公开(公告)号：US09910064B2

公开(公告)日：2018-03-06

申请号：US15438429

申请日：2017-02-21

Applicant: Bruker Nano, Inc.

Inventor： Changchun Liu ,  Bede Pittenger ,  Shuiqing Hu ,  Chanmin Su

IPC: G01Q10/06

CPC classification number: G01Q10/065 ,  G01Q10/06 ,  G01Q30/06

Abstract: An atomic force microscope (AFM) and corresponding method to provide low force (sub-20 pN) AFM control and mechanical property measurement is provided. The preferred embodiments employ real-time false deflection correction/discrimination by adaptively modifying the drive ramp to accommodate to deflection artifacts.

公开(公告)号：US20160341763A1

公开(公告)日：2016-11-24

申请号：US15158779

申请日：2016-05-19

Applicant: Carl Zeiss SMT GmbH

Inventor： Michael Budach ,  Thorsten Hofmann ,  Klaus Edinger ,  Pawel Szych ,  Gabriel Baralia

IPC: G01Q30/02

CPC classification number: G01Q30/02 ,  G01B11/14 ,  G01Q30/06 ,  G03F1/84

Abstract: The present invention relates to apparatuses and methods for examining a surface of a test object, such as e.g. a lithography mask. In accordance with one aspect of the invention, an apparatus for examining a surface of a mask comprises a probe which interacts with the surface of the mask, and a measuring apparatus for establishing a reference distance of the mask from a reference point, wherein the measuring apparatus measures the reference distance of the mask in a measurement region of the mask which is not arranged on the surface of the mask.

Abstract translation: 本发明涉及用于检查被测物体的表面的装置和方法， 光刻面具。 根据本发明的一个方面，一种用于检查掩模表面的装置包括与掩模的表面相互作用的探针和用于建立掩模与参考点的参考距离的测量装置，其中测量 设备测量掩模的未布置在掩模表面上的掩模的测量区域中的掩模的参考距离。

公开(公告)号：US09150415B2

公开(公告)日：2015-10-06

申请号：US12179688

申请日：2008-07-25

Applicant: Lin Zhou ,  Huiwen Liu ,  Dale Egbert ,  Jonathan A. Nelson ,  Jianxin Zhu

Inventor： Lin Zhou ,  Huiwen Liu ,  Dale Egbert ,  Jonathan A. Nelson ,  Jianxin Zhu

IPC: G01B7/34 ,  B82Y35/00 ,  G01Q30/06 ,  G01Q40/00

CPC classification number: G01Q40/00 ,  B82Y35/00 ,  G01Q30/06

Abstract: A topographic profile of a structure is generated using atomic force microscopy. The structure is scanned such that an area of interest of the structure is scanned at a higher resolution than portions of the structure outside of the area of interest. An profile of the structure is then generated based on the scan. To correct skew and tilt of the profile, a first feature of the profile is aligned with a first axis of a coordinate system. The profile is then manipulated to align a second feature of the profile with a second axis of the coordinate system.

Abstract translation: 使用原子力显微镜产生结构的形貌。 扫描该结构使得结构的感兴趣区域以比目标区域外的结构的部分更高的分辨率被扫描。 然后基于扫描生成结构的轮廓。 为了校正轮廓的偏斜和倾斜，轮廓的第一特征与坐标系的第一轴对齐。 然后对该轮廓进行操纵以将轮廓的第二特征与坐标系的第二轴对齐。

公开(公告)号：US20150247881A1

公开(公告)日：2015-09-03

申请号：US14193138

申请日：2014-02-28

Applicant: Bruker Nano, Inc.

Inventor： Chanmin Su ,  Shuiqing Hu

IPC: G01Q10/00

CPC classification number: G01Q40/00 ,  G01Q30/06 ,  G01Q60/34 ,  G01Q60/58

Abstract: A method of compensating for an artifact in data collected using a standard atomic force microscope (AFM) operating in an oscillating mode. The artifact is caused by deflection of the probe not related to actual probe-sample interaction and the method includes compensating for thermal induced bending of the probe of the AFM by measuring a DC component of the measured deflection. The DC component of deflection is identified by calibrating the optical deflection detection apparatus and monitoring movement of the mean deflection, thereby allowing the preferred embodiments to minimize the adverse effect due to the artifact. Notably, plotting the DC deflection profile yields a corresponding temperature profile of the sample.

Abstract translation: 使用以振荡模式操作的标准原子力显微镜（AFM）收集的数据中补偿伪影的方法。 该伪影是由与探头 - 样本相互作用无关的探针的偏转引起的，该方法包括通过测量测得的偏转的直流分量来补偿AFM的探针的热诱导弯曲。 通过校准光学偏转检测装置和监测平均偏转的运动来识别偏转的直流分量，从而允许优选实施例将由于伪像引起的不利影响降至最低。 值得注意的是，绘制直流偏转曲线得到相应的样品温度曲线。

公开(公告)号：US20150241469A1

公开(公告)日：2015-08-27

申请号：US14630074

申请日：2015-02-24

Applicant: Bruker Nano, Inc.

Inventor： Jason Osborne ,  Eric Milligan ,  Andrew Lopez ,  Robert Wu ,  Sean Hand ,  Vladimir Fonoberov

IPC: G01Q10/02

CPC classification number: G01Q10/02 ,  G01Q10/065 ,  G01Q30/06

Abstract: A scanning probe microscope (SPM) system and associated method. The SPM system having a probe adapted to interact with nanoscale features of a sample and scan within a target region to produce a three-dimensional image of that target region, the system maintaining location information for a plurality of features of interest of the sample according to a sample-specific coordinate system, wherein the SPM system is configured to adjust positioning of the probe relative to the sample according to a SPM coordinate system, the SPM system further configured to manage a dynamic relationship between the sample-specific coordinate system and the SPM coordinate system by determining a set of alignment errors between the sample-specific coordinate system and the SPM coordinate system and apply corrections to the SPM coordinate system to offset the determined alignment errors.

Abstract translation: 扫描探针显微镜（SPM）系统及相关方法。 所述SPM系统具有适于与样本的纳米尺度特征相互作用以及在目标区域内扫描以产生所述目标区域的三维图像的探针，所述系统根据所述样本维持所述样本感兴趣的多个特征的位置信息 特定于样本的坐标系，其中所述SPM系统被配置为根据SPM坐标系来调整所述探针相对于所述样本的定位，所述SPM系统还被配置为管理所述样本特定坐标系和所述SPM之间的动态关系 通过确定样本特定坐标系和SPM坐标系之间的一组对准误差来对坐标系进行校正，并对SPM坐标系进行校正以偏移所确定的对准误差。

公开(公告)号：US20150160259A1

公开(公告)日：2015-06-11

申请号：US14563826

申请日：2014-12-08

Applicant: Bruker Nano, Inc.

Inventor： Changchun Liu ,  Bede Pittenger ,  Shuiqing Hu ,  Chanmin Su

IPC: G01Q10/00 ,  G01Q60/38

CPC classification number: G01Q10/065 ,  G01Q10/06 ,  G01Q30/06

Abstract: An atomic force microscope (AFM) and corresponding method to provide low force (sub-20 pN) AFM control and mechanical property measurement is provided. The preferred embodiments employ real-time false deflection correction/discrimination by adaptively modifying the drive ramp to accommodate to deflection artifacts.

Abstract translation: 提供了一种原子力显微镜（AFM）和相应的提供低力（sub-20 pN）AFM控制和力学性能测量的方法。 优选实施例通过自适应地修改驱动斜坡以适应偏转伪影来采用实时假偏转校正/辨别。

公开(公告)号：US08316698B2

公开(公告)日：2012-11-27

申请号：US12640853

申请日：2009-12-17

Applicant: Michael Budach

Inventor： Michael Budach

IPC: G01B5/28

CPC classification number: G03F1/74 ,  G01Q30/06 ,  G01Q80/00 ,  G03F1/84 ,  H01J2237/2817 ,  Y10T29/49718

Abstract: Determining a repairing form of a defect at or close to an edge of a substrate. The defect may be scanned with a scanning probe microscope to determine a three-dimensional contour of the defect. The defect may be scanned with a scanning particle microscope to determine the shape of the at least one edge of the substrate. The repairing form of the defect may be determined from a combination of the three-dimensional contour and the shape of the at least one edge.

Abstract translation: 确定在或接近基底边缘的缺陷的修复形式。 可以用扫描探针显微镜扫描缺陷以确定缺陷的三维轮廓。 可以用扫描微粒显微镜扫描缺陷以确定衬底的至少一个边缘的形状。 可以从三维轮廓和至少一个边缘的形状的组合来确定缺陷的修复形式。

公开(公告)号：US07987006B2

公开(公告)日：2011-07-26

申请号：US11846746

申请日：2007-08-29

Applicant: Daniel Y Abramovitch ,  Storrs T. Hoen ,  Richard K. Workman

Inventor： Daniel Y Abramovitch ,  Storrs T. Hoen ,  Richard K. Workman

IPC: G05B13/02 ,  G06F19/00

CPC classification number: G01Q10/065 ,  G01Q30/06

Abstract: Linear PID controllers have a transfer function that resembles the frequency response of a notch filter. The PID parameters, KP, KI, and KD (proportional, integral, and derivative gains, respectively) can be extracted from the parameters of a linear notch filter. The linearized modes of scanning probe microscope (SPM) actuators have frequency responses that resemble those of simple second order resonance. Reasonable feedback control can be achieved by an inverse dynamics model of the resonance. A properly parameterized notch filter can cancel the dynamics of a resonance to give good closed-loop response.

Abstract translation: 线性PID控制器具有类似于陷波滤波器的频率响应的传递函数。 可以从线性陷波滤波器的参数中提取PID参数，KP，KI和KD（分别为比例积分和微分增益）。 扫描探针显微镜（SPM）致动器的线性化模式具有类似于简单二阶共振的频率响应。 可以通过谐振的逆动力学模型来实现合理的反馈控制。 正确参数化的陷波滤波器可以消除谐振的动力学，以提供良好的闭环响应。

公开(公告)号：US20110138505A1

公开(公告)日：2011-06-09

申请号：US12854112

申请日：2010-08-10

Applicant: Lin Zhou ,  Huiwen Liu ,  Dale Egbert ,  Peter Gunderson ,  John Ibele ,  Kah Choong Loo ,  Cing Siong Ling

Inventor： Lin Zhou ,  Huiwen Liu ,  Dale Egbert ,  Peter Gunderson ,  John Ibele ,  Kah Choong Loo ,  Cing Siong Ling

IPC: G01Q30/04 ,  G01Q10/00

CPC classification number: G01Q40/00 ,  B82Y35/00 ,  G01Q30/06

Abstract: An apparatus and associated method for topographically characterizing a workpiece. A scanning probe obtains topographical data from the workpiece. A processor controls the scanning probe to scan a reference surface of the workpiece to derive a first digital file and to scan a surface of interest that includes at least a portion of the reference surface to derive a second digital file. Correlation pattern recognition logic integrates the first and second digital files together to align the reference surface with the surface of interest.

Abstract translation: 一种用于地形学表征工件的装置和相关方法。 扫描探头从工件获取地形数据。 处理器控制扫描探针扫描工件的参考表面以导出第一数字文件并扫描包括参考表面的至少一部分的感兴趣的表面以导出第二数字文件。 相关模式识别逻辑将第一和第二数字文件集成在一起以将参考表面与感兴趣的表面对齐。

公开(公告)号：US20100235956A1

公开(公告)日：2010-09-16

申请号：US12404849

申请日：2009-03-16

Applicant: Huiwen Liu ,  Lin Zhou ,  Dale Egbert ,  Jonathan Arland Nelson ,  Peter Gunderson

Inventor： Huiwen Liu ,  Lin Zhou ,  Dale Egbert ,  Jonathan Arland Nelson ,  Peter Gunderson

IPC: G12B21/08

CPC classification number: G01Q30/06

Abstract: An atomic force microscopy (AFM) method includes a scanning probe that scans a surface of a structure to produce a first structure image. The structure is then rotated by 90° with respect to the scanning probe. The scanning probe scans the surface of the structure again to produce a second structure image. The first and second structure images are combined to produce best fit image of the surface area of the structure. The same method is used to produce the best fit image of a flat standard. The best fit image of the flat standard is subtracted from the best fit image of the structure to obtain a true topographical image in which Z direction run out error is substantially reduced or eliminated.

Abstract translation: 原子力显微镜（AFM）方法包括扫描结构的表面以产生第一结构图像的扫描探针。 然后将结构相对于扫描探针旋转90°。 扫描探针再次扫描结构的表面以产生第二结构图像。 第一和第二结构图像被组合以产生结构的表面积的最佳拟合图像。 使用相同的方法来产生平坦标准的最佳拟合图像。 从结构的最佳拟合图像中减去平面标准的最佳拟合图像，以获得其中Z方向耗尽误差大大降低或消除的真实地形图像。