公开(公告)号：US11808930B2

公开(公告)日：2023-11-07

申请号：US16650862

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: G02B21/02 ,  G02B9/00 ,  G02B13/18 ,  H01J37/22 ,  H01J37/28 ,  G09B9/10 ,  G01N23/2251

CPC classification number: G02B21/02 ,  G02B9/00 ,  G02B13/18 ,  G09B9/10 ,  H01J37/226 ,  H01J37/28 ,  G01N23/2251 ,  H01J2237/26 ,  H01J2237/2802

Abstract: An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive power.

公开(公告)号：US11682538B2

公开(公告)日：2023-06-20

申请号：US17533078

申请日：2021-11-22

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: H01J37/22 ,  H01J37/244

CPC classification number: H01J37/226 ,  H01J37/244 ,  H01J2237/20292

Abstract: An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.

公开(公告)号：US12217927B2

公开(公告)日：2025-02-04

申请号：US17633556

申请日：2020-08-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Jian Zhang ,  Ning Ye ,  Zhiwen Kang ,  Yixiang Wang

IPC: H01J37/26 ,  G02B27/09 ,  H01J37/02 ,  H01J37/28

Abstract: A system and a method for manipulating a beam of an Advanced Charge Controller module in different planes in an e-beam system are provided. Some embodiments of the system include a lens system configured to manipulate a beam in the tangential plane and the sagittal plane such that the beam spot is projected onto the wafer with high luminous energy. Some embodiments of the system include a lens system comprising at least two cylindrical lens.

公开(公告)号：US11728131B2

公开(公告)日：2023-08-15

申请号：US17553357

申请日：2021-12-16

Applicant: ASML Netherlands B.V.

Inventor： Ning Ye ,  Jun Jiang ,  Jian Zhang ,  Yixiang Wang

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/0047 ,  H01J2237/2817

Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.

公开(公告)号：US11521826B2

公开(公告)日：2022-12-06

申请号：US16650840

申请日：2018-09-21

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: H01J37/22 ,  G01C3/08 ,  G02B27/42

Abstract: An optical height detection system in a charged particle beam inspection system. The optical height detection system includes a projection unit including a modulated illumination source, a projection grating mask including a projection grating pattern, and a projection optical unit for projecting the projection grating pattern to a sample; and a detection unit including a first detection grating mask including a first detection grating pattern, a second detection grating mask including a second detection grating pattern, and a detection optical system for forming a first grating image from the projection grating pattern onto the first detection grating mask and forming a second grating image from the projection grating pattern onto the second detection grating masks. The first and second detection grating patterns at least partially overlap the first and second grating images, respectively.

公开(公告)号：US11482399B2

公开(公告)日：2022-10-25

申请号：US16652352

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Qing Jiu Chen ,  Yixiang Wang

IPC: H01J37/22 ,  G01N21/95 ,  G01N21/956 ,  G02B27/09

Abstract: A system and method for advanced charge control of a light beam is provided. The system comprising a laser source comprising a laser diode for emitting a beam and a beam homogenizer to homogenize the emitted beam. The system and methods further comprise a beam shaper configured to shape the emitted beam using an anamorphic prism group and a driver configured to direct the shaped beam to a specified position on a wafer, wherein the laser source, the beam shaper, and the driver are coaxially aligned.

公开(公告)号：US12142456B2

公开(公告)日：2024-11-12

申请号：US17638777

申请日：2020-08-20

Applicant: ASML Netherlands B.V.

Inventor： Jinmei Yang ,  Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: H01J37/28 ,  G01N23/2251 ,  H01J37/26

Abstract: A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from the light source toward the sample, and may supply light input into the first optical element from the sample toward the second optical element. The second optical element may supply light toward first and second sensing elements. An aperture may be arranged on a focal plane of the lens. A light beam incident on the first sensing element may be a reference beam.

公开(公告)号：US12125669B2

公开(公告)日：2024-10-22

申请号：US18362757

申请日：2023-07-31

Applicant: ASML Netherlands B.V.

Inventor： Ning Ye ,  Jun Jiang ,  Jian Zhang ,  Yixiang Wang

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/0047 ,  H01J2237/2817

Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.

公开(公告)号：US12105036B2

公开(公告)日：2024-10-01

申请号：US17276124

申请日：2019-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Jian Zhang ,  Ning Ye ,  DanJing Huang ,  Bin-Da Chan

IPC: G01N23/2251 ,  G01J1/42 ,  G06T7/00

CPC classification number: G01N23/2251 ,  G01J1/4257 ,  G06T7/001 ,  G01N2223/07 ,  G01N2223/418 ,  G01N2223/507 ,  G01N2223/6116 ,  G06T2207/10016 ,  G06T2207/10144 ,  G06T2207/30108

Abstract: A system and a method for monitoring a beam in an inspection system are provided. The system includes an image sensor configured to collect a sequence of images of a beam spot of a beam formed on a surface, each image of the sequence of images having been collected at a different exposure time of the image sensor, and a controller configured to combine the sequence of images to obtain a beam profile of the beam.

公开(公告)号：US11183360B2

公开(公告)日：2021-11-23

申请号：US16650815

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: H01J37/22 ,  H01J37/244

Abstract: An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.