Lead-free tin alloy electroplating compositions and methods
    2.
    发明授权
    Lead-free tin alloy electroplating compositions and methods 有权
    无铅锡合金电镀组合物及方法

    公开(公告)号:US07968444B2

    公开(公告)日:2011-06-28

    申请号:US12655554

    申请日:2009-12-31

    IPC分类号: H01L21/44 C25D3/60

    CPC分类号: C23C18/54 C25D3/60

    摘要: Disclosed are electrolyte compositions for depositing a tin alloy on a substrate. The electrolyte compositions include tin ions, ions of one or more alloying metals, a flavone compound and a dihydroxy bis-sulfide. The electrolyte compositions are free of lead and cyanide. Also disclosed are methods of depositing a tin alloy on a substrate and methods of forming an interconnect bump on a semiconductor device.

    摘要翻译: 公开了用于在基材上沉积锡合金的电解质组合物。 电解质组合物包括锡离子,一种或多种合金金属的离子,黄酮化合物和二羟基双硫化物。 电解质组合物不含铅和氰化物。 还公开了在基板上沉积锡合金的方法以及在半导体器件上形成互连凸点的方法。

    Acid electrolytes
    3.
    发明授权
    Acid electrolytes 有权
    酸性电解质

    公开(公告)号:US07465384B2

    公开(公告)日:2008-12-16

    申请号:US11364665

    申请日:2006-02-28

    摘要: An acid electrolyte and method of using the electrolyte to both deposit tin and tin-alloys on iron containing substrates and at the same time perform as a flux to inhibit the formation of haze and stains on the tin and tin-alloys. The electrolytes and methods are suitable for plating on steel.

    摘要翻译: 一种酸性电解质和使用电解质以在含铁基材上沉积锡和锡合金的方法,同时作为助焊剂进行抑制锡和锡合金上的雾度和污渍的形成。 电解质和方法适用于镀钢。

    Electroplating compositions and methods
    4.
    发明授权
    Electroplating compositions and methods 有权
    电镀组合物和方法

    公开(公告)号:US07151049B2

    公开(公告)日:2006-12-19

    申请号:US10816627

    申请日:2004-04-02

    IPC分类号: H01L21/44 C25D7/12

    CPC分类号: C25D3/60 H01L2224/11

    摘要: Disclosed are electrolyte compositions for depositing a tin alloy on a substrate. The electrolyte compositions include tin ions, ions of one or more alloying metals, an acid, a thiourea derivative, and an additive selected from alkanol amines, polyethylene imines, alkoxylated aromatic alcohols, and combinations thereof. Also disclosed are methods of depositing a tin alloy on a substrate and methods of forming an interconnect bump on a semiconductor device.

    摘要翻译: 公开了用于在基材上沉积锡合金的电解质组合物。 电解质组合物包括锡离子,一种或多种合金金属的离子,酸,硫脲衍生物和选自烷醇胺,聚乙烯亚胺,烷氧基化芳族醇及其组合的添加剂。 还公开了在基板上沉积锡合金的方法以及在半导体器件上形成互连凸点的方法。

    High speed electroplating of tinplate
    7.
    发明授权
    High speed electroplating of tinplate 失效
    马口铁高速电镀

    公开(公告)号:US5174887A

    公开(公告)日:1992-12-29

    申请号:US517788

    申请日:1990-05-02

    摘要: A process for depositing tin upon a steel strip by high speed electroplating to produce tinplate, which includes a basis solution of an alkyl sulfonic acid, a solution soluble tin compound and a surfactant, preferably of an alkylene oxide condensation compound of 1) an aliphatic hydrocarbon having seven, preferably six or less, carbon atoms and at least one hydroxy group, or 2) an organic compound having no more than a total of twenty carbon atoms in one or two independent or joined rings optionally substituted with an alkyl moeity of six carbon atoms or less. After electroplating, the tinplate is rinsed and the rinse water only needs to be treated for removal of tin ions prior to discharge by normal procedures.

    摘要翻译: 一种通过高速电镀在钢带上沉积锡以制备马口铁的方法,其包括烷基磺酸,溶液可溶性锡化合物和表面活性剂的基础溶液,优选为环氧烷缩合化合物1)脂族烃 具有7个,优选6个或更少个碳原子和至少一个羟基,或2)在一个或两个独立或连接的环中不超过总共20个碳原子的有机化合物,其任选被六个碳原子的烷基度 原子或更少。 电镀后,马赛克板被冲洗,冲洗水只需要经过处理,以便通过正常程序排出之前除去锡离子。

    Lead-free tin alloy electroplating compositions and methods
    9.
    发明申请
    Lead-free tin alloy electroplating compositions and methods 有权
    无铅锡合金电镀组合物及方法

    公开(公告)号:US20100216302A1

    公开(公告)日:2010-08-26

    申请号:US12655554

    申请日:2009-12-31

    IPC分类号: H01L21/768 C25D3/60 C25D7/12

    CPC分类号: C23C18/54 C25D3/60

    摘要: Disclosed are electrolyte compositions for depositing a tin alloy on a substrate. The electrolyte compositions include tin ions, ions of one or more alloying metals, a flavone compound and a dihydroxy bis-sulfide. The electrolyte compositions are free of lead and cyanide. Also disclosed are methods of depositing a tin alloy on a substrate and methods of forming an interconnect bump on a semiconductor device.

    摘要翻译: 公开了用于在基材上沉积锡合金的电解质组合物。 电解质组合物包括锡离子,一种或多种合金金属的离子,黄酮化合物和二羟基双硫化物。 电解质组合物不含铅和氰化物。 还公开了在基板上沉积锡合金的方法以及在半导体器件上形成互连凸点的方法。

    Electrolyte and tin-silver electroplating process
    10.
    发明授权
    Electrolyte and tin-silver electroplating process 失效
    电解液和锡 - 银电镀工艺

    公开(公告)号:US06210556B1

    公开(公告)日:2001-04-03

    申请号:US09246310

    申请日:1999-02-08

    IPC分类号: C25D360

    摘要: The invention relates to an electrolyte for depositing tin-rich tin-silver alloys upon a substrate. This electrolyte includes a basis solution containing a solution soluble tin and silver compounds; a tin chelating agent of a polyhydroxy compound in an amount sufficient to complex tin ions provided by the tin compound; and a silver chelating agent of a heterocyclic compound in an amount sufficient to complex silver ions provided by the silver compound. Preferably, the tin and silver compounds are present in relative amounts to enable deposits containing about 85 to 99% by weight tin and about 0.5 to 15% by weight silver to be obtained.

    摘要翻译: 本发明涉及一种用于在基材上沉积富含锡的锡 - 银合金的电解质。 该电解质包括含有可溶解锡和银化合物溶液的基础溶液; 多羟基化合物的锡螯合剂,其量足以使由锡化合物提供的锡离子复合; 以及足以使由银化合物提供的银离子复合的量的杂环化合物的银螯合剂。 优选地,锡和银化合物以相对的量存在,使得能够获得含有约85-99重量%锡和约0.5-15重量%银的沉积物。