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    Radiantly heated cathode for an electron gun and heating assembly
    1.
    发明申请
    Radiantly heated cathode for an electron gun and heating assembly 失效
    用于电子枪和加热组件的辐射加热阴极

    公开(公告)号：US20060169928A1

    公开(公告)日：2006-08-03

    申请号：US11050394

    申请日：2005-02-02

    申请人： Michael Sogard ,  Mark Takita

    发明人： Michael Sogard ,  Mark Takita

    IPC分类号： H01J37/317 ,  H01J37/073

    CPC分类号： H01J37/242 ,  H01J2237/3175

    摘要： A heating assembly (36) for heating a cathode (38) of an electron gun (30) of an exposure apparatus (10) includes a radiation source (42) and a beam shaper (44). The radiation source (42) generates a source beam (46). The beam shaper (44) receives the source beam (46) and selectively shapes the source beam (46) into a shaped beam (48) that is directed to the cathode (38). In certain embodiments, the beam shaper (44) can readily change the shape and intensity profile of the shaped beam (48) to achieve a desired electron beam (32) from the electron gun (30). In one embodiment, the radiation source (42) generates a pulsed source beam (46).

    摘要翻译： 用于加热曝光装置（10）的电子枪（30）的阴极（38）的加热组件（36）包括辐射源（42）和光束整形器（44）。 辐射源（42）产生源光束（46）。 光束整形器（44）接收源光束（46）并且选择性地将源光束（46）成形为被引导到阴极（38）的成形光束（48）。 在某些实施例中，光束整形器（44）可以容易地改变成形光束（48）的形状和强度分布，以实现来自电子枪（30）的期望的电子束（32）。 在一个实施例中，辐射源（42）产生脉冲源光束（46）。

    Method of predicting a lifetime of filament in ion source and ion source device
    2.
    发明授权
    Method of predicting a lifetime of filament in ion source and ion source device 失效
    在离子源和离子源装置中预测长丝寿命的方法

    公开(公告)号：US07034543B2

    公开(公告)日：2006-04-25

    申请号：US10712344

    申请日：2003-11-14

    申请人： Koji Iwasawa

    发明人： Koji Iwasawa

    IPC分类号： G01R31/08

    CPC分类号： H01J27/022 ,  H01J37/08 ,  H01J37/242

    摘要： An ion source device includes an ion source having a filament for emitting thermoelectrons, a current measuring device for measuring current flowing through the filament, a voltage measuring device for measuring voltage across the filament, a resistance operation device for computing a resistance value of the filament by using the current and the voltage measured by the current and voltage measuring devices, and a prediction operation device for computing a time till the application limits of the filament or a time left till the application limits of the filament.

    摘要翻译： 离子源装置包括具有用于发射热电子的灯丝的离子源，用于测量流过灯丝的电流的电流测量装置，用于测量灯丝两端的电压的电压测量装置，用于计算灯丝电阻值的电阻操作装置 通过使用由电流和电压测量装置测量的电流和电压，以及用于计算直到灯丝的施加极限或剩余时间直到灯丝的施加极限的时间的预测操作装置。

    Electron beam apparatus and device manufacturing method using same
    4.
    发明申请
    Electron beam apparatus and device manufacturing method using same 失效
    电子束装置及其制造方法

    公开(公告)号：US20030042417A1

    公开(公告)日：2003-03-06

    申请号：US10234152

    申请日：2002-09-05

    申请人： EBARA CORPORATION

    发明人： Mamoru Nakasuji ,  Takao Kato ,  Kenji Watanabe ,  Shoji Yoshikawa ,  Tohru Satake ,  Nobuharu Noji

    IPC分类号： H01J037/28

    CPC分类号： B82Y10/00 ,  G01N23/225 ,  G01R31/307 ,  H01J37/242 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24507 ,  H01J2237/2817

    摘要： An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises an electron-optical column for accommodating an electron beam source, an objective lens, an ExB separator, and a secondary electron beam detector; a stage for holding the sample, and relatively moving the sample with respect to the electron-optical column; a working chamber for accommodating the stage and capable of controlling the interior thereof in a vacuum atmosphere; a loader for supplying a sample to the stage; a voltage applying mechanism for applying a voltage to the sample, and capable of applying at least two voltages to a lower electrode of the objective lens; and an alignment mechanism for measuring a direction in which dies are arranged on the sample. When the sample is evaluated, a direction in which the stage is moved is corrected to align with the direction in which the dies are arranged.

    摘要翻译： 提供电子束装置，用于以简单的结构以高通量可靠地测量电位对比度等。 用于照射形成有电子束图案的晶片的样品（如晶片）以评估样品的电子束装置包括用于容纳电子束源的电子 - 光学柱，物镜，ExB分离器和次级 电子束检测器 用于保持样品的阶段，并相对于电子 - 光学柱相对移动样品; 用于容纳舞台并能够在真空气氛中控制其内部的工作室; 用于将样品供应到载物台的装载机; 电压施加机构，用于向样品施加电压，并且能够向物镜的下电极施加至少两个电压; 以及用于测量模具布置在样品上的方向的对准机构。 当评估样品时，对载物台移动的方向进行校正，使其与模具的排列方向一致。

    STERILIZATION DEVICE AND AN ELECTRON BEAM EMITTER
    7.
    发明申请
    STERILIZATION DEVICE AND AN ELECTRON BEAM EMITTER 有权
    灭菌装置和电子束发射器

    公开(公告)号：US20170056539A1

    公开(公告)日：2017-03-02

    申请号：US15120079

    申请日：2015-01-21

    申请人： TETRA LAVAL HOLDINGS & FINANCE S.A.

    发明人： Håkan MELLBIN

    IPC分类号： A61L2/08 ,  H01J37/07 ,  B65B55/08 ,  H01J37/24

    CPC分类号： A61L2/087 ,  A61L2202/11 ,  A61L2202/23 ,  B65B55/08 ,  G21K5/02 ,  H01J37/07 ,  H01J37/242

    摘要： Sterilization device, in particular for sterilization of packaging material, comprising a first chamber, a barrier element and a connection area. The first chamber is adapted to provide charge carriers for sterilization, and the connection area is connected to a third chamber so that the barrier element forms at least one part of the boundary of a volume in which a first atmosphere exists.

    摘要翻译： 杀菌装置，特别是灭菌包装材料，包括第一室，屏障元件和连接区域。 第一室适于提供用于灭菌的电荷载体，并且连接区域连接到第三室，使得屏障元件形成存在第一气氛的体积的边界的至少一部分。

    Radiantly heated cathode for an electron gun and heating assembly
    8.
    发明授权
    Radiantly heated cathode for an electron gun and heating assembly 失效
    用于电子枪和加热组件的辐射加热阴极

    公开(公告)号：US07250618B2

    公开(公告)日：2007-07-31

    申请号：US11050394

    申请日：2005-02-02

    申请人： Michael Sogard ,  Mark Takita

    发明人： Michael Sogard ,  Mark Takita

    IPC分类号： G21K5/10 ,  G01N23/04

    CPC分类号： H01J37/242 ,  H01J2237/3175

    摘要： A heating assembly (36) for heating a cathode (38) of an electron gun (30) of an exposure apparatus (10) includes a radiation source (42) and a beam shaper (44). The radiation source (42) generates a source beam (46). The beam shaper (44) receives the source beam (46) and selectively shapes the source beam (46) into a shaped beam (48) that is directed to the cathode (38). In certain embodiments, the beam shaper (44) can readily change the shape and intensity profile of the shaped beam (48) to achieve a desired electron beam (32) from the electron gun (30). In one embodiment, the radiation source (42) generates a pulsed source beam (46).

    摘要翻译： 用于加热曝光装置（10）的电子枪（30）的阴极（38）的加热组件（36）包括辐射源（42）和光束整形器（44）。 辐射源（42）产生源光束（46）。 光束整形器（44）接收源光束（46）并且选择性地将源光束（46）成形为被引导到阴极（38）的成形光束（48）。 在某些实施例中，光束整形器（44）可以容易地改变成形光束（48）的形状和强度分布，以实现来自电子枪（30）的期望的电子束（32）。 在一个实施例中，辐射源（42）产生脉冲源光束（46）。

    Electron beam apparatus and device manufacturing method using same
    9.
    发明授权
    Electron beam apparatus and device manufacturing method using same 失效
    电子束装置及其制造方法

    公开(公告)号：US07205540B2

    公开(公告)日：2007-04-17

    申请号：US11262844

    申请日：2005-11-01

    申请人： Mamoru Nakasuji ,  Takao Kato ,  Kenji Watanabe ,  Shoji Yoshikawa ,  Tohru Satake ,  Nobuharu Noji

    发明人： Mamoru Nakasuji ,  Takao Kato ,  Kenji Watanabe ,  Shoji Yoshikawa ,  Tohru Satake ,  Nobuharu Noji

    IPC分类号： G21K7/00 ,  H01J37/28 ,  H01L21/66 ,  G01N23/00

    CPC分类号： B82Y10/00 ,  G01N23/225 ,  G01R31/307 ,  H01J37/242 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24507 ,  H01J2237/2817

    摘要： An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises an electron-optical column for accommodating an electron beam source, an objective lens, an E×B separator, and a secondary electron beam detector; a stage for holding the sample, and relatively moving the sample with respect to the electron-optical column; a working chamber for accommodating the stage and capable of controlling the interior thereof in a vacuum atmosphere; a loader for supplying a sample to the stage; a voltage applying mechanism for applying a voltage to the sample, and capable of applying at least two voltages to a lower electrode of the objective lens; and an alignment mechanism for measuring a direction in which dies are arranged on the sample. When the sample is evaluated, a direction in which the stage is moved is corrected to align with the direction in which the dies are arranged.

    摘要翻译： 提供电子束装置，用于以简单的结构以高通量可靠地测量电位对比度等。 用于照射形成有电子束图案的晶片的样品（如晶片）以评估样品的电子束装置包括用于容纳电子束源的电子 - 光学柱，物镜，ExB分离器和次级 电子束检测器 用于保持样品的阶段，并相对于电子 - 光学柱相对移动样品; 用于容纳舞台并能够在真空气氛中控制其内部的工作室; 用于将样品供应到载物台的装载机; 电压施加机构，用于向样品施加电压，并且能够向物镜的下电极施加至少两个电压; 以及用于测量模具布置在样品上的方向的对准机构。 当评估样品时，对载物台移动的方向进行校正，使其与模具的排列方向一致。