Back nozzle unit and apparatus for processing a substrate including back nozzle unit

    公开(公告)号:US12128450B2

    公开(公告)日:2024-10-29

    申请号:US17392389

    申请日:2021-08-03

    申请人: SEMES CO., LTD.

    摘要: An apparatus for processing a substrate may include a processing module including at least one process chamber performing a desired process on a substrate and an index module transferring the substrate from an outside into the processing module. The at least one process chamber may include a supporting unit on which the substrate is placed and a back nozzle unit disposed under a bottom face of the substrate. The back nozzle unit may include a skirt, at least one back nozzle providing a cleaning solution onto the bottom face of the substrate and a gas nozzle providing a gas onto the bottom face of the substrate. The skirt may include a body and a plurality of first flow paths and a plurality of second flow paths which are formed in the body and provide a gas toward the bottom face of the substrate.

    REFLECTOR FOR PROCESS CHAMBER
    8.
    发明公开

    公开(公告)号:US20240352618A1

    公开(公告)日:2024-10-24

    申请号:US18418531

    申请日:2024-01-22

    IPC分类号: C30B25/10 B08B7/00

    CPC分类号: C30B25/10 B08B7/0071

    摘要: A reflector for use in a semiconductor process chamber is provided including: a body; and a bottom plate connected to a lower portion of the body, the bottom plate having a bottom surface, a top surface, and one or more side surfaces connecting the bottom surface with the top surface. A cross section of the bottom plate that extends to opposing locations on the one or more side surfaces includes a center, the cross section is divided into two or more sectors that extend from the center of the cross section, and the cross section includes a cooling channel comprising an inlet and one or more outlets.

    SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING METHOD, AND SUBSTRATE POLISHING APPARATUS

    公开(公告)号:US20240351078A1

    公开(公告)日:2024-10-24

    申请号:US18683735

    申请日:2022-08-19

    申请人: EBARA CORPORATION

    摘要: A substrate cleaning apparatus that brings a cleaning tool into sliding contact with a substrate surface while rotating the substrate to perform scrub-cleaning includes a cleaning liquid supply unit that ejects cleaning liquid onto the surface of the substrate to perform a rinsing process of the substrate after scrub-cleaning, in which a temperature of the cleaning liquid in the rinsing process is set to 0° C. to 20° C. The cleaning liquid supply unit includes a first cleaning liquid supply unit that supplies the cleaning liquid toward the vicinity of the center of the substrate and a second cleaning liquid supply unit that supplies the cleaning liquid in a spray form toward a region between the center and an edge of the substrate, and a first ejection angle by the first cleaning liquid supply unit is smaller than a second ejection angle by the second cleaning liquid supply unit.

    VIBRATION DEVICE AND IMAGING DEVICE
    10.
    发明公开

    公开(公告)号:US20240351076A1

    公开(公告)日:2024-10-24

    申请号:US18760868

    申请日:2024-07-01

    IPC分类号: B08B7/02 G02B27/00

    CPC分类号: B08B7/02 G02B27/0006

    摘要: A vibration device includes a light transmitter, a vibrator to support the light transmitter, a piezoelectric body located on or in the vibrator to vibrate the vibrator, and a first metal structure located, in a compressed state, between the light transmitter and a support that supports the light transmitter, and having a smaller Young's modulus than the light transmitter and the support that supports the light transmitter.