-
公开(公告)号：US10705433B2
公开(公告)日：2020-07-07
申请号：US16597718
申请日：2019-10-09
摘要： Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
-
公开(公告)号：US10139734B2
公开(公告)日：2018-11-27
申请号：US14524162
申请日：2014-10-27
申请人： Carl Zeiss SMT GmbH
摘要： An imaging optical unit for imaging an object field in an image field is disclosed. The imaging optical unit has an obscured pupil. This pupil has a center, through which a chief ray of a central field point passes. The imaging optical unit furthermore has a plurality of imaging optical components. A gravity center of a contiguous pupil obscuration region of the imaging optical unit lies decentrally in the pupil of the imaging optical unit.
-
公开(公告)号：US09915876B2
公开(公告)日：2018-03-13
申请号：US14796612
申请日：2015-07-10
申请人： Carl Zeiss SMT GMBH
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0816 , G02B5/0891 , G03F7/702 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： An EUV mirror with a substrate and a multilayer arrangement including: a periodic first layer group having N1>1 first layer pairs of period thickness P1 and arranged on a radiation entrance side of the multilayer arrangement; a periodic second layer group having N2>1 second layer pairs of period thickness P2 and arranged between the first layer group and the substrate; and a third layer group having N3 third layer pairs arranged between the first and second layer groups. N1>N2. The third layer group has a third period thickness P3 which deviates from an average period thickness PM=(P1+P2)/2 by a period thickness difference ΔP. ΔP corresponds to the quotient of the optical layer thickness (λ/4) of a quarter-wave layer and the product of N3 and cos(AOIM), AOIM being the mean incidence angle for which the multilayer arrangement is designed.
-
公开(公告)号：US08817232B2
公开(公告)日：2014-08-26
申请号：US13392032
申请日：2010-04-09
CPC分类号： G03F7/70116 , G02B7/1821
摘要： An optical apparatus has a moveable reflective element and associated actuator. The actuator includes a first magnet which is connected to the moveable reflective element such that movement of the first magnet will cause the moveable reflective element to move, and a second magnet which is connected to a motor such that operation of the motor will cause the second magnet to move. The second magnet is positioned relative to the first magnet such that moving the second magnet will cause the first magnet to move.
摘要翻译： 光学装置具有可移动的反射元件和相关联的致动器。 致动器包括连接到可移动反射元件的第一磁体，使得第一磁体的移动将导致可移动的反射元件移动，以及连接到电动机的第二磁体，使得电动机的操作将导致第二磁体 磁铁移动。 第二磁体相对于第一磁体定位，使得移动第二磁体将使第一磁体移动。
-
5.发明授权公开(公告)号：US08623588B2
公开(公告)日：2014-01-07
申请号：US12810994
申请日：2008-12-23
申请人： Harry Sewell
发明人： Harry Sewell
IPC分类号： G03B27/70
CPC分类号： G03F7/70408 , G03F7/70266
摘要： A system and method are provided for writing patterns onto substrates. First and second beams of extreme ultraviolet (EUV) radiation are produced. An exposure unit is used to project the first and second beams of EUV radiation onto a substrate. The first and second beams of radiation interfere with each other to expose a first set of parallel lines at an exposure field of the substrate.
摘要翻译： 提供了将图案写入基板的系统和方法。 产生第一和第二束极紫外（EUV）辐射。 曝光单元用于将第一和第二束EUV辐射投射到基板上。 第一和第二辐射束彼此干涉以在衬底的曝光场处露出第一组平行线。
-
6.发明授权Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type 有权用这种类型的成像光学系统进行微光刻的成像光学系统和投影曝光装置公开(公告)号：US08610877B2
公开(公告)日：2013-12-17
申请号：US13197445
申请日：2011-08-03
申请人： Hans-Juergen Mann , David Shafer
发明人： Hans-Juergen Mann , David Shafer
CPC分类号： G03F7/70233 , G02B17/0647 , G02B17/0652 , G02B17/0663 , G03F7/7015 , G03F7/7025
摘要： An imaging optical system has a plurality of mirrors, which via a beam path for imaging light, image an object field in an object plane into an image field in an image plane. The imaging optical system has an exit pupil obscuration. At least one of the mirrors has no opening for passage of the imaging light. The fourth to last mirror in the beam path is concave, resulting in an imaging optical system having improved imaging properties without compromise in throughput.
摘要翻译： 成像光学系统具有多个反射镜，其经由用于对光进行成像的光束路径将物体平面中的物体场图像成像面中的图像场。 成像光学系统具有出射光瞳遮蔽。 至少一个反射镜没有用于成像光通过的开口。 在光束路径中第四个到最后一个镜像是凹的，导致成像光学系统具有改进的成像特性而不会在吞吐量方面受到影响。
-
7.发明授权Reflective optical element, projection system, and projection exposure apparatus 有权反光光学元件，投影系统和投影曝光装置公开(公告)号：US08610876B2
公开(公告)日：2013-12-17
申请号：US13046137
申请日：2011-03-11
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
CPC分类号： G02B5/0891 , B82Y10/00 , G02B5/0875 , G03F7/70958 , G21K1/062 , G21K2201/064
摘要： For the use in illumination systems and projection exposure apparatuses for UV or EUV lithography, a reflective optical element is provided for a operating wavelength in the ultraviolet to extreme ultraviolet wavelength ranges. The reflective optical element includes a substrate and a reflective surface on the substrate. The multilayer system has layers of at least two alternating materials having different real parts of the refractive index at the operating wavelength. Radiation in the operating wavelength of a certain incident angle bandwidth distribution can impinge on the reflective optical element. The reflective surface includes one or more first portions, in which the layers have alternating materials of a first period thickness. The reflective surface includes one or more additional portions, in which the layers of alternating materials have a first period thickness and at least one additional period thickness. The arrangement of the first and additional portions across the reflective surface is adapted to the incident angle bandwidth distribution. Furthermore, a projection system and a projection exposure apparatus including such a reflective optical element are suggested.
摘要翻译： 对于在用于UV或EUV光刻的照明系统和投影曝光装置中的用途，提供反射光学元件用于在紫外至极紫外波长范围内的工作波长。 反射型光学元件包括衬底和衬底上的反射表面。 多层系统具有在工作波长处具有不同实际折射率部分的至少两种交替材料的层。 一定入射角度带宽分布的工作波长的辐射可以撞击在反射光学元件上。 反射表面包括一个或多个第一部分，其中层具有第一周期厚度的交替材料。 反射表面包括一个或多个附加部分，其中交替材料层具有第一周期厚度和至少一个附加周期厚度。 穿过反射表面的第一和附加部分的布置适于入射角带宽分布。 此外，提出了包括这种反射光学元件的投影系统和投影曝光装置。
-
8.发明授权公开(公告)号：US08576376B2
公开(公告)日：2013-11-05
申请号：US12767521
申请日：2010-04-26
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
CPC分类号： G03F7/702 , G02B17/02 , G02B17/0652 , G03F7/70058 , G03F7/70225 , G03F7/70233 , G03F7/70275
摘要： An imaging optical system includes a plurality of mirrors that image an object field in an object plane into an image field in an image plane. At least one of the mirrors is obscured, and thus has a opening for imaging light to pass through. The fourth-last mirror in the light path before the image field is not obscured and provides, with an outer edge of the optically effective reflection surface thereof, a central shadowing in a pupil plane of the imaging optical system. The distance between the fourth-last mirror and the last mirror along the optical axis is at least 10% of the distance between the object field and the image field. An intermediate image, which is closest to the image plane, is arranged between the last mirror and the image plane. The imaging optical system can have a numerical aperture of 0.9. These measures, not all of which must be effected simultaneously, lead to an imaging optical system with improved imaging properties and/or reduced production costs.
摘要翻译： 成像光学系统包括将物平面中的物场映像成像平面中的图像场的多个反射镜。 至少一个镜子被遮蔽，因此具有用于成像光通过的开口。 在图像场之前的光路中的第四后镜不被遮蔽，并且在其光学有效反射表面的外边缘处提供在成像光学系统的光瞳平面中的中心阴影。 沿着光轴的第四镜和最后镜之间的距离至少为物场和图像场之间的距离的10％。 最靠近图像平面的中间图像被布置在最后一个反射镜和图像平面之间。 成像光学系统的数值孔径可以为0.9。 这些措施，并不是所有这些都必须同时进行，导致成像光学系统具有改进的成像性能和/或降低生产成本。
-
9.发明授权公开(公告)号：US08441613B2
公开(公告)日：2013-05-14
申请号：US13050346
申请日：2011-03-17
申请人： Ralf Mueller
发明人： Ralf Mueller
CPC分类号： G02B17/0812 , G02B13/143 , G02B17/0892 , G03F7/70225 , G03F7/70891
摘要： Projection objectives, projection exposure apparatuses and related systems and components are disclosed.
摘要翻译： 投影目标，投影曝光装置及相关系统和组件被公开。
-
公开(公告)号：US20120224160A1
公开(公告)日：2012-09-06
申请号：US13313641
申请日：2011-12-07
申请人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
发明人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.
摘要翻译： 借助于来自主波长λ0附近的波长范围的电磁辐射，用于将配置在成像系统的物体平面中的图案成像成像系统的图像平面的光学成像系统具有多个反射镜。 每个反射镜具有镜面，反射层布置具有单个层序列。
-
-
-
-
-
-
-
-
-
搜索结果
517 条记录 (耗时 0.037 秒)
