公开(公告)号：US10861671B2

公开(公告)日：2020-12-08

申请号：US16253106

申请日：2019-01-21

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/153 ,  H01J37/21 ,  H01J37/28 ,  G02B21/20

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

公开(公告)号：US10192716B2

公开(公告)日：2019-01-29

申请号：US15245911

申请日：2016-08-24

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Mark A. McCord ,  Richard R. Simmons ,  Rainer Knippelmeyer

IPC: H01J37/244 ,  H01J37/28

Abstract: Multi-beam scanning electron microscope (SEM) inspection systems with dark field imaging capabilities are disclosed. An SEM inspection system may include an electron source and at least one optical device. The at least one optical device may be configured to produce a plurality of primary beamlets utilizing electrons provided by the electron source and deliver the plurality of primary beamlets toward a target. The apparatus may also include an array of detectors configured to receive a plurality of image beamlets emitted by the target in response to the plurality of primary beamlets and produce at least one dark field image of the target.

公开(公告)号：US20170084421A1

公开(公告)日：2017-03-23

申请号：US15245765

申请日：2016-08-24

Applicant: KLA-Tencor Corporation

Inventor： Mark A. McCord ,  Richard R. Simmons ,  Doug K. Masnaghetti ,  Rainer Knippelmeyer

IPC: H01J37/04 ,  H01J37/244 ,  H01J37/09 ,  H01J37/22

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/057 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2805

Abstract: Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.

公开(公告)号：US09347824B2

公开(公告)日：2016-05-24

申请号：US14527034

申请日：2014-10-29

Applicant: KLA-Tencor Corporation

Inventor： Mark A. McCord ,  Joseph A. DiRegolo ,  Michael R. Gluszczak

IPC: G01J1/04 ,  G01J3/28 ,  G01J3/02 ,  G01J3/50 ,  G01J1/02 ,  G01J1/42

CPC classification number: G01J1/0407 ,  G01J1/0214 ,  G01J3/0251 ,  G01J3/0262 ,  G01J3/28 ,  G01J3/505 ,  G01J2001/0481 ,  G01J2001/4252

Abstract: Systems and methods for accurately measuring the luminous flux and color (spectra) from light-emitting devices are disclosed. An integrating sphere may be utilized to directly receive a first portion of light emitted by a light-emitting device through an opening defined on the integrating sphere. A light collector may be utilized to collect a second portion of light emitted by the light-emitting device and direct the second portion of light into the integrating sphere through the opening defined on the integrating sphere. A spectrometer may be utilized to measure at least one property of the first portion and the second portion of light received by the integrating sphere.

Abstract translation: 公开了用于准确测量发光器件的光通量和颜色（光谱）的系统和方法。 可以使用积分球直接接收由发光装置通过限定在积分球上的开口发射的光的第一部分。 可以利用光收集器来收集由发光装置发射的光的第二部分，并将第二部分的光通过限定在积分球上的开口引导到积分球。 可以使用光谱仪来测量由积分球接收的第一部分和第二部分光的至少一个性质。

公开(公告)号：US08642981B1

公开(公告)日：2014-02-04

申请号：US13753657

申请日：2013-01-30

Applicant: KLA-Tencor Corporation

Inventor： Paul Petric ,  Mark A. McCord ,  Michael Madsen ,  Alan Brodie

IPC: H01J49/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3005 ,  H01J37/3007 ,  H01J2237/0245 ,  H01J2237/24514 ,  H01J2237/30472 ,  H01J2237/31793 ,  H01J2237/31798

Abstract: An electron microscope assembly suitable for enhancing an image of a lithography tool includes an electron microscope configured for positioning below a lithography stage of an e-beam lithography tool, the lithography stage of the e-beam lithography tool including an aperture for providing the microscope line-of-sight to the lithography optics of the lithography tool, a translation unit configured to selectively translate the microscope along the optical axis of the lithography optics of the lithography tool responsive to a translation control system, the translation unit further configured to position the microscope in an operational state such that the optics of the microscope are positioned proximate to the lithography optics, a docking unit configured to reversibly mechanically couple the microscope with the lithography tool, the microscope configured to magnify a virtual sample plane image generated by the lithography tool.

Abstract translation: 适用于增强光刻工具的图像的电子显微镜组件包括：电子显微镜，被配置为定位在电子束光刻工具的光刻平台下方，电子束光刻工具的光刻台包括用于提供显微镜线的孔 视觉到光刻工具的光刻光学器件;平移单元，被配置为响应于平移控制系统沿着光刻工具的光刻光学器件的光轴选择性地平移显微镜，所述平移单元还被配置成将显微镜 处于操作状态，使得显微镜的光学器件靠近光刻光学器件定位，对接单元被配置为将显微镜与光刻工具可逆地机械耦合，显微镜被配置为放大由光刻工具产生的虚拟样本平面图像。

公开(公告)号：US10325753B2

公开(公告)日：2019-06-18

申请号：US15272194

申请日：2016-09-21

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/153 ,  H01J37/21 ,  H01J37/28

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

公开(公告)号：US20190172675A1

公开(公告)日：2019-06-06

申请号：US16253106

申请日：2019-01-21

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/21

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

公开(公告)号：US20170084423A1

公开(公告)日：2017-03-23

申请号：US15267223

申请日：2016-09-16

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/09 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/2817

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.

公开(公告)号：US20150124253A1

公开(公告)日：2015-05-07

申请号：US14527034

申请日：2014-10-29

Applicant: KLA-Tencor Corporation

Inventor： Mark A. McCord ,  Joseph A. DiRegolo ,  Michael R. Gluszczak

IPC: G01J1/04 ,  G01J3/28

CPC classification number: G01J1/0407 ,  G01J1/0214 ,  G01J3/0251 ,  G01J3/0262 ,  G01J3/28 ,  G01J3/505 ,  G01J2001/0481 ,  G01J2001/4252

Abstract: Systems and methods for accurately measuring the luminous flux and color (spectra) from light-emitting devices are disclosed. An integrating sphere may be utilized to directly receive a first portion of light emitted by a light-emitting device through an opening defined on the integrating sphere. A light collector may be utilized to collect a second portion of light emitted by the light-emitting device and direct the second portion of light into the integrating sphere through the opening defined on the integrating sphere. A spectrometer may be utilized to measure at least one property of the first portion and the second portion of light received by the integrating sphere.

Abstract translation: 公开了用于准确测量发光器件的光通量和颜色（光谱）的系统和方法。 可以使用积分球直接接收由发光装置通过限定在积分球上的开口发射的光的第一部分。 可以利用光收集器来收集由发光装置发射的光的第二部分，并将第二部分的光通过限定在积分球上的开口引导到积分球。 可以使用光谱仪来测量由积分球接收的第一部分和第二部分光的至少一个性质。

公开(公告)号：US10460905B2

公开(公告)日：2019-10-29

申请号：US15245765

申请日：2016-08-24

Applicant: KLA-Tencor Corporation

Inventor： Mark A. McCord ,  Richard R. Simmons ,  Doug K. Masnaghetti ,  Rainer Knippelmeyer

IPC: H01J37/244 ,  H01J37/04 ,  H01J37/28 ,  H01J37/317

Abstract: Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.