公开(公告)号：US20240019614A1

公开(公告)日：2024-01-18

申请号：US18472835

申请日：2023-09-22

申请人： lonQ, Inc. ,  Duke University

发明人： Kenneth WRIGHT ,  Jason Madjdi AMINI ,  Jungsang KIM

IPC分类号： G02B5/10 ,  G21K5/00

CPC分类号： G02B5/10 ,  G21K5/00

摘要： Aspects of the present disclosure describe techniques for using a parabolic Cassegrain-type reflector for ablation. For example, a system for ablation loading of a trap is described that includes a reflector having a hole aligned with a loading aperture of the trap, and an atomic source positioned at a focal point of the reflector, where one or more laser beams are reflected from a reflective front side of the reflector and focused on a surface of the atomic source to produce an atomic plume, and the atomic plume once produced passing through the hole in the reflector and through a loading aperture of the trap for loading the trap. A method for ablation loading of a trap within a chamber in a trapped ion system is also described.

公开(公告)号：US11513442B2

公开(公告)日：2022-11-29

申请号：US16644206

申请日：2018-08-22

申请人： ASML NETHERLANDS B.V.

发明人： Wim Tjibbo Tel ,  Mark John Maslow ,  Koenraad Van Ingen Schenau ,  Patrick Warnaar ,  Abraham Slachter ,  Roy Anunciado ,  Simon Hendrik Celine Van Gorp ,  Frank Staals ,  Marinus Jochemsen

IPC分类号： G03F7/00 ,  G03F1/00 ,  G06T7/00 ,  H01L21/00 ,  G06F30/20 ,  G21K5/00 ,  G03F7/20 ,  H01L21/66 ,  G06F119/18

摘要： A method for determining a metric of a feature on a substrate obtained by a semiconductor manufacturing process involving a lithographic process, the method including: obtaining an image of at least part of the substrate, wherein the image includes at least the feature; determining a contour of the feature from the image; determining a plurality of segments of the contour; determining respective weights for each of the plurality of segments; determining, for each of the segments, an image-related metric; and determining the metric of the feature in dependence on the weights and the calculated image-related metric of each of the segments.

公开(公告)号：US11506968B2

公开(公告)日：2022-11-22

申请号：US16911601

申请日：2020-06-25

申请人： Samsung Electronics Co., Ltd.

发明人： Hakseung Han ,  Sanguk Park ,  Jongju Park ,  Raewon Yi

IPC分类号： G21K5/00 ,  G03F1/24 ,  B23K26/06 ,  H01L21/268

摘要： A laser annealing method performed on a reflective photomask may include preparing a reflective photomask including a pattern area and a border area surrounding the pattern area and irradiating a laser beam onto the border area of the reflective photomask. The irradiating of the laser beam may include split-irradiating a plurality of laser beam spots onto the border area. Each of the plurality of laser beam spots may be shaped using a beam shaper. The beam shaper may include a blind area, a transparent area at a center of the blind area, and a semitransparent area between the blind area and the transparent area. Each of the plurality of laser beam spots may include a center portion passing through the transparent area and having a uniform energy profile and an edge portion passing through the semitransparent area and having an inclined energy profile.

公开(公告)号：US11344022B2

公开(公告)日：2022-05-31

申请号：US16166129

申请日：2018-10-21

申请人： Jonathan A Jackson ,  Christopher Hoffman ,  Norman Novotney ,  Joseph Carroll ,  Patrick A Jackson ,  Mark J Elting

发明人： Jonathan A Jackson ,  Christopher Hoffman ,  Norman Novotney ,  Joseph Carroll ,  Patrick A Jackson ,  Mark J Elting

IPC分类号： A01M21/04 ,  A01M21/00 ,  H05B3/00 ,  H05B35/00 ,  G21K5/00

摘要： Plant eradication and stressing of plants using illumination signaling where a short-time dual component, low energy, unnatural set of irradiances is applied, with no mutagenic or high radiative energy transfers in any wavelength for eradication by substantial high temperature thermally-induced leaf and plant component failure or incineration. An Indigo Region Illumination Distribution of wavelength 300 nm to 550 nm is directed to plant foliage and/or a plant root crown, while infrared radiation that is substantially Medium Wavelength Infrared radiation of 2-20 microns wavelength, 2.4-8.0 microns preferred, is directed to a plant root crown and/or soil immediately adjacent the root crown. The Indigo Region Illumination Distribution can pass through the MWIR emitter to form a compact illuminator. The MWIR emitter can comprise borosilicate glass at 400° F. to 1000° F.

公开(公告)号：US10939888B2

公开(公告)日：2021-03-09

申请号：US16550305

申请日：2019-08-26

申请人： FUJIFILM Corporation

发明人： Masaru Sato ,  Kenji Nakamura ,  Misaki Kawahara ,  Fumito Nariyuki ,  Ryosuke Ogura ,  Tomoaki Nakashima

IPC分类号： G21K5/00 ,  H05G1/10 ,  A61B6/00 ,  H05G1/02 ,  H05G1/56

摘要： A radiation irradiating apparatus includes a radiation generator that generates radiation and a switch that controls emission of the radiation from the radiation generator. The radiation generator and the switch are constituted by separate housings. The radiation generator and the switch are attachable and detachable to and from each other via a surface of a portion of each of the housings thereof.

公开(公告)号：US20200306717A1

公开(公告)日：2020-10-01

申请号：US16900091

申请日：2020-06-12

申请人： IMMUNOLIGHT, LLC ,  DUKE UNIVERSITY

发明人： Frederic A. BOURKE, JR. ,  Tuan VO-DINH

IPC分类号： B01J19/12 ,  A23L3/26 ,  A61L2/00 ,  C02F1/30 ,  C02F1/72 ,  A23L5/30 ,  B01J19/08 ,  A61L2/08 ,  A61L2/10 ,  A61L2/16 ,  C08J3/28 ,  G21K5/00 ,  C02F1/32 ,  A61K41/00 ,  A61N5/06 ,  A61N5/10 ,  B01J23/50 ,  B01J23/52 ,  B01J31/02 ,  B01J31/22 ,  B01J35/00 ,  B01J37/00 ,  B01J37/02 ,  C09D201/00 ,  C09J5/00 ,  C09J201/00 ,  A23L2/50 ,  A23L3/28 ,  C08J3/24 ,  C08J7/18 ,  G02B5/00 ,  A61M1/36 ,  C12H1/06

摘要： A method and a system for producing a change in a medium disposed in an artificial container. The method places in a vicinity of the medium at least one of a plasmonics agent and an energy modulation agent. The method applies an initiation energy through the artificial container to the medium. The initiation energy interacts with the plasmonics agent or the energy modulation agent to directly or indirectly produce the change in the medium. The system includes an initiation energy source configured to apply an initiation energy to the medium to activate the plasmonics agent or the energy modulation agent.

公开(公告)号：US10720256B2

公开(公告)日：2020-07-21

申请号：US16348340

申请日：2017-11-02

申请人： HITACHI ZOSEN CORPORATION

发明人： Hiroyuki Daiku ,  Ichiro Sakai ,  Norihiro Inoue ,  Yohei Terasaka

IPC分类号： G21K5/04 ,  A61L2/08 ,  B65B55/08 ,  B67C7/00 ,  G21K5/00 ,  H01J5/18 ,  H01J5/22 ,  B65B55/04

摘要： Provided is an electron beam irradiating device capable of emitting an electron beam from an electron beam generation source surrounded by a vacuum chamber to outside of the vacuum chamber through an electron beam exit window. The electron beam exit window includes: a grid; a window foil allowing the electron beam to pass therethrough; and a frame-shaped pressing member pressing the window foil against the grid. The surface of the grid has a groove section having an annular shape. A metal gasket is pressed between the groove section and the window foil.

公开(公告)号：US10591342B2

公开(公告)日：2020-03-17

申请号：US15528369

申请日：2015-11-19

申请人： USHIO DENKI KABUSHIKI KAISHA

发明人： Akihisa Nagano ,  Gota Niimi

IPC分类号： G01F23/24 ,  H01L21/027 ,  H05G2/00 ,  G01F23/00 ,  G03F7/20 ,  G05D9/12 ,  G21K5/00

摘要： Disclosed herein a liquid level detection device capable of appropriately detecting a liquid level of a high temperature plasma raw material in a reservoir for storing the high temperature plasma raw material. The liquid level detection device includes: an upper limit level sensor configured to detect that the liquid level of the tin is elevated from downward to reach an upper limit level; and a refilling level sensor configured to detect that the liquid level of the tin is lowered from upward to reach a refilling level or a lower limit level. A detection responsiveness of the liquid level of the upper limit level sensor is higher than the refilling level sensor or the lower limit level sensor, and a detectability of the liquid level of the refilling level sensor or the lower limit level sensor is higher than the upper limit level sensor.

公开(公告)号：US10571799B1

公开(公告)日：2020-02-25

申请号：US16113183

申请日：2018-08-27

申请人： ASML US, INC. LLC

发明人： Jiangwei Li ,  Ke Zhao ,  Yuan He

IPC分类号： G06F17/50 ,  G03F1/70 ,  G06K9/00 ,  G21K5/00

摘要： A method for optimizing a binary mask pattern includes determining, by a processor, an evaluation value based on a comparison between a design pattern and a substrate pattern simulated based on the binary mask pattern. The method also includes, based on the evaluation value, using, by the processor, a gradient-based optimization method to generate a first adjusted binary mask pattern. The method also includes determining, by the processor, a first updated evaluation value based on a comparison between the design pattern and a first updated substrate pattern simulated based on the first adjusted binary mask pattern. The method also includes, based on the first updated evaluation value, using, by the processor, a product of a Hessian matrix and an arbitrary vector to generate a second adjusted binary mask pattern. The method also includes simulating, by the processor, a second updated substrate pattern based on the second adjusted binary mask pattern.

公开(公告)号：US10533195B2

公开(公告)日：2020-01-14

申请号：US16205400

申请日：2018-11-30

申请人： Xyleco, Inc.

发明人： Marshall Medoff

IPC分类号： C12P7/10 ,  C12P19/02 ,  B01J19/08 ,  C08B1/00 ,  C12P19/00 ,  C10L1/02 ,  C07C27/24 ,  C12P19/14 ,  C07C27/04 ,  G21K5/00 ,  B02C23/18 ,  D21B1/02 ,  D21B1/06 ,  C13K1/02 ,  H01J37/30 ,  B01J19/12 ,  C12M1/00 ,  D21B1/10 ,  C07C27/00

摘要： Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful products, such as fuels. For example, systems can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy or sugary materials, to produce ethanol and/or butanol, e.g., by fermentation.