公开(公告)号：US20240404780A1

公开(公告)日：2024-12-05

申请号：US18732344

申请日：2024-06-03

Applicant: Hitachi High-Tech Corporation

Inventor： Masahiro KAMIGAKI ,  Motohiro TAKAHASHI ,  Masaki MIZUOCHI ,  Masashi FUJITA ,  Takumi NAGAYAMA

IPC: H01J37/18 ,  G03F7/00 ,  H01J37/304 ,  H01L21/67 ,  H01L21/687

Abstract: A plurality of load lock chambers are provided, a predetermined valve device is controlled such that the valve device is not operated during wafer processing, a signal for permitting operation of the predetermined valve device is transmitted at a timing when the wafer processing is completed, and the valve device is operated based on the signal. Thus, while a processed wafer and an unprocessed wafer are exchanged between one load lock chamber and a processing chamber, an operation sequence of the entire semiconductor processing apparatus is controlled such that a predetermined valve device in the other load lock chamber is operated, and thus vibration does not occur during the operation of an electron optical system, thereby reducing a waiting time.

公开(公告)号：US20240363308A1

公开(公告)日：2024-10-31

申请号：US18139999

申请日：2023-04-27

Applicant: National Technology & Engineering Solutions of Sandia, LLC

Inventor： Jeffrey Daniel ENGERER ,  Nicholas Andrew ANDERSON ,  Lindsay LAWLESS

IPC: H01J37/32 ,  G01N25/00 ,  H01J37/16 ,  H01J37/18 ,  H05B3/00

CPC classification number: H01J37/32082 ,  G01N25/00 ,  H01J37/165 ,  H01J37/18 ,  H01J37/32715 ,  H05B3/0033 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/16 ,  H01J2237/24585

Abstract: An apparatus for thermal ablation testing is provided. The apparatus comprises a chamber; an optically transparent window in the chamber; a sample holder inside the chamber; a test sample in the sample holder; a number of bare-wire thermocouples connected to the test sample, wherein the thermocouples generate temperature data in the form of voltage; a mass balance inside the chamber, wherein the mass balance is configured to hold the sample holder and dynamically detect changes in mass of the test sample; an external radiant heat source configured to heat the test sample through the window; a plasma source configured to generate a number of atomic species in the chamber; and a pyrometer directed at the test sample.

公开(公告)号：US20240339309A1

公开(公告)日：2024-10-10

申请号：US18298259

申请日：2023-04-10

Applicant: Tokyo Electron Limited

Inventor： Sergey Voronin ,  Francisco Machuca ,  Blaze Messer ,  Yan Chen ,  Ying Zhu ,  Mihail Mihaylov ,  Joel Ng ,  Ashawaraya Shalini ,  Da Song ,  Akiteru Ko

IPC: H01J37/32 ,  H01J37/18

CPC classification number: H01J37/32972 ,  H01J37/18 ,  H01J37/32357 ,  H01J37/32963 ,  H01J2237/3343

Abstract: A processing system that includes: a processing chamber configured to hold a substrate to be processed; a first vacuum pump; a second vacuum pump disposed downstream from the first vacuum pump; an exhaust gas line connecting the process chamber and the first vacuum pump, and the first vacuum pump and the second vacuum pump; a plasma power supply including a first RF power source configured to generate a plasma from a portion of an exhaust gas between the first and second vacuum pumps; and an optical emission spectroscopy (OES) measurement assembly including an OES detector configured to measure OES signals from the plasma.

公开(公告)号：US12020895B2

公开(公告)日：2024-06-25

申请号：US17666385

申请日：2022-02-07

Applicant: FEI Company

Inventor： Jakub Kuba ,  John M. Mitchels ,  Jakub Drahotský ,  Michal Valík

IPC: H01J37/18 ,  H01J37/28 ,  G01N1/42

CPC classification number: H01J37/185 ,  H01J37/28 ,  G01N1/42 ,  H01J2237/184 ,  H01J2237/186

Abstract: Various approaches are provided for contamination-free vacuum transfer of samples. As one example, an apparatus includes a compartment configured to store multiple samples held by a cartridge removably coupled to the compartment, a sample port for transferring the cartridge between a charged particle system and a position within the compartment, and a valve configured to seal the compartment at vacuum pressure during transport of the multiple samples between charged particle systems. In this way, samples such as lamellae may be transferred between charged particle systems while maintaining the samples at vacuum pressure, thereby reducing the possibility of sample contamination during sample transfer.

公开(公告)号：US11978608B2

公开(公告)日：2024-05-07

申请号：US17201436

申请日：2021-03-15

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Yuuji Ishida

IPC: H01J37/08 ,  H01J37/18 ,  H01J37/317 ,  H01J37/32

CPC classification number: H01J37/08 ,  H01J37/18 ,  H01J37/3171 ,  H01J37/32064 ,  H01J37/32614 ,  H01J37/32954

Abstract: There is provided an ion generation device including a plasma generation chamber that generates a plasma for extracting an ion, and a heating device configured to heat the plasma generation chamber by irradiating a member that defines the plasma generation chamber or a member that is to be exposed to the plasma generated inside the plasma generation chamber with a laser beam.

公开(公告)号：US11961698B2

公开(公告)日：2024-04-16

申请号：US17344446

申请日：2021-06-10

Applicant: ASML Netherlands B.V.

Inventor： Christiaan Otten ,  Peter-Paul Crans ,  Marc Smits ,  Laura Del Tin ,  Christan Teunissen ,  Yang-Shan Huang ,  Stijn Wilem Herman Karel Steenbrink ,  Xuerang Hu ,  Qingpo Xi ,  Xinan Luo ,  Xuedong Liu

IPC: H01J37/15 ,  H01J37/02 ,  H01J37/14 ,  H01J37/147 ,  H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/15 ,  H01J37/023 ,  H01J37/14 ,  H01J37/1477 ,  H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/2006 ,  H01J2237/20214 ,  H01J2237/2817

Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

公开(公告)号：US20240047174A1

公开(公告)日：2024-02-08

申请号：US18357869

申请日：2023-07-24

Applicant: Bruker Nano GmbH

Inventor： Uwe ROSSEK

IPC: H01J37/244 ,  G01N23/203 ,  H01J37/28 ,  H01J37/18 ,  H01J37/22

CPC classification number: H01J37/244 ,  G01N23/203 ,  H01J37/28 ,  H01J37/18 ,  H01J37/22

Abstract: The present invention refers to a detector and a method for obtaining Kikuchi images by using electron backscatter diffraction (EBSD) or transmission Kikuchi diffraction (TKD) technique. In particular, the present invention refers to a detector comprising a detector body, a detector head with a scintillation screen and a photodetector with a active surface for detecting Kikuchi patterns, and means configured to move the detector head with respect to the detector body. The method comprises obtaining a first and a second Kikuchi pattern, and moving the detector head after obtaining the first Kikuchi pattern and prior obtaining the second Kikuchi pattern.

公开(公告)号：US11626267B2

公开(公告)日：2023-04-11

申请号：US17243478

申请日：2021-04-28

Applicant: Applied Materials Israel Ltd.

Inventor： Yehuda Zur ,  Igor Petrov

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/20 ,  H01J37/18

Abstract: A method of evaluating a region of a sample, the method comprising: positioning a sample within a vacuum chamber; generating an electron beam with a scanning electron microscope (SEM) column that includes an electron gun at one end of the column and a column cap at an opposite end of the column; focusing the electron beam on the sample and scanning the focused electron beam across the region of the sample, while the SEM column is operated in tilted mode, thereby generating secondary electrons and backscattered electrons from within the region; and during the scanning, collecting backscattered electrons with one or more detectors while applying a negative bias voltage to the column cap to alter a trajectory of the secondary electrons preventing the secondary electrons from reaching the one or more detectors.

公开(公告)号：US20230073506A1

公开(公告)日：2023-03-09

申请号：US17797432

申请日：2021-02-04

Applicant: MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E. V.

Inventor： Sebastian TACKE ,  Stefan RAUNSER

IPC: H01J37/18 ,  B25J21/02 ,  G01N1/42 ,  H01J37/20 ,  H01J37/26

Abstract: The invention relates to a workstation (1), a preparation station (2) and a method for manipulating an electron microscopy grid assembly (3). The workstation (1) comprises a first compartment (101), a first gas inlet (102) for generating an overpressure in the first compartment (101), a first glove (104) and a second glove (105), each being fixed in a respective opening (106, 107) of the workstation (1), wherein the first glove (104) and the second glove (105) are movable in the first compartment (101) to manipulate objects in the first compartment (101), wherein the workstation (1) comprises a port (109) for providing a transfer device (4) for an electron microscopy grid assembly (3) in the first compartment (101). The preparation station (2) comprises a coolant reservoir (201, 202), a first part (210) configured to hold a shuttle (6) for holding an electron microscopy grid assembly (3) in a fixed orientation, wherein the preparation station (2) is configured such that the first part (210) is submergable in the cryogenic coolant when the coolant reservoir (201, 202) contains the cryogenic coolant.

公开(公告)号：US20230048603A1

公开(公告)日：2023-02-16

申请号：US17535097

申请日：2021-11-24

Applicant: Chang Hoon LEE

Inventor： Chang Hoon LEE

IPC: C23C24/04 ,  H01J37/18 ,  H01J37/20 ,  B05B1/34 ,  B05B7/14

Abstract: A ceramic coating system using an atmospheric pressure plasma generator is provided, which includes a vacuum chamber configured to maintain a vacuum therein, a support disposed inside the vacuum chamber and fixedly supporting a substrate, a plasma generator that generates active species through plasma discharge and includes a nozzle part wherein at least a portion of the nozzle part is disposed to face the substrate inside the vacuum chamber, and a particle providing apparatus that transfers ceramic particles to one side of the nozzle part.