Abstract:
A capacitor circuit having improved reliability includes at least first and second capacitors, a first terminal of the first capacitor connecting to a first source providing a first voltage, a first terminal of the second capacitor connecting to a second source providing a second voltage, the first voltage being greater than the second voltage. The capacitor further includes a voltage comparator having a first input for receiving a voltage representative of the first voltage, a second input for receiving a third voltage provided by a third source, and an output for generating a control signal. The control signal is a function of a difference between the voltage representative of the first voltage and the third voltage. A switch is connected to second terminals of the first and second capacitors. The switch is selectively operable in one of at least a first mode and a second mode in response to the control signal, wherein in the first mode the switch is operative to connect the first and second capacitors together in parallel, and in the second mode the switch is operative to connect the first and second capacitors together in series. The first mode is indicative of the voltage representative of the first voltage being less than or about equal to the third voltage, and the second mode is indicative of the voltage representative of the first voltage being greater than the third voltage.
Abstract:
An improved structure of an electric shock device includes a handle, and a plurality of retractable rod portions. The handle has an interior accommodating therein a high voltage generator and a battery unit. The handle further has a control switch at a lower rim thereof. The retractable rod portions are arranged and assembled in order of size, and equipped with a retractable function by utilizing springs and retaining rods disposed therein. The rod portions are made of insulating materials and respectively provided with parallel positive and negative electrode plates on both sides thereof. The electrode plates nearest to the handle are connected to positive and negative terminals of the high voltage generator so as to supply the rod portions with the required high voltages. The permittivity of dielectrics on the rod portions that have different diameters is caused to be equivalent so that the conductance conditions of the rod portions are the same, and the rod portions can all generate electric arcs.
Abstract:
An electrostatic chucking device having a laminated structure formed by sequentially laminating a first insulation layer, an electrode layer, and a second insulation layer on a metal substrate. The first and second insulation layers are formed from polyimide films. At least one adhesion layer is provided between the metal substrate and the first insulation layer, and is a thermoplastic polyimide-based adhesive film having a film thickness of 5 to 50 μm.
Abstract:
A multi-purpose battery for mobile phones includes a battery casing and a charging battery unit accommodated in the battery casing. The battery unit has a positive pole connected via a contact "a" of a switching switch to positive poles of a charging contact terminal and a power supply contact terminal. The contact "a" of the switching switch further connects an illuminating element and a press switch to the charging battery unit and negative poles of the charging contact terminal and the power supply contact terminal. The switching switch has another contact "b" connected in series with a buzzer and a high-voltage generator, both of which capable of forming a loop with the charging battery unit when the press switch is pressed. The high-voltage generator is connected to an electric guide rod controllable by a push switch to extend from or retract into the battery casing. All of the above-mentioned components are embedded below an outer planar surface of the battery casing to facilitate operation.
Abstract:
A method for clamping a wafer to an electrostatic chuck having a substantially resistive dielectric layer disposed thereon. The method includes the step of providing a build-up voltage having a first polarity to a pole of the electrostatic chuck to cause a potential difference to build up between a first region of the substantially resistive dielectric layer and a second region of the wafer that overlies at least a portion of the first region. This potential difference gives rise to a clamping force to clamp the wafer to the electrostatic chuck. The method further includes the step of terminating the build-up voltage when the clamping force substantially reaches a predefined level. There is further included the step of providing a holding voltage to the pole of the electrostatic chuck to substantially maintain the clamping force at the predefined level. This holding voltage has the first polarity and a magnitude that is lower than a magnitude of the build-up voltage. There is further included the step of providing a declamping voltage to the pole of the electrostatic chuck to substantially remove the clamping force, the declamping voltage having a polarity that is opposite to the first polarity.
Abstract:
A personal defense device is provided that includes a shield and an electric shock device. The shield is configured to protect a user and circuitry from physical attack. The personal defense device is configured to be worn by a user such that it is difficult or impossible for an attacker to remove the personal defense device during an attack. In one embodiment, the personal defense device includes a gauntlet-style glove attached to the shield and electric shock device so as to provide protection for a user's forearm. The electric shock device is configured to deliver less-lethal electrical shocks and/or sparks to startle, disarm, and repel an aggressor.
Abstract:
An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises an electron-optical column for accommodating an electron beam source, an objective lens, an ExB separator, and a secondary electron beam detector; a stage for holding the sample, and relatively moving the sample with respect to the electron-optical column; a working chamber for accommodating the stage and capable of controlling the interior thereof in a vacuum atmosphere; a loader for supplying a sample to the stage; a voltage applying mechanism for applying a voltage to the sample, and capable of applying at least two voltages to a lower electrode of the objective lens; and an alignment mechanism for measuring a direction in which dies are arranged on the sample. When the sample is evaluated, a direction in which the stage is moved is corrected to align with the direction in which the dies are arranged.
Abstract:
An electrostatic chuck 20 for holding a substrate 25 in a process chamber 30 comprises an electrostatic member 115 comprising a polymer 120 covering an electrode 125, the polymer 120 having a receiving surface 135 for receiving the substrate 25. A heater 130 abutting the polymer 120 is provided to heat the substrate 25 during processing of the substrate 25. The heater 130 has a resistance that is sufficiently low to heat the substrate 25 without causing excessive thermal degradation of the polymer 120.
Abstract:
An electrostatic chuck for attracting an object for treatment. The electrostatic chuck includes a substrate, an insulating dielectric layer and at least one electrode located between the substrate and the insulating dielectric layer. The object is attracted onto the electrode via the insulating dielectric layer. The insulating dielectric layer is between 0.5 mm and 5.0 mm thick, and utilizes a gas-introducing hole to form a gas-diffusing depression on the side of an attractive surface, allowing for more uniform heat conduction. The gas-diffusing depression is between 100 um and 5.0 mm deep. The distance between the bottom surface of the gas-diffusing depression and an electrode may range from 500 .mu.m to 5 mm.
Abstract:
A non-lethal alternative to the anti-personnel landmine. The TASER.RTM. alternative uses electronic stun capability in combination with a landmine housing and deployment system. The device can cover a radius of 15 feet (30 feet possible) and can be triggered by various sensors. Although the TASER.RTM. non-lethal area denial device would cause no deaths or injuries if accidentally triggered by friendly forces, it can also be permanently disabled when no longer needed, by remotely using a secure code to shut down the TASER.RTM. system. When triggered, the device launches darts in multiple directions at 10 or 20 degree intervals in a direction generally facing the enemy. The darts temporarily incapacitate any persons within an inch of the darts by causing uncontrollable spasms of the near surface motor control muscles causing temporary loss of the subject's motor control functions. The subject will fall and temporarily be completely incapacitated. The device will take down persons wearing soft body armor because high voltage electricity readily arcs through the fabric weaving holes. A timing circuit keeps the subjects incapacitated until they can be taken into custody by nearby troops. After the very low power signal is turned off, the subject will recover within minutes. The TASER.RTM. device produces no collateral damage and poses no lethal threat to friendly forces even if accidentally triggered. The device may be remotely shut down permanently via an encrypted security code.