知搜-全球专利检索

  1. 登录
  2. 注册

搜索结果

92 条记录 (耗时 0.032 秒)

    LAMINATE FOR FORMING IMAGE AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE
    1.
    发明公开
    LAMINATE FOR FORMING IMAGE AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE 审中-公开

    公开(公告)号：US20230333479A1

    公开(公告)日：2023-10-19

    申请号：US18337931

    申请日：2023-06-20

    申请人： FUJIFILM Corporation

    发明人： Kazuki WATANABE

    IPC分类号： G03F7/34 ,  B41N1/12 ,  G03F7/20 ,  G03F7/028 ,  G03F7/32

    CPC分类号： G03F7/343 ,  B41N1/12 ,  G03F7/028 ,  G03F7/203 ,  G03F7/322

    摘要： An object of the present invention is to provide a laminate for forming an image with high sensitivity of the heat-sensitive image forming layer and excellent manufacturing suitability, and a manufacturing method of a flexographic printing plate using the same. The laminate for forming an image is a laminate for forming an image, which is for forming a mask used for manufacturing a flexographic printing plate, including, in the following order, a carrier sheet, a barrier layer, and a heat-sensitive image forming layer, in which the barrier layer contains a first infrared absorbing dye, the heat-sensitive image forming layer contains an ultraviolet absorber and a second infrared absorbing dye, both of the first infrared absorbing dye and the second infrared absorbing dye are a compound having an absorption at a wavelength of 1070 nm and having a mass absorption coefficient at the wavelength of 1070 nm of 50 L/(g·cm) or more, and both of the barrier layer and the heat-sensitive image forming layer contain a third infrared absorbing dye having an absorption at a wavelength of 830 nm.

    MASK FORMING IMAGEABLE MATERIAL AND USE
    4.
    发明申请
    MASK FORMING IMAGEABLE MATERIAL AND USE 有权
    掩蔽形成图像材料和使用

    公开(公告)号：US20150093707A1

    公开(公告)日：2015-04-02

    申请号：US14564214

    申请日：2014-12-09

    申请人： Kevin M. Kidnie

    发明人： Kevin M. Kidnie

    IPC分类号： G03F7/16 ,  G03F7/20

    CPC分类号： G03F7/16 ,  B41C1/00 ,  B41M5/00 ,  G03F7/004 ,  G03F7/11 ,  G03F7/2002 ,  G03F7/2014 ,  G03F7/2016 ,  G03F7/202 ,  G03F7/24 ,  G03F7/325 ,  G03F7/343 ,  G03F7/38

    摘要： An imageable material can be used to form a mask image for providing a relief image. This imageable material has a simplified structure and consists essentially of, in order: a transparent polymeric carrier sheet and a barrier layer comprising a first infrared radiation absorbing compound. A first ultraviolet radiation absorbing compound is provided in the transparent polymeric carrier sheet or the barrier layer. A non-silver halide thermally sensitive imageable layer is disposed on the barrier layer and comprises a second infrared radiation absorbing compound and a second ultraviolet radiation absorbing compound. A relief image is formed by imaging the imageable material to form an imaged mask material, exposing a relief-forming material with curing radiation through the imaged mask material to form exposed regions and non-exposed regions, and developing the imaged relief-forming material to form a relief image by removing its non-exposed regions.

    摘要翻译： 可成像材料可用于形成用于提供浮雕图像的掩模图像。 该可成像材料具有简化的结构，并且基本上由以下组成：透明聚合物载体片和包含第一红外辐射吸收化合物的阻挡层。 在透明聚合物载体片材或阻挡层中提供第一种紫外线辐射吸收化合物。 非卤化银热敏可成像层设置在阻挡层上，并且包括第二红外辐射吸收化合物和第二紫外线吸收化合物。 通过成像可成像材料以形成成像的掩模材料形成浮雕图像，通过成像的掩模材料将具有固化辐射的凸版形成材料暴露以形成曝光区域和未曝光区域，并将成像的浮雕形成材料显影成 通过去除其未暴露的区域形成浮雕图像。

    METHOD FOR PATTERNING FLEXIBLE SUBSTRATE
    5.
    发明申请
    METHOD FOR PATTERNING FLEXIBLE SUBSTRATE 有权
    用于绘制柔性衬底的方法

    公开(公告)号：US20150004549A1

    公开(公告)日：2015-01-01

    申请号：US14487047

    申请日：2014-09-15

    申请人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

    发明人： Pao-Ming Tsai ,  Yu-Yang Chang ,  Liang-You Jiang ,  Yu-Jen Chen

    IPC分类号： G03F7/34 ,  G03F7/20

    CPC分类号： G03F7/343 ,  G02F1/00 ,  G02F1/133305 ,  G03F7/2016 ,  G03F7/34

    摘要： The invention provides a method for patterning a flexible substrate. The method for patterning a flexible substrate includes providing a carrier substrate. A release layer is formed on the carrier substrate. A flexible substrate film is formed on the release layer. A plurality of UV blocking mask patterns is formed covering various portions of the flexible substrate film and the release layer. A UV lighting process is performed to expose the flexible substrate film and the release layer not covered by the UV blocking mask patterns, to a UV light. A debonding step is performed so that the various portions of the flexible substrate film directly above the various portions of the release layer, which were not exposed to the UV light, are separated from the carrier substrate.

    摘要翻译： 本发明提供了一种用于图案化柔性基板的方法。 图案化柔性基板的方法包括提供载体基板。 在载体基板上形成剥离层。 在剥离层上形成柔性基材膜。 形成多个UV阻挡掩模图案，覆盖柔性基底膜和释放层的各个部分。 执行紫外线照射工艺以将柔性基底膜和未被UV阻挡掩模图案覆盖的剥离层暴露于UV光。 进行剥离步骤，使得柔性基材薄膜的不暴露于紫外光的各个部分的正上方的各个部分与载体基板分离。

    Methods and apparatus for the manufacture of microstructures
    6.
    发明授权
    Methods and apparatus for the manufacture of microstructures 有权
    用于制造微结构的方法和装置

    公开(公告)号：US08124325B2

    公开(公告)日：2012-02-28

    申请号：US11912282

    申请日：2006-04-21

    申请人： Stuart Philip Speakman

    发明人： Stuart Philip Speakman

    IPC分类号： G03F7/26

    CPC分类号： G03F7/26 ,  G03F1/56 ,  G03F1/68 ,  G03F7/343 ,  G03F7/346 ,  H01L27/1288 ,  H01L27/1292 ,  H01L29/4908 ,  H01L29/66757 ,  H01L29/78603 ,  H01L29/78645 ,  H01L29/7869 ,  H05K3/0032 ,  H05K3/0079 ,  H05K3/061 ,  H05K2203/107

    摘要： A method of manufacturing microstructures is disclosed, the method comprising a applying a mask to substrate; forming a pattern in the mask; processing the substrate according to the pattern; and mechanically removing the mask from the substrate. A polymer mask is disclosed for manufacturing micro scale structure, the polymer mask comprising a thin, preferably ultra thin flexible film. A method of manufacturing an integrated circuit is disclosed, the method comprising forming a plurality of isolated semiconductor devices on a common substrate; and connecting some of the devices. Apparatus for manufacturing microstructures is disclosed comprising: a mechanism for coating a mass substrate to create a structure; a mechanism for removing a mask from the substrate; and processing apparatus. A thin film transistor is disclosed comprising drain source and gate electrodes, the drain and source electrode being separated by a semiconductor, and the gate electrode being separated from the semiconductor by an insulator, comprising a bandgap alignment layer disposed between a semiconductor and the insulator.

    摘要翻译： 公开了一种制造微结构的方法，所述方法包括将掩模施加于基底; 在面具中形成图案; 根据图案处理基板; 并从衬底机械地去除掩模。 公开了用于制造微尺度结构的聚合物掩模，聚合物掩模包括薄的，优选超薄的柔性膜。 公开了一种制造集成电路的方法，所述方法包括在公共基板上形成多个隔离半导体器件; 并连接一些设备。 公开了用于制造微结构的装置，包括：用于涂覆质量基底以产生结构的机构; 用于从基板去除掩模的机构; 和处理装置。 公开了一种薄膜晶体管，其包括漏源极和栅电极，漏极和源极由半导体分隔开，并且栅电极通过绝缘体与半导体分离，包括设置在半导体和绝缘体之间的带隙对准层。

    Method for thermally processing photosensitive printing sleeves
    7.
    发明申请
    Method for thermally processing photosensitive printing sleeves 有权

    公开(公告)号：US20060105268A1

    公开(公告)日：2006-05-18

    申请号：US10987624

    申请日：2004-11-12

    申请人： Ryan Vest

    发明人： Ryan Vest

    IPC分类号： G03C1/76

    CPC分类号： G03F7/34 ,  G03F7/11 ,  G03F7/343 ,  G03F7/36 ,  Y10S430/145 ,  Y10S430/146

    摘要： An improved method of manufacturing a photosensitive printing element that minimizes relief variation and improves image fidelity. The method involves a step of pre-curing the first (floor layer) of photocurable material prior to depositing an additional layer or layers of photocurable material that may be imaged and developed to produce a desired relief image on the surface of the photosensitive printing element. The photosensitive printing element is then thermally developed by contacting the photosensitive printing element with at least one roll that is capable of moving over at least a portion of the imaged surface of the flexographic printing element to remove the softened or melted non-crosslinked photopolymer. Non-crosslinked photopolymer on the imaged and exposed surface of the flexographic printing element can be softened or melted by positioning a heater adjacent to the imaged surface of the flexographic printing element and/or heating the at least one roll that contactable with the imaged surface of the flexographic printing element.

    Intaglio printing method, intaglio printer and touch panel
    8.
    发明授权
    Intaglio printing method, intaglio printer and touch panel 失效

    公开(公告)号：US06405648B1

    公开(公告)日：2002-06-18

    申请号：US09028198

    申请日：1998-02-23

    申请人： Makoto Kinoshita

    发明人： Makoto Kinoshita

    IPC分类号： B41M110

    CPC分类号： G03F7/343 ,  B41M1/10 ,  B41M1/34 ,  B41M3/003 ,  B65C9/1873 ,  H01H13/703 ,  H01H2211/01

    摘要： An intaglio printing method for transferring a resin to a print receiving material, using an intaglio printing master having portions depressed in a printing shape below the surface of the printing master, includes the steps of: filling a resin paste comprising a resin in the depressed portions of the printing master, bringing the printing master, with the resin paste being filled in the depressed portions thereof, into close contact with the print receiving material, hardening the resin in the resin paste in the depressed portions of the printing master, and separating the printing master from the print receiving material so as to transfer the hardened resin in the depressed portions of the printing master to the print receiving material. An apparatus for carrying out this intaglio printing method is proposed. By use of the apparatus, for instance, an elastic and durable spacer free from fatigue destruction for a touch panel is can be prepared in a circulation process.