公开(公告)号：US08852858B2

公开(公告)日：2014-10-07

申请号：US11811279

申请日：2007-06-07

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： C12Q1/68 ,  G01N21/17 ,  G01N21/64 ,  B01L7/00

CPC分类号： B01L7/54 ,  B01L2300/0636 ,  B01L2300/0877 ,  B01L2300/1805 ,  B01L2300/1838 ,  C12Q1/6837

摘要： Methods for performing a hybridization assay between a target biomolecule and an array comprising a surface to which are attached biomolecular probes with different, known sequences, at discrete, known locations, the method comprising: providing a container holding a hybridization mixture comprising the target biomolecule and also holding the array; and creating a temperature gradient in the hybridization mixture oriented within the container such that at least a portion of the target biomolecule is driven onto the surface of the array.

摘要翻译： 用于在目标生物分子和阵列之间进行杂交测定的方法，所述阵列包括在离散的已知位置处与不同已知序列连接的生物分子探针的表面，所述方法包括：提供容纳含有靶生物分子和 也拿着数组; 并在定向在容器内的杂交混合物中产生温度梯度，使得至少一部分目标生物分子被驱动到阵列的表面上。

公开(公告)号：US08711335B2

公开(公告)日：2014-04-29

申请号：US13533775

申请日：2012-06-26

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G01P3/40

CPC分类号： G01B21/047 ,  G01B5/012 ,  G01B11/002 ,  G01S1/70 ,  G01S5/16

摘要： A stroboscopic light source (22) for a transmitter (14) of a metrology system (10) the monitors the position or shape of an object (12) includes a source housing (224) and a pulsed light generator (232). The stroboscopic light source (22) emits a pulsed beam (20) that is used to identify the transmitter (14). The source housing (224) defines a housing cavity (226) and includes an inlet port (228) and one or more outlet ports (230). The pulsed light generator (232) generates the pulsed beam (20) that is directed into the housing cavity (226) via the inlet port (228). Subsequently, the pulsed beam (20) emits from the outlet ports (230) of the source housing (224).

摘要翻译： 用于监测物体（12）的位置或形状的测量系统（10）的发射器（14）的频闪光源（22）包括源壳体（224）和脉冲光发生器（232）。 频闪光源（22）发射用于识别发射机（14）的脉冲波束（20）。 源壳体（224）限定壳体腔（226）并且包括入口端口（228）和一个或多个出口端口（230）。 脉冲光发生器（232）产生经由入口（228）引导到壳体空腔（226）中的脉冲光束（20）。 随后，脉冲光束（20）从源壳体（224）的出口（230）发射。

公开(公告)号：US08456610B2

公开(公告)日：2013-06-04

申请号：US12382661

申请日：2009-03-20

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： A liquid containment system is used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate. The liquid containment system includes a liquid containment member which confines the liquid, the liquid containment member including a removing inlet which removes the liquid from a gap between the liquid confinement member and the substrate. The liquid containment system also includes an actuator by which the liquid containment member is moved.

公开(公告)号：US08194229B2

公开(公告)日：2012-06-05

申请号：US12222421

申请日：2008-08-08

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03D3/02 ,  C07K14/005 ,  C12N2740/15022 ,  G01N33/56983 ,  G01N2333/155 ,  G01N2469/20 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/7085 ,  G03F7/709

摘要： An apparatus includes a stage that supports a substrate, an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid, and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator.

摘要翻译： 一种装置包括支撑基板的台，具有最后光学元件的光学系统，其将图像投影到基板上，该基板与最后的光学元件间隔开至少部分地填充有浸没液体的间隙，以及 压力控制系统具有致动器，其使用致动器来控制间隙中的浸没液体的压力。

公开(公告)号：US07839486B2

公开(公告)日：2010-11-23

申请号：US11701378

申请日：2007-02-02

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/42 ,  G03B27/52

摘要： A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

公开(公告)号：US20090180096A1

公开(公告)日：2009-07-16

申请号：US12382661

申请日：2009-03-20

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： A liquid containment system is used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate. The liquid containment system includes a liquid containment member which confines the liquid, the liquid containment member including a removing inlet which removes the liquid from a gap between the liquid confinement member and the substrate. The liquid containment system also includes an actuator by which the liquid containment member is moved.

摘要翻译： 液体容纳系统用于液浸式光刻设备，其中衬底通过液体在投影系统的光学构件和衬底之间暴露。 液体容纳系统包括限制液体的液体容纳构件，液体容纳构件包括从液体限制构件和衬底之间的间隙去除液体的去除入口。 液体容纳系统还包括致动器，液体容纳构件通过致动器移动。

公开(公告)号：US20080109178A1

公开(公告)日：2008-05-08

申请号：US11982656

申请日：2007-11-02

申请人： Michael Sogard ,  Bausan Yuan ,  James Minor ,  Yu Tang

发明人： Michael Sogard ,  Bausan Yuan ,  James Minor ,  Yu Tang

IPC分类号： G06F19/00

CPC分类号： G01B9/02027 ,  G01B9/02021 ,  G01B9/0207 ,  G01B9/02083 ,  G03F7/705 ,  G03F7/70775

摘要： A method and system for predicting a signal fluctuation due to a flow of gaseous fluid approximately transverse to an optical path between a stage and an interferometric measuring apparatus for determining a position of the stage in a direction of a stage movement. The method includes acquiring three interferometric signals of three parallel optical beams, lying within the flow of the gaseous fluid, reflected from predetermined portions of the stage, extracting a mutual signal fluctuation caused by fluctuations of the gaseous fluid properties from the three interferometric signals, and predicting a future fluctuation of the interferometric signals using a linear adaptive filter acting on the extracted mutual signal fluctuation. Prior to the processing with the adaptive filter, a low-pass filter removes high frequency stage motions, and an adaptive moving average algorithm removes low frequency stage motions. When applied to a two-moving axis configuration, it is possible to use only two interferometers in each direction because of the redundancy of measuring stage yaw.

摘要翻译： 一种方法和系统，用于预测由于气体流体的流动大致横向于级与干涉测量装置之间的光路的信号波动，用于确定舞台在舞台运动的方向上的位置。 该方法包括获取三个平行光束的三个干涉信号，该三个平行光束位于气态流体的流动中，从该阶段的预定部分反射，从三个干涉信号中提取由气态流体性质波动引起的相互信号波动，以及 使用作用于所提取的相互信号波动的线性自适应滤波器来预测干涉信号的未来波动。 在使用自适应滤波器进行处理之前，低通滤波器去除高频段运动，自适应移动平均算法去除低频段运动。 当应用于双移动轴构造时，由于测量级偏转的冗余，因此可以在每个方向上仅使用两个干涉仪。

公开(公告)号：US20070132974A1

公开(公告)日：2007-06-14

申请号：US11701378

申请日：2007-02-02

申请人： Andrew Hazelton ,  Michael Sogard

发明人： Andrew Hazelton ,  Michael Sogard

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

摘要翻译： 光刻投影装置包括沿着投影系统和基板台之间的空间的边界的至少一部分延伸的液体限制结构，该空间的横截面积小于基板的面积。 液体限制结构包括：第一入口，用于将图案化的光束投射到该空间上的液体供给液体经过投影系统之前的第一出口以去除液体，形成在该结构的表面上的第二入口 相对于投影系统的光轴径向向外设置有供给气体的空间的面以及形成在该表面上并位于径向外侧的第二出口，该第二出口相对于基板的表面 到第二入口的投影系统的光轴，以除去气体。

公开(公告)号：US20070079525A1

公开(公告)日：2007-04-12

申请号：US11248931

申请日：2005-10-11

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： F26B3/34 ,  G03C5/26

CPC分类号： G03F7/70916 ,  G03F1/82

摘要： Apparatus and methods are disclosed for reducing particle contamination of a surface of an object such as a reticle used in an EUV lithography system. An exemplary apparatus includes a thermophoresis device and an electrophoresis device. The thermophoresis device is situated relative to and spaced from the surface, and is configured to produce a thermophoretic force, in a gas flowing past and contacting the surface, sufficient to inhibit particles in the gas from contacting the surface. The electrophoresis device is situated relative to a region of the surface contacted by the gas and is configured to deflect particles, having an electrostatic charge, in the gas away from the region as the gas flows past the region. In an example, the thermophoresis device produces the thermophoretic force by establishing a temperature gradient in the gas relative to the surface, and the electrophoresis device includes an electrode situated and configured to produce a voltage gradient relative to the region of the surface sufficient to attract charged particles away from the region of the surface.

摘要翻译： 公开了用于减少诸如在EUV光刻系统中使用的掩模版的物体的表面的颗粒污染的装置和方法。 示例性的装置包括热电泳装置和电泳装置。 热电泳装置相对于表面和与表面隔开设置，并且被配置为在气体流过并接触表面的气体中产生足以抑制气体中的颗粒接触表面的热ic ic力。 电泳装置相对于与气体接触的表面的区域定位，并且被配置成当气体流过该区域时将具有静电电荷的颗粒偏离气体远离该区域。 在一个实例中，热电泳装置通过在气体中相对于表面建立温度梯度来产生热解压力，并且电泳装置包括电极，其位于和配置为产生相对于表面的区域的电压梯度，足以吸引带电 颗粒远离表面的区域。

公开(公告)号：US07162881B2

公开(公告)日：2007-01-16

申请号：US10819509

申请日：2004-04-07

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： F25B13/06

CPC分类号： G03F1/62 ,  G03F7/707 ,  G03F7/70875 ,  G03F7/70916 ,  H01L21/67109 ,  H01L21/6838

摘要： Methods and apparatus for enabling a clean, fragile object to be transported while protecting both front and back surfaces of the object are disclosed. According to one aspect of the present invention, a thermophoretic wand that is arranged to carry an object having a first temperature includes a first element, a contact surface, and an air supply. The first element has a first opening defined therein, and is maintained at a second temperature that is lower than the first temperature such that when the first element is in proximity to the object, a thermophoretic forces may be such that particles present between the object and the first element are driven away from the object. The air supply applies a vacuum of a first level through the first opening to suction the object against the contact surface.

摘要翻译： 公开了一种能够在保护物体的前表面和后表面的同时传送干净且脆弱的物体的方法和装置。 根据本发明的一个方面，一种布置成承载具有第一温度的物体的热泳棒包括第一元件，接触表面和空气供应。 第一元件具有限定在其中的第一开口，并且保持在低于第一温度的第二温度，使得当第一元件接近物体时，热泳能力可以使得存在于物体和 第一个元素被驱离远离对象。 空气供应通过第一开口施加第一级的真空以将物体吸附在接触表面上。