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公开(公告)号:US20210035807A1
公开(公告)日:2021-02-04
申请号:US17072521
申请日:2020-10-16
发明人: Yusheng LIN , Michael J. SEDDON , Francis J. CARNEY , Takashi NOMA , Eiji KUROSE
摘要: Implementations of a semiconductor package may include a semiconductor die including a first side and a second side where the first side of the semiconductor die includes one or more electrical contacts; a layer of metal coupled to the second side of the semiconductor; and a stress balance structure coupled to one of the layer of metal or around the one or more electrical contacts.
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公开(公告)号:US20240290736A1
公开(公告)日:2024-08-29
申请号:US18175079
申请日:2023-02-27
发明人: Shinzo ISHIBE , Takashi NOMA
IPC分类号: H01L23/00
CPC分类号: H01L24/03 , H01L24/05 , H01L2224/0219 , H01L2224/03013 , H01L2224/03462 , H01L2224/03464 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05164 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05664
摘要: Implementations of a method of forming an over pad metallization structure may include providing a semiconductor substrate including a plurality of copper pads on a first side of the semiconductor substrate; electroless plating an over pad metallization including nickel, palladium, and gold onto each copper pad of the plurality of copper pads; and patterning a layer of photoresist onto the over pad metallization of each copper pad of the plurality of copper pads. The method may include forming a mold compound over the plurality of copper pads, the over pad metallization, and the layer of photoresist of each copper pad; removing a portion of the mold compound and a portion of the layer of photoresist of each copper pad of the plurality of copper pads; and removing the layer of photoresist to expose the over pad metallization of each copper pad of the plurality of copper pads.
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公开(公告)号:US20200243366A1
公开(公告)日:2020-07-30
申请号:US16505949
申请日:2019-07-09
发明人: Michael J. SEDDON , Takashi NOMA
IPC分类号: H01L21/68 , H01L21/78 , H01L23/544
摘要: Implementations of a method of making a plurality of alignment marks on a wafer may include: providing a wafer including an alignment feature on a first side of the wafer. The method may include aligning the wafer using a camera focused on the first side of the wafer. The wafer may be aligned using the alignment feature on the first side of the die. The wafer may also include creating a plurality of alignment marks on a second side of the wafer through lasering, sawing, or scribing.
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公开(公告)号:US20190287913A1
公开(公告)日:2019-09-19
申请号:US15921898
申请日:2018-03-15
发明人: Yusheng LIN , Takashi NOMA , Francis J. CARNEY
IPC分类号: H01L23/532 , H01L23/00
摘要: Implementations of semiconductor packages may include a die having a first side and a second side opposite the first side, a first metal layer coupled to the first side of the die, a tin layer coupled to the first metal layer, the first metal layer between the die and the tin layer, a backside metal layer coupled to the second side of the die, and a mold compound coupled to the die. The mold compound may cover a plurality of sidewalls of the first metal layer and a plurality of sidewalls of the tin layer and a surface of the mold compound is coplanar with a surface of the tin layer.
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公开(公告)号:US20240128215A1
公开(公告)日:2024-04-18
申请号:US18485565
申请日:2023-10-12
发明人: Takashi NOMA , Shinzo ISHIBE
IPC分类号: H01L23/00
CPC分类号: H01L24/05 , H01L24/03 , H01L24/11 , H01L24/45 , H01L24/85 , H01L24/13 , H01L24/73 , H01L2224/03464 , H01L2224/0401 , H01L2224/04042 , H01L2224/05155 , H01L2224/05164 , H01L2224/05583 , H01L2224/05644 , H01L2224/11 , H01L2224/131 , H01L2224/45124 , H01L2224/73207 , H01L2224/8584
摘要: A device may include an insulating layer disposed on a frontside of a semiconductor layer, and may include a first conductive contact disposed in a first opening in the insulating layer. The device may include a second conductive contact disposed in a second opening in the insulating layer, and may include a stacked conductive layer disposed on the first conductive contact and excluded from the second conductive contact.
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公开(公告)号:US20220359360A1
公开(公告)日:2022-11-10
申请号:US17661420
申请日:2022-04-29
发明人: Yusheng LIN , Takashi NOMA
IPC分类号: H01L23/498 , H01L25/065 , H01L23/48 , H01L23/00 , H01L23/31 , H01L21/56 , H01L21/48 , H01L21/768 , H01L25/00
摘要: A system-in-package includes an interposer substrate having a first side and a second side opposite the first side, and a redistribution layer disposed on the first side. The redistribution layer includes a plurality of contact pads and a plurality of interconnections disposed on the first side. The plurality of interconnections is electrically connected to a plurality of terminals disposed on the second side opposite the first side. A first semiconductor die is disposed on the first side and electrically coupled to a first of the plurality of contact pads and a first of the plurality of interconnections disposed on the first side of the interposer substrate. A second semiconductor die is disposed on the first side. The second semiconductor die is electrically coupled to a second of the plurality of contact pads and a second of the plurality of interconnections disposed on the first side of the interposer substrate.
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公开(公告)号:US20220181192A1
公开(公告)日:2022-06-09
申请号:US17652877
申请日:2022-02-28
发明人: Takashi NOMA , Noboru OKUBO , Yusheng LIN
IPC分类号: H01L21/687 , H01L21/683 , H01L21/78 , H01L23/00 , H01L29/739 , H01L29/861
摘要: At least one circuit element may be formed on a front side of a ringed substrate, and the ringed substrate may be mounted on a mounting chuck. The mounting chuck may have an inner raised portion configured to receive the thinned portion of the substrate thereon, and a recessed ring around a perimeter of the mounting chuck configured to receive the outer ring of the ringed substrate therein. At least one solder bump may be formed that is electrically connected to the at least one circuit element, while the ringed wafer is disposed on the mounting chuck.
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公开(公告)号:US20220172994A1
公开(公告)日:2022-06-02
申请号:US17651610
申请日:2022-02-18
发明人: Michael J. SEDDON , Takashi NOMA
IPC分类号: H01L21/78 , H01L21/66 , H01L21/3205 , H01L21/683 , H01L21/02 , H01L21/304
摘要: Implementations of a method for aligning a semiconductor wafer for singulation may include: providing a semiconductor wafer having a first side and a second side. The first side of the wafer may include a plurality of die and the plurality of die may be separated by streets. The semiconductor wafer may include an edge ring around a perimeter of the wafer on the second side of the wafer. The wafer may also include a metal layer on the second side of the wafer. The metal layer may substantially cover the edge ring. The method may include grinding the edge ring to create an edge exclusion area and aligning the semiconductor wafer with a saw using a camera positioned in the edge exclusion area on the second side of the wafer. Aligning the wafer may include using three or more alignment features included in the edge exclusion area.
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公开(公告)号:US20210305096A1
公开(公告)日:2021-09-30
申请号:US17304136
申请日:2021-06-15
发明人: George CHANG , Yusheng LIN , Gordon M. GRIVNA , Takashi NOMA
IPC分类号: H01L21/78 , H01L21/683 , H01L23/31 , H01L23/498 , H01L23/00
摘要: In a general aspect, a fan-out wafer level package (FOWLP) can include a semiconductor die having an active surface, a backside surface, a plurality of side surfaces, each side surface of the plurality of side surfaces extending between the active surface and the backside surface, a plurality of conductive bumps disposed on the active surface, and an insulating layer disposed on a first portion of the active surface between the conductive bumps. The FOWLP can also include a molding compound encapsulating the backside surface, the plurality of side surfaces, and a second portion of the active surface between the conductive bumps and a perimeter edge of the active surface. The FOWLP can also include a signal distribution structure disposed on the conductive bumps, the insulating layer and the molding compound. The signal distribution structure can be configured to provide respective electrical connections to the plurality of conductive bumps.
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公开(公告)号:US20190148306A1
公开(公告)日:2019-05-16
申请号:US16229186
申请日:2018-12-21
发明人: Yusheng LIN , Takashi NOMA , Shinzo ISHIBE , Kazuyuki SUTO
IPC分类号: H01L23/532 , H01L23/00 , H01L21/265 , H01L29/861 , H01L29/739 , H01L21/324 , H01L23/528 , H01L21/22 , H01L21/28 , H01L23/482 , H01L21/304
摘要: Implementations of a semiconductor device may include: a silicon substrate including a first side and a second side. The second side of the substrate may include an active area. The device may include a metal stack including: a back metallization on the first side of the substrate, an electroplated metal layer on the back metallization; and an evaporated gold metal layer on the electroplated metal layer.
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