

Applicant: PHILIPS CORP

Inventor： JAN VAN OOSTRUM KAREL

IPC: H01J37/22 ,  H01J37/04 ,  H01J37/09 ,  H01J37/26

CPC classification number: H01J37/04 ,  H01J37/265

Abstract: In an electron microscope dark-field illumination is obtained by including an annular diaphragm between the electron source and the second condenser lens and by varying the energisation of the condenser lenses whilst retaining imaging of the electron source on the specimen. The specimen is illuminated by a beam in the form of a hollow cone of varying apical angle. By means of a known objective diaphragm those electrons are selected from the scattered beam for the purpose of image formation which leave the specimen within a narrow cone about the optical axis, irrespective of the angle of incidence.

Abstract translation: 在电子显微镜中，通过在电子源和第二聚光透镜之间包括环形光阑并且通过改变聚光透镜的激发同时保持样品上的电子源的成像来获得暗场照明。 样品由具有不同顶角的中空锥体形式的光束照射。 通过已知的目标光阑，为了成像的目的，从散射光束中选出这些电子，不管入射角如何，将样品留在围绕光轴的窄锥体内。

公开(公告)号：US3809899A

公开(公告)日：1974-05-07

申请号：US28137572

申请日：1972-08-17

Applicant: TEKTRONIX INC

Inventor： BAKER T ,  BALSIGER M ,  CONSIDINE K ,  LITSJO H

IPC: H01J37/06 ,  H01J37/067 ,  H01J37/073 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J37/26

CPC classification number: H01J37/073 ,  H01J37/09 ,  H01J2237/06316

Abstract: An electron-beam tube for a scanning electron microscope employs the use of a TF built-up field emission cathode which can be operated from preferably the 100 plane in a substantially continuous mode to provide a stable electron beam having high current density, high resolution, and very high electron optical brightness from a source of very small proportions. The tube, which comprises an evacuated envelope having chambers of different vacuums, is designed to facilitate either quick-change cathode replacement or attendance to the specimen with minimum loss of operating time since the vacuum of the entire tube need not be released. Also, the chamber containing the field emission cathode can be separable from the tube to allow replacement by a new preprocessed cathode in a pre-evacuated chamber. In this case, the mounting means includes a device for puncturing a seal in the cathode chamber to allow the electron beam to pass therethrough.

Abstract translation: 用于扫描电子显微镜的电子束管采用使用TF组合场致发射阴极，其能够以基本上连续的模式从优选的100平面操作，以提供具有高电流密度，高分辨率的稳定电子束， 和非常高的电子光学亮度来自非常小比例的来源。 包括具有不同真空腔室的真空外壳的管子被设计成便于快速更换阴极更换或者以最小的操作时间损失对试样的出现，因为整个管的真空度不需要被释放。 此外，包含场发射阴极的室可以与管分离，以允许在预抽真空室中由新的预处理阴极替换。 在这种情况下，安装装置包括用于刺穿阴极室中的密封以允许电子束通过的装置。

公开(公告)号：US3308325A

公开(公告)日：1967-03-07

申请号：US30234963

申请日：1963-08-15

Applicant: BENDIX BALZERS VACUUM INC

Inventor： FRANCOIS GAYDOU

IPC: H01J37/06 ,  H01J37/09 ,  H01J37/24 ,  H01J37/301

CPC classification number: H01J37/24 ,  H01J37/06 ,  H01J37/09 ,  H01J37/301

公开(公告)号：US3150257A

公开(公告)日：1964-09-22

申请号：US20768162

申请日：1962-07-05

Applicant: PHILIPS ELECTRONIC PHARMA

Inventor： WILSKA ALVAR P

IPC: H01J37/09

CPC classification number: H01J37/09