-
公开(公告)号:US20240321601A1
公开(公告)日:2024-09-26
申请号:US18611156
申请日:2024-03-20
申请人: EBARA CORPORATION
CPC分类号: H01L21/67051 , B08B1/34 , B08B3/022 , B08B3/041 , H01L21/02057 , H01L21/67034
摘要: A cleaning apparatus includes: a rotation support section that supports and rotates a substrate; a chemical liquid supply section that supplies a chemical liquid other than an organic solvent to a surface of the substrate; an organic solvent supply section that supplies an organic solvent to a surface of the substrate; and cleaning means that cleans a surface of the substrate supported by the rotation support section using a chemical liquid from the chemical liquid supply section, and then cleans a surface of the substrate using an organic solvent from the organic solvent supply section with the substrate being kept supported by the rotation support section.
-
公开(公告)号:US20240321598A1
公开(公告)日:2024-09-26
申请号:US18579208
申请日:2022-06-30
发明人: Takuma TAKAHASHI , Tomoyuki SHINOHARA , Junichi ISHII , Kazuki NAKAMURA , Takashi SHINOHARA , Nobuaki OKITA , Yoshifumi OKADA
CPC分类号: H01L21/67046 , B08B1/12 , B08B1/34
摘要: A substrate cleaning device includes a substrate holder, a lower-surface brush, a first liquid nozzle and a second liquid nozzle. The substrate holder holds a substrate in a horizontal attitude. The lower-surface brush is configured to be movable between a processing position for cleaning of the substrate and a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction. Further, the lower-surface brush is configured to be rotatable about an axis extending in the up-and-down direction. The lower-surface brush cleans a lower surface of the substrate by coming into contact with the lower surface of the substrate. The first liquid nozzle discharges a cleaning liquid to a center portion of the lower-surface brush, at a waiting position. The second liquid nozzle discharges a cleaning liquid to an end portion of the lower-surface brush, at the waiting position.
-
公开(公告)号:US20240316599A1
公开(公告)日:2024-09-26
申请号:US18575054
申请日:2022-09-15
发明人: Kang Ho Seong
摘要: A roll cleaning device according to one example of the present invention comprises at least one knife, wherein the at least one knife comprises a cleaning part surrounding a target roll to be in contact with the outer circumferential surface of the target roll on which foreign substances are present, and an operating part, which is connected to the cleaning part, for moving the at least one knife along the circumferential direction on the outer circumferential surface of the target roll.
-
公开(公告)号:US20240310078A1
公开(公告)日:2024-09-19
申请号:US18575438
申请日:2022-06-30
申请人: SOLARCLEANO S.À R.L.
CPC分类号: F24S40/20 , A46B13/001 , A46B13/02 , B08B1/12 , B08B1/34 , B08B1/40 , H02S40/10 , A46B2200/3073
摘要: A cleaning robot (10) for cleaning solar collectors comprises a gantry-type frame (16) configured to span a row (14) of solar collectors (12) and to define a corresponding cleaning space (24); and wheels (28) that are fixed to the gantry frame in order to move the latter and are associated with drive means. A cleaning tool (30) extends across the width of the gantry and is able to move in the cleaning space in order to be positioned with respect to the upper surface of the solar collectors (12), the cleaning tool being guided by means of guide rails (40, 42) fixed to the frame. Actuating means (54, 56) are provided to move the cleaning tool along the guide rails. At least one distance sensor (64) is arranged to determine a distance between the cleaning tool and a respective solar panel. A control unit (70) is connected to the distance sensor(s) and is configured to, continuously, adjust the position of the cleaning tool with respect to the solar panels of a row. The frame (16) comprises two lateral uprights (18, 20) that are connected in their upper part by a transverse member (22), and one of the guide rails (40, 42) is fixed to each of the lateral uprights (18, 20). The cleaning tool (30) has, towards each of its ends, a respective guide element (44) which cooperates with an associated guide rail (40, 42). The two guide rails (40, 42) define a plane of movement for the cleaning tool (30) and one of the guide rails (42) is mounted in articulated manner on one of the lateral uprights (20) so as to be able to pivot in the plane of movement. The actuating means (54, 56) comprise, at the two ends of the cleaning tool, a respective linear actuator connected to the frame, an actuating rod (54.2, 56.2) of which is connected to the cleaning tool (30) and to the guide element (44), respectively.
-
公开(公告)号:US20240316954A1
公开(公告)日:2024-09-26
申请号:US18670054
申请日:2024-05-21
发明人: Kenichiro KANEKO , Yohei SHIBATA
CPC分类号: B41J11/0022 , B08B1/14 , B08B1/20 , B08B1/34 , B41J15/046 , B41J15/16 , B41J29/17
摘要: A medium heating apparatus includes a heating unit configured to heat a medium on which liquid was ejected, a winding unit configured to wind the medium heated by the heating unit, and a guide bar around which the medium is wound between the heating unit and the winding unit, the guide bar being configured to guide the medium to the winding unit. The heating unit includes a heat source facing a surface of the medium on which liquid was ejected, and a jetting unit configured to jet air to the surface of the medium on which liquid was ejected, and the guide bar is configured to make contact with the surface of the medium on which liquid was ejected, and configured to be rotatable.
-
6.
公开(公告)号:US20240283399A1
公开(公告)日:2024-08-22
申请号:US18577910
申请日:2022-07-06
发明人: Seung Gu KANG
摘要: A solar cell panel cleaning system according to an embodiment of the present invention includes a cleaning unit body configured to remove foreign substances attached to the solar cell panel, a driving force-providing unit configured to move the cleaning unit body, and a controller including a contamination region calculation unit configured to sense a contaminated region of the solar cell panel, and a wireless communication module configured to provide information on the contaminated region to the driving force-providing unit and the cleaning unit body.
-
公开(公告)号:US20240216956A1
公开(公告)日:2024-07-04
申请号:US18397723
申请日:2023-12-27
发明人: Xiaokang DONG , Jian SUN , Hao LV , Yang DING , Jing WANG , Huiguo WU , Zhibo GAO , Sihao BAN , Jianfeng WANG , Dehua ZHOU , Yonghai LIU , Chunfeng ZHOU , Zhiyong LIANG , Xisheng XU
CPC分类号: B08B1/12 , A46B13/001 , A46B13/02 , A47L11/282 , A47L11/4041 , A47L11/4063 , A47L11/4088 , B08B1/34 , B08B5/043 , A46B2200/3033
摘要: A cleaning system, a cleaning device and a control method therefor, are associated with a floor brush assembly that includes a roller brush housing, a roller brush, a roller brush cover. The roller brush cover and the floor brush housing enclose a roller brush cavity for fitting with the roller brush. The roller brush cover is configured to be operable in a first or second position relative to the floor brush housing. In the first position, there is a first contact area between the roller brush cover and the roller brush. In the second position, there is a second contact area between the roller brush cover and the roller brush. The first contact area is greater than or equal to zero, but less than the second contact area. The inner wall of the roller brush cover can be cleaned by the roller brush.
-
公开(公告)号:US20240145276A1
公开(公告)日:2024-05-02
申请号:US18497324
申请日:2023-10-30
申请人: EBARA CORPORATION
发明人: Yosuke HIMORI
CPC分类号: H01L21/67253 , B08B1/14 , B08B1/20 , B08B1/34 , B08B3/041 , H01L21/67034 , H01L21/67046 , H01L21/68707 , H05F1/00
摘要: Provided is a substrate cleaning apparatus including: a substrate holding and rotating mechanism configured to hold and rotate a substrate; a cleaning liquid supplier configured to supply a cleaning liquid to the substrate; a cleaning member configured to come into contact with the substrate to clean the substrate; a charge amount adjustment apparatus capable of increasing and decreasing a charge amount of the substrate; a charge amount measuring instrument configured to measure the charge amount of the substrate; and a controller configured to control the charge amount adjustment apparatus according to the charge amount measured by the charge amount measuring instrument.
-
9.
公开(公告)号:US20240351078A1
公开(公告)日:2024-10-24
申请号:US18683735
申请日:2022-08-19
申请人: EBARA CORPORATION
发明人: Naoyuki HANDA , Satomi HAMADA
摘要: A substrate cleaning apparatus that brings a cleaning tool into sliding contact with a substrate surface while rotating the substrate to perform scrub-cleaning includes a cleaning liquid supply unit that ejects cleaning liquid onto the surface of the substrate to perform a rinsing process of the substrate after scrub-cleaning, in which a temperature of the cleaning liquid in the rinsing process is set to 0° C. to 20° C. The cleaning liquid supply unit includes a first cleaning liquid supply unit that supplies the cleaning liquid toward the vicinity of the center of the substrate and a second cleaning liquid supply unit that supplies the cleaning liquid in a spray form toward a region between the center and an edge of the substrate, and a first ejection angle by the first cleaning liquid supply unit is smaller than a second ejection angle by the second cleaning liquid supply unit.
-
公开(公告)号:US20240329214A1
公开(公告)日:2024-10-03
申请号:US18611902
申请日:2024-03-21
申请人: Robert Bosch GmbH
发明人: Zoltan Gyonyoru , Akos Hegyi , Bence Balint , Gyorgy Szabo , Janos Simonovics , Mate Hornyak , Peter Deak
IPC分类号: G01S7/497 , B08B1/34 , G01S17/931
CPC分类号: G01S7/497 , B08B1/34 , G01S2007/4977 , G01S17/931
摘要: A LiDAR cleaning system includes a cleaning arm configured to clean a sensor surface of a LiDAR sensor by displacement of the cleaning arm. The system further includes a drive unit having at least two deflection elements and a belt element. The cleaning arm is detachably connected to the belt element. The drive unit is configured to displace the cleaning arm by rotation of the belt element about the at least two deflection elements to clean the sensor surface.
-
-
-
-
-
-
-
-
-