System and method for depositing a material on a substrate
    9.
    发明授权
    System and method for depositing a material on a substrate 有权
    用于在基材上沉积材料的系统和方法

    公开(公告)号:US09328408B2

    公开(公告)日:2016-05-03

    申请号:US12320060

    申请日:2009-01-15

    申请人: Rick C. Powell

    发明人: Rick C. Powell

    IPC分类号: C23C14/22 C23C14/32 H01J37/32

    摘要: An apparatus for depositing a film on a substrate which includes a distributor for providing a semiconductor coating on a substrate, a power source for heating the distributor and a plasma source positioned proximate to a distributor for exposing the semiconductor coating to a plasma prior to deposition on the substrate.

    摘要翻译: 一种用于在基板上沉积膜的装置,其包括用于在基板上提供半导体涂层的分布器,用于加热分布器的电源和靠近分布器定位的等离子体源,用于在沉积之前将半导体涂层暴露于等离子体 底物。