公开(公告)号：US09455119B2

公开(公告)日：2016-09-27

申请号：US14665391

申请日：2015-03-23

申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

发明人： Makoto Sato ,  Tatsuya Asahata ,  Masahiro Kiyohara ,  Ikuko Nakatani

IPC分类号： H01J37/26 ,  G21K5/04 ,  H01J37/28

CPC分类号： H01J37/28 ,  H01J37/265 ,  H01J2237/30438

摘要： A charged particle beam apparatus is provided with a controller configured to control other components and perform operations including: an irradiating operation to irradiate a first position of a sample with a charged particle beam while gradually changing a scan range of the charged particle beam to move from a first position; a first image acquiring operation to acquire an image of each portion where the charged particle beam moves; an indicator forming operation to form an indicator at a second position by the charged particle beam when the scan range of the charged particle beam reaches the second position; a second image acquiring operation to acquire an image of the second position in a state where the indicator is formed; and an adjusting operation to adjust relative position between the stage and the scan range of the charged particle beam.

摘要翻译： 带电粒子束装置设置有控制器，其被配置为控制其他部件并执行操作，包括：照射操作，用于在逐渐改变带电粒子束的扫描范围以从 第一职位 第一图像获取操作，用于获取所述带电粒子束移动的每个部分的图像; 指示器形成操作，当带电粒子束的扫描范围达到第二位置时，通过带电粒子束在第二位置形成指示器; 第二图像获取操作，用于在形成指示器的状态下获取第二位置的图像; 以及调整操作，以调整带电粒子束的阶段和扫描范围之间的相对位置。

公开(公告)号：US20160139510A1

公开(公告)日：2016-05-19

申请号：US14940349

申请日：2015-11-13

申请人： CANON KABUSHIKI KAISHA

发明人： Yuichi Iwasaki ,  Satoru Oishi ,  Hideki Ina

IPC分类号： G03F7/26

CPC分类号： G03F9/70 ,  G03F9/7088 ,  H01J2237/30438 ,  H01J2237/3175

摘要： The present invention provides a lithography apparatus including a plurality of detectors each configured to detect a mark on the substrate, and a controller configured to control a patterning so that a first operation and a second operation are alternately performed, the first operation irradiating the substrate with a beam while scan movement of the substrate is performed in a first direction, the second operation performing step movement of the substrate in a second direction different from the first direction, wherein the controller is configured to cause, in the first operation, at least one of the plurality of detectors to detect the mark, and the plurality of detectors are arranged, in the second direction, at an interval which is a positive integer multiple of a distance of the step movement.

摘要翻译： 本发明提供了一种光刻设备，其包括多个检测器，每个检测器被配置为检测基板上的标记;以及控制器，被配置为控制图案化，使得交替执行第一操作和第二操作，第一操作照射基板 在第一方向进行基板的扫描运动时的光束，所述第二操作在与所述第一方向不同的第二方向上执行所述基板的步进移动，其中所述控制器被配置为在所述第一操作中使至少一个 以检测标记，并且所述多个检测器在所述第二方向上以所述台阶移动的距离的正整数倍的间隔排列。

公开(公告)号：US20150311036A1

公开(公告)日：2015-10-29

申请号：US14674054

申请日：2015-03-31

申请人： NuFlare Technology, Inc.

发明人： Keita IDENO

IPC分类号： H01J37/304 ,  H01J37/302 ,  H01J37/317 ,  H01J37/20

CPC分类号： H01J37/3174 ,  H01J37/20 ,  H01J2237/20292 ,  H01J2237/30438

摘要： A charged particle beam drawing apparatus according to an embodiment includes; a vacuum vessel including a base plate; a stage provided in the vacuum vessel. and supporting a sample; a stage movement mechanism provided in the vacuum vessel and moving the stage; a two-dimensional scale provided on a lower surface of the stage; a detection unit disposed under the two-dimensional scale and detecting a position of the stage by using the two-dimensional scale; and a support body supporting the detection unit.

摘要翻译： 根据实施例的带电粒子束描绘装置包括： 真空容器，包括基板; 设置在真空容器中的阶段。 并支持样本; 设置在真空容器中并移动台的台架移动机构; 设置在舞台的下表面上的二维刻度; 设置在所述二维刻度下的检测单元，并且通过使用所述二维刻度来检测所述载物台的位置; 以及支撑所述检测单元的支撑体。

公开(公告)号：US20150268032A1

公开(公告)日：2015-09-24

申请号：US14716801

申请日：2015-05-19

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Guido de Boer ,  Thomas Adrian Ooms ,  Niels Vergeer ,  Godefridus Cornelius Antonius Couweleers

IPC分类号： G01B9/02

CPC分类号： G03F7/70775 ,  G01B9/02007 ,  G01B9/02015 ,  G03F7/70833 ,  G03F7/7085 ,  H01J2237/30438

摘要： The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.

摘要翻译： 本发明涉及一种用于测量参考反射镜和测量镜之间的位移方向的差分干涉仪模块。 在一个实施例中，差分干涉仪模块适于朝向第一反射镜发射三个参考光束，并且三个测量光束朝向第二反射镜发射以确定所述第一和第二反射镜之间的位移。 在优选实施例中，相同的模块也用于测量围绕两个垂直轴的相对旋转。 本发明还涉及包括这种干涉仪模块的光刻系统和用于测量这种位移和旋转的方法。

公开(公告)号：US20150261099A1

公开(公告)日：2015-09-17

申请号：US14637995

申请日：2015-03-04

申请人： CANON KABUSHIKI KAISHA

发明人： Toshiro Yamanaka

IPC分类号： G03F7/20

CPC分类号： G03F7/70141 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/30438

摘要： A lithography apparatus advantageous in increasing both a throughput and overlay accuracy is provided. The apparatus includes a plurality of charged particle optical systems each irradiating a substrate with a charged particle beam, and a plurality of alignment sensors including an alignment sensor located among the plurality of charged particle optical systems. A processor generates, in parallel with a patterning, information on at least one of a position and a shape of a region on the substrate based on outputs from the plurality of alignment sensors.

摘要翻译： 提供了有利于增加吞吐量和重叠精度的光刻设备。 该装置包括：多个带电粒子光学系统，每个带有带电粒子束的衬底照射;以及多个对准传感器，包括位于多个带电粒子光学系统之间的对准传感器。 基于来自多个对准传感器的输出，处理器与图案平行地产生关于基板上的区域的位置和形状中的至少一个的信息。

公开(公告)号：US08748843B2

公开(公告)日：2014-06-10

申请号：US13568657

申请日：2012-08-07

申请人： Kaoru Tsuruta

发明人： Kaoru Tsuruta

IPC分类号： H01J37/304

CPC分类号： H01J37/3045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/20292 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2826 ,  H01J2237/30433 ,  H01J2237/30438 ,  H01J2237/30455

摘要： A charged particle beam drawing apparatus of an embodiment includes: a drawing unit to perform drawing on a workpiece on a stage by using a charged particle beam; multiple marks located on the stage and having different heights; an irradiation position detector to, when any of the marks is irradiated with the charged particle beam, detect an irradiation position of the charged particle beam on a mark surface of the mark; a drift-amount calculation unit to calculate a drift amount of the charged particle beam on the mark surface by using the irradiation position; a drift-amount processing unit to obtain a drift amount on a workpiece surface by using the drift amounts on at least two of the mark surfaces; and a drawing controller to correct an is irradiation position of the charged particle beam by using the drift amount on the workpiece surface.

摘要翻译： 一个实施例的带电粒子束描绘装置包括：拉伸单元，用于通过使用带电粒子束来对载物台上的工件进行拉伸; 多个标记位于舞台上，具有不同的高度; 照射位置检测器，当利用带电粒子束照射任何标记时，检测带电粒子束在标记的标记表面上的照射位置; 漂移量计算单元，用于通过使用照射位置来计算带电粒子束在标记表面上的漂移量; 漂移量处理单元，通过使用至少两个标记表面上的漂移量来获得在工件表面上的漂移量; 并且通过使用工件表面上的漂移量来校正所述带电粒子束的照射位置的绘图控制器。

公开(公告)号：US08724115B2

公开(公告)日：2014-05-13

申请号：US13914351

申请日：2013-06-10

申请人： KLA-Tencor Corporation

发明人： Upendra Ummethala ,  Layton Hale ,  Josh Clyne ,  Samir Nayfeh ,  Mark Williams ,  Joseph A. DiRegolo ,  Andrew Wilson

IPC分类号： G01B11/02

CPC分类号： G01B11/02 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  G01B21/16 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70816 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3174 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/30433 ,  H01J2237/30438

摘要： A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.

摘要翻译： 适用于REBL的舞台计量包括配置成测量短行晶片扫描台的位置和旋转的干涉仪台计量系统，其中干涉仪计量系统包括用于每个测量轴的两个或更多个干涉仪，其中第一干涉仪镜是 设置在短冲程晶片扫描台的第一表面上，第二干涉仪镜设置在短行晶片扫描台的第二表面上;以及控制系统，被配置为使用两个第二干涉仪来确定第一干涉仪镜的形状误差 或更多的来自与第一干涉仪镜相关联的两个或更多个干涉仪的干涉仪测量，以及使用来自与第二干涉仪镜相关联的两个或更多个干涉仪的两个或更多个干涉仪测量的第二干涉仪镜的形状误差。

公开(公告)号：US20130325393A1

公开(公告)日：2013-12-05

申请号：US13488446

申请日：2012-06-05

申请人： Motohiko Masuda

发明人： Motohiko Masuda

IPC分类号： G06F7/00 ,  G06F15/00

CPC分类号： G06T5/006 ,  G06T2207/30148 ,  H01J2237/30438

摘要： A method for determining the coordinates of a point on the surface of an object is provided. A source system, such as an OBIRCH system, is used to analyze and detect faults in an integrated circuit on a semiconductor die. The die includes three reference points and the detected fault(s) are defined with reference to the reference points. When the die is transferred to a FIB or other system for fault analysis, a processor determines the coordinates of the fault(s) for the FIB system using the three reference points.

摘要翻译： 提供了一种用于确定物体表面上的点的坐标的方法。 诸如OBIRCH系统的源系统用于分析和检测半导体管芯上的集成电路中的故障。 模具包括三个参考点，并且参考参考点定义检测到的故障。 当芯片转移到FIB或其他系统进行故障分析时，处理器使用三个参考点确定FIB系统的故障坐标。

公开(公告)号：US20130224662A1

公开(公告)日：2013-08-29

申请号：US13772419

申请日：2013-02-21

申请人： CANON KABUSHIKI KAISHA

发明人： Takehiko SUZUKI

IPC分类号： H01J37/317 ,  G03F7/20

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/24535 ,  H01J2237/30438

摘要： A charged particle beam apparatus, which processes an object with a charged particle beam, includes: a detector having a detection surface, and configured to detect a charged particle beam incident on a partial region of the detection surface; and a controller configured to make target incident positions of charged particle beams, to be sequentially incident on the detection surface, different from each other.

摘要翻译： 一种带有带电粒子束处理物体的带电粒子束装置，包括：检测器，具有检测表面，并且被配置为检测入射在检测表面的部分区域上的带电粒子束; 以及控制器，被配置为使得被顺序地入射在检测表面上的带电粒子束的目标入射位置彼此不同。

公开(公告)号：US08399833B2

公开(公告)日：2013-03-19

申请号：US12722922

申请日：2010-03-12

申请人： Shusuke Yoshitake

发明人： Shusuke Yoshitake

IPC分类号： H01J37/244

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/20 ,  H01J2237/2482 ,  H01J2237/30438 ,  H01J2237/30455

摘要： The reference mark has steps and is formed on a sample. A stage moves in X and Y directions. The sample M is placed on the stage. An optical lever type height position sensor emits light to detect the reference mark FM′ by the stage being scanned. The spot position of light reflected on the sample is detected in position sensitive detector. The X and Y coordinates of the position of the stage positioned when the spot position of the reflected light is changed is detected. The detected X and Y coordinates are regarded as the position C of the reference mark FM′. The position of a phase defect D located in the sample M is specified on the basis of the position C of the reference mark FM′. The position of a portion on which writing is to be performed is determined on the basis of a relationship with the specified position of the phase defect D.

摘要翻译： 参考标记具有步骤并形成在样品上。 舞台在X和Y方向移动。 将样品M放置在舞台上。 光杆式高度位置传感器发射光，以便在被扫描的阶段检测参考标记FM'。 在位置敏感检测器中检测到样品反射的光的位置。 检测当反射光的光点位置改变时定位的平台的位置的X和Y坐标。 检测出的X和Y坐标被认为是参考标记FM'的位置C. 基于参考标记FM'的位置C来指定位于样本M中的相位缺陷D的位置。 基于与相位缺陷D的指定位置的关系来确定要进行写入的部分的位置。