SUBSTRATE CLEANING DEVICE
    2.
    发明公开

    公开(公告)号:US20240321598A1

    公开(公告)日:2024-09-26

    申请号:US18579208

    申请日:2022-06-30

    IPC分类号: H01L21/67 B08B1/12 B08B1/34

    摘要: A substrate cleaning device includes a substrate holder, a lower-surface brush, a first liquid nozzle and a second liquid nozzle. The substrate holder holds a substrate in a horizontal attitude. The lower-surface brush is configured to be movable between a processing position for cleaning of the substrate and a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction. Further, the lower-surface brush is configured to be rotatable about an axis extending in the up-and-down direction. The lower-surface brush cleans a lower surface of the substrate by coming into contact with the lower surface of the substrate. The first liquid nozzle discharges a cleaning liquid to a center portion of the lower-surface brush, at a waiting position. The second liquid nozzle discharges a cleaning liquid to an end portion of the lower-surface brush, at the waiting position.

    Roll Cleaning Device
    3.
    发明公开

    公开(公告)号:US20240316599A1

    公开(公告)日:2024-09-26

    申请号:US18575054

    申请日:2022-09-15

    发明人: Kang Ho Seong

    IPC分类号: B08B1/16 B08B1/34

    CPC分类号: B08B1/165 B08B1/34

    摘要: A roll cleaning device according to one example of the present invention comprises at least one knife, wherein the at least one knife comprises a cleaning part surrounding a target roll to be in contact with the outer circumferential surface of the target roll on which foreign substances are present, and an operating part, which is connected to the cleaning part, for moving the at least one knife along the circumferential direction on the outer circumferential surface of the target roll.

    CLEANING ROBOT FOR A SOLAR POWER PLANT
    4.
    发明公开

    公开(公告)号:US20240310078A1

    公开(公告)日:2024-09-19

    申请号:US18575438

    申请日:2022-06-30

    摘要: A cleaning robot (10) for cleaning solar collectors comprises a gantry-type frame (16) configured to span a row (14) of solar collectors (12) and to define a corresponding cleaning space (24); and wheels (28) that are fixed to the gantry frame in order to move the latter and are associated with drive means. A cleaning tool (30) extends across the width of the gantry and is able to move in the cleaning space in order to be positioned with respect to the upper surface of the solar collectors (12), the cleaning tool being guided by means of guide rails (40, 42) fixed to the frame. Actuating means (54, 56) are provided to move the cleaning tool along the guide rails. At least one distance sensor (64) is arranged to determine a distance between the cleaning tool and a respective solar panel. A control unit (70) is connected to the distance sensor(s) and is configured to, continuously, adjust the position of the cleaning tool with respect to the solar panels of a row. The frame (16) comprises two lateral uprights (18, 20) that are connected in their upper part by a transverse member (22), and one of the guide rails (40, 42) is fixed to each of the lateral uprights (18, 20). The cleaning tool (30) has, towards each of its ends, a respective guide element (44) which cooperates with an associated guide rail (40, 42). The two guide rails (40, 42) define a plane of movement for the cleaning tool (30) and one of the guide rails (42) is mounted in articulated manner on one of the lateral uprights (20) so as to be able to pivot in the plane of movement. The actuating means (54, 56) comprise, at the two ends of the cleaning tool, a respective linear actuator connected to the frame, an actuating rod (54.2, 56.2) of which is connected to the cleaning tool (30) and to the guide element (44), respectively.

    SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING METHOD, AND SUBSTRATE POLISHING APPARATUS

    公开(公告)号:US20240351078A1

    公开(公告)日:2024-10-24

    申请号:US18683735

    申请日:2022-08-19

    申请人: EBARA CORPORATION

    摘要: A substrate cleaning apparatus that brings a cleaning tool into sliding contact with a substrate surface while rotating the substrate to perform scrub-cleaning includes a cleaning liquid supply unit that ejects cleaning liquid onto the surface of the substrate to perform a rinsing process of the substrate after scrub-cleaning, in which a temperature of the cleaning liquid in the rinsing process is set to 0° C. to 20° C. The cleaning liquid supply unit includes a first cleaning liquid supply unit that supplies the cleaning liquid toward the vicinity of the center of the substrate and a second cleaning liquid supply unit that supplies the cleaning liquid in a spray form toward a region between the center and an edge of the substrate, and a first ejection angle by the first cleaning liquid supply unit is smaller than a second ejection angle by the second cleaning liquid supply unit.