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    Drift compensation for scanning probe microscopes using an enhanced probe positioning system
    92.
    发明授权
    Drift compensation for scanning probe microscopes using an enhanced probe positioning system 失效
    使用增强型探针定位系统扫描探针显微镜的漂移补偿

    公开(公告)号：US5077473A

    公开(公告)日：1991-12-31

    申请号：US558225

    申请日：1990-07-26

    Applicant: Virgil B. Elings ,  John A. Gurley ,  Mark R. Rodgers

    Inventor： Virgil B. Elings ,  John A. Gurley ,  Mark R. Rodgers

    IPC: G01Q10/00 ,  G01Q10/06 ,  G01Q30/06

    CPC classification number: G01Q10/06 ,  B82Y35/00 ,  G01Q30/06 ,  Y10S977/851

    Abstract: This invention is an enhanced probe positioning technique for Scanning Tunneling Microscopes, Atomic Force Microscopes, and other scanning probe microscopes. The invention has particular application for drift compensation. The invention adds a controllable motion to the probe that is totally independent of the scanning or other probe positioning. If the drift velocity is known, the invention can be used to compensate for the drift. In addition, several implementations are shown for measuring drift velocity. One method has the operator identify a significant feature of the acquired image on separate frames of data. The shift of this pattern or feature, along with the time between frames, can be used to calculate the drift velocity. Two methods are described that utilize the frequency shift of the image spatial spectrum due to the effect of the drift velocity on bi-directional scans. Another method is described that derives drift velocity and direction from the correlation of separate frames of data. The invention can also be used to compensate for predicted drift, such as the drift after a scan area offset.

    Abstract translation: 本发明是用于扫描隧道显微镜，原子力显微镜和其它扫描探针显微镜的增强的探针定位技术。 本发明特别适用于漂移补偿。 本发明为探针增加了完全独立于扫描或其他探针定位的可控运动。 如果漂移速度是已知的，本发明可以用于补偿漂移。 另外，示出了用于测量漂移速度的几个实施方案。 一种方法使操作者在单独的数据帧上识别所获取的图像的显着特征。 这种图案或特征的移动以及帧之间的时间可以用于计算漂移速度。 描述了利用漂移速度对双向扫描的影响的图像空间频谱的频移的两种方法。 描述了从单独的数据帧的相关性导出漂移速度和方向的另一种方法。 本发明还可以用于补偿预测漂移，例如扫描区域偏移之后的漂移。

    POSITIONING SYSTEM AND METHOD
    93.
    发明公开
    POSITIONING SYSTEM AND METHOD 审中-公开

    公开(公告)号：US20240295583A1

    公开(公告)日：2024-09-05

    申请号：US18272640

    申请日：2022-01-24

    Applicant: Nearfield Instruments B.V.

    Inventor： Hamed SADEGHIAN MARNANI ,  Ioan-Andrei TOACSEN

    IPC: G01Q20/02 ,  G01Q30/06 ,  G01Q40/00

    CPC classification number: G01Q20/02 ,  G01Q30/06 ,  G01Q40/00

    Abstract: A grid plate encoder based positioning system (1) for positioning of an element is provided, the positioning system (1) comprises



    a grid plate (2) with a grid plate surface (21);
    an encoder unit (3) with one or more optical sensors (31) for sensing a grid plate surface pattern (23) of the grid plate surface (21);
    an input (7) to receive coordinates (Xd, Yd) specifying a desired position of the element;
    a mapping unit (8) to compute compensated coordinate data (Xa, Ya) corresponding to estimated position data expected from the encoder unit (3) when the element is positioned at a desired position (Xd, Yd) specified by the setpoint coordinates;
    a feedback control unit (9) providing the compensated coordinate data (Xa, Ya) as a setpoint (Xs, Ys) to a positioning unit (12), with feedback control based on the estimated position data obtained from the encoder unit.




    Additionally, a grid plate encoder based positioning method and a method for computing compensation data are provided.

    Method for detecting mechanical and magnetic features with nanoscale resolution
    95.
    发明授权
    Method for detecting mechanical and magnetic features with nanoscale resolution 有权

    公开(公告)号：US11835547B2

    公开(公告)日：2023-12-05

    申请号：US17680340

    申请日：2022-02-25

    Applicant: National Cheng Kung University

    Inventor： Yi-Chun Chen ,  Yi-De Liou ,  Yi-Hsin Weng

    IPC: G01Q30/06 ,  G01Q60/38 ,  B82Y35/00

    CPC classification number: G01Q30/06 ,  B82Y35/00 ,  G01Q60/38

    Abstract: The method for detecting mechanical and magnetic features comprises the steps of: aiming a probe of the sensor at a sample; defining several detected points for detection on the sample; detecting one of points and comprising the steps of: approaching the probe to the detected point from a predetermined height; contacting the probe with the detected point and applying a predetermined force on the detected point; making the probe far away from the detected point until to the predetermined height; shifting the probe to the next point for detection and repeating the detection; collecting the data of each of the detected points while the probe rapidly approaches to the points from the predetermined height; using a signal decomposition algorithm to transform the collected data to a plurality of data groups; and choosing a part of the data groups to be as data of feature distributions of the sample.

    SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMENTS
    97.
    发明申请
    SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMENTS 审中-公开

    公开(公告)号：US20190164303A1

    公开(公告)日：2019-05-30

    申请号：US16218346

    申请日：2018-12-12

    Applicant: FRACTILIA, LLC

    Inventor： Chris MACK

    IPC: G06T7/40 ,  G06T7/13

    CPC classification number: H01J37/222 ,  G01Q30/02 ,  G01Q30/06 ,  G06T5/002 ,  G06T7/13 ,  G06T7/40 ,  G06T7/42 ,  G06T7/49 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/28 ,  H01J2237/2814 ,  H01J2237/2817

    Abstract: Systems and methods are disclosed that remove noise from roughness measurements to determine roughness of a feature in a pattern structure. In one embodiment, a method for determining roughness of a feature in a pattern structure includes generating, using an imaging device, a set of one or more images, each including measured linescan information that includes noise. The method also includes detecting edges of the features within the pattern structure of each image without filtering the images, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements, evaluating a high-frequency portion of the biased PSD dataset to determine a noise model for predicting noise over all frequencies of the biased PSD dataset, and subtracting the noise predicted by the determined noise model from a biased roughness measure to obtain an unbiased roughness measure.

    Method and apparatus to compensate for deflection artifacts in an atomic force microscope
    100.
    发明授权
    Method and apparatus to compensate for deflection artifacts in an atomic force microscope 有权

    公开(公告)号：US09739799B2

    公开(公告)日：2017-08-22

    申请号：US14193138

    申请日：2014-02-28

    Applicant: Bruker Nano, Inc.

    Inventor： Chanmin Su ,  Shuiqing Hu

    IPC: G01Q30/06 ,  G01Q40/00 ,  G01Q60/34

    CPC classification number: G01Q40/00 ,  G01Q30/06 ,  G01Q60/34 ,  G01Q60/58

    Abstract: A method of compensating for an artifact in data collected using a standard atomic force microscope (AFM) operating in an oscillating mode. The artifact is caused by deflection of the probe not related to actual probe-sample interaction and the method includes compensating for thermal induced bending of the probe of the AFM by measuring a DC component of the measured deflection. The DC component of deflection is identified by calibrating the optical deflection detection apparatus and monitoring movement of the mean deflection, thereby allowing the preferred embodiments to minimize the adverse effect due to the artifact. Notably, plotting the DC deflection profile yields a corresponding temperature profile of the sample.

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