Hard film sliding part and method of manufacturing the sliding part
    5.
    发明授权
    Hard film sliding part and method of manufacturing the sliding part 有权
    硬膜滑动部件和制造滑动部件的方法

    公开(公告)号:US09034461B2

    公开(公告)日:2015-05-19

    申请号:US13765254

    申请日:2013-02-12

    申请人: HITACHI, LTD.

    发明人: Itto Sugimoto

    摘要: Disclosed herein is a hard film containing boron and carbon, wherein the hard film includes a plurality of concave portions and a plurality of convex portions formed on a surface of the hard film, and wherein carbon concentration in the concave portion is higher than that in the convex portion and boron concentration in the convex portion is higher than that in the concave portion. Further, disclosed herein is a method of manufacturing a sliding part having a hard film containing boron and carbon disposed over a substrate; wherein the hard film is manufactured by using at least one of an unbalanced magnetron sputtering method or a high power pulsed magnetron sputtering method, both sputtering methods using a target containing at least one of elements of silicon, chromium, titanium, and tungsten and a boron carbide target.

    摘要翻译: 本发明公开了含有硼和碳的硬膜,其中硬膜包括多个凹部和形成在硬膜表面上的多个凸部,其中凹部中的碳浓度高于 凸部的凸部和硼浓度比凹部高。 此外,本文公开了一种制造具有设置在基板上的含有硼和碳的硬膜的滑动部件的方法; 其中通过使用不平衡磁控溅射法或高功率脉冲磁控溅射法中的至少一种制造硬膜,使用包含硅,铬,钛和钨的元素中的至少一种的靶的溅射方法和硼 碳化物靶。

    STRUCTURED MATERIAL
    8.
    发明申请
    STRUCTURED MATERIAL 审中-公开
    结构材料

    公开(公告)号:US20140295142A1

    公开(公告)日:2014-10-02

    申请号:US14225284

    申请日:2014-03-25

    IPC分类号: C01B33/12

    摘要: A structured material includes a base member, and a mesostructured member disposed on the surface of the base member. The mesostructured member includes a wall defining cylindrically shaped portions. The base member has a plurality of grooves periodically formed in the surface thereof. The grooves each have a bottom surface and side surfaces in a shape in which a plane including the bottom surface is perpendicular to planes including the side surfaces. The cylindrically shaped portions in a region opposite to the base member with respect to an imaginary surface of the base member defined by imaginarily filling grooves to form an even surface are oriented at angles within a range of ±10° with respect to a direction perpendicular to the longitudinal direction of the grooves.

    摘要翻译: 结构材料包括基底构件和设置在基底构件的表面上的介质结构构件。 介质结构件包括限定圆柱形部分的壁。 基部构件具有在其表面中周期性地形成的多个凹槽。 凹槽各自具有底表面和侧表面,其中包括底表面的平面垂直于包括侧表面的平面。 相对于基本构件相对于基本构件的假想表面的圆柱形部分,其通过成像填充凹槽形成均匀表面而限定,以相对于垂直于垂直于该垂直方向的方向为±10°的角度定向 槽的纵向方向。

    Method of producing an optical element having a mark
    9.
    发明授权
    Method of producing an optical element having a mark 有权
    具有标记的光学元件的制造方法

    公开(公告)号:US08828284B2

    公开(公告)日:2014-09-09

    申请号:US13741423

    申请日:2013-01-15

    摘要: The present invention relates to a method of forming an optical element that includes a mark. The method involves, irradiating at least a portion of a surface of the optical element with laser radiation, thereby forming a plurality of substantially parallel elongated grooves in the portion of the surface, which are each aligned substantially parallel with a common longitudinal direction that extends from a center point of the plurality of elongated grooves. The plurality of elongated grooves together define the mark. A clear film is formed over at least the portion of the surface and the plurality of elongated grooves. Depending on the orientation of a source of electromagnetic radiation as viewed through the optical element relative to the common longitudinal direction of the grooves, the mark is either observable or unobservable. The present invention also relates to an optical element having a mark, as described above.

    摘要翻译: 本发明涉及一种形成包括标记的光学元件的方法。 该方法包括用激光辐射照射光学元件的表面的至少一部分,从而在表面的部分中形成多个基本上平行的细长凹槽,每个细长凹槽基本上平行于从 多个细长槽的中心点。 多个细长槽一起限定标记。 在表面和多个细长槽的至少部分上形成透明膜。 根据通过光学元件相对于凹槽的公共纵向方向观察的电磁辐射源的取向,该标记是可观察的或不可观察的。 本发明还涉及具有如上所述的标记的光学元件。

    Embedded nanoparticle films and method for their formation in selective areas on a surface
    10.
    发明授权
    Embedded nanoparticle films and method for their formation in selective areas on a surface 有权
    嵌入的纳米颗粒膜及其在表面上的选择性区域中形成的方法

    公开(公告)号:US08802047B2

    公开(公告)日:2014-08-12

    申请号:US13892801

    申请日:2013-05-13

    IPC分类号: B32B3/12 B82Y40/00 C01B31/00

    摘要: One-dimensional materials are prepared from an array of nanoparticles positioned in one or more recesses of a substrate, wherein the recesses and the positioned nanoparticles have a comparable diameter of the same order of magnitude such that one nanoparticle is positioned within each of the one or more recesses; wherein a depth of the one or more recesses is from 10 nm to 40 nm; and wherein a diameter of the one or more recesses is adjusted by conformal film deposition and is between one and two times the mean diameter of the nanoparticles, and wherein the nanoparticles have a mean diameter of from 1 nm to 50 nm, and wherein the nanoparticles are catalytic sites for the growth of the one-dimensional materials; wherein the one dimensional materials are non-aggregated and extend in a direction that is perpendicular or approximately perpendicular to the horizontal surface of the substrate.

    摘要翻译: 一维材料由位于衬底的一个或多个凹槽中的纳米颗粒阵列制备,其中凹部和定位的纳米颗粒具有相同数量级的相当的直径,使得一个纳米颗粒位于一个或多个 更多的凹陷; 其中所述一个或多个凹部的深度为10nm至40nm; 并且其中所述一个或多个凹部的直径通过保形膜沉积来调节,并且是所述纳米颗粒的平均直径的一至二倍,并且其中所述纳米颗粒具有1nm至50nm的平均直径,并且其中所述纳米颗粒 是一维材料生长的催化位点; 其中所述一维材料是非聚集的并且在垂直于或大致垂直于所述基底的水平表面的方向上延伸。