发明申请
- 专利标题： PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, METHOD FOR PRODUCING RESIST PATTERN, AND ELECTRONIC COMPONENT
- 专利标题（中）： 感光元件，感光元件辊，制造电阻图案的方法和电子元件
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申请号： US14786461申请日： 2014-04-22
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公开(公告)号： US20160077434A1公开(公告)日： 2016-03-17
- 发明人: Naoki SASAHARA , Ikuo MUKAI , Mayumi SATO , Yasuhiro SERI , Koji ABE , Manami KIRYU
- 申请人： HITACHI CHEMICAL COMPANY, LTD.
- 优先权： JP2013-091227 20130424
- 国际申请： PCT/JP2014/061307 WO 20140422
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; G03F7/20 ; G03F7/16
摘要：
A photosensitive element 1 comprises a support film 10, a protective film (polypropylene film) 30, and a photosensitive layer 20 which is arranged between the support film 10 and the protective film 30, wherein the protective film 30 has a principal surface 30a at a side of the photosensitive layer 20 and a principal surface 30b at an opposite side of the principal surface 30a, and the principal surface 30a and the principal surface 30b are smooth.
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