摘要:
A photocurable or thermally curable thiosulfate-containing polymer has (a) recurring units and (d) recurring units, shown as either Structure (I) or (II) and Structure (V) below: R represents the organic polymer backbone, G is a single bond or divalent linking group, Q+ is an organic charge balancing cation, M represents a charge balancing cation, and “a” represents at least 0.5 mol % and to 99.5 mol % of (a) recurring units; R″ represents the organic polymer backbone, G″ is a carbonyloxy group, R3 comprises a monovalent linear, branched, or carbocyclic non-aromatic hydrocarbon group having 1 to 18 carbon atoms, or it comprises a phenyl group having one or more such substituents, and “d” represents at least 0.5 mol % and to 99.5 mol % of (d) recurring units. These thiosulfate-containing polymers can be used to made dielectric compositions and gate dielectric layers in various devices.
摘要:
The present invention relates to compounds according to formula (I) and to heat-curable compositions based on polymaleimide resin systems comprising such compounds as co-monomers: wherein R1 is hydrogen or an alkenylphenoxy group, R2 is an alkenylphenoxy group, and R3 is hydrogen or an alkyl group with 1 to 4 carbon atoms. The present invention also relates to cross-linked resins obtainable by curing such compositions. Compounds of the present invention can be used amongst others in fields like structural adhesives, matrix resins for fiber prepregs, moulding compounds, as well as structural and/or electrical composites.
摘要:
A thiosulfate polymer includes both an electron-accepting photosensitizer component and thiosulfate groups in the same molecule, arranged in random order along the backbone. The thiosulfate polymer composition can be formulated into compositions and applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequester metals in nanoparticulate form, and as a way for shaping human hair in hairdressing operations.
摘要:
Disclosed herein is a copolymer, which may include side chains which may decrease the surface energy of an insulating layer, thereby improving the alignment of a semiconductor material, and side chains including photoreactive functional groups having an increased degree of cross-linking, thereby improving the characteristics of an organic thin film transistor manufactured using the same, an organic insulating layer composition including the copolymer, an organic insulating layer, an organic thin film transistor, an electronic device including the same and methods of fabricating the same. According to the copolymer of example embodiments, the surface energy of an insulating layer may be decreased, so that the alignment of a semiconductor material may be improved, thereby improving the threshold voltage and charge mobility and decreasing the generation of hysteresis at the time of driving the transistor.
摘要:
A resist composition is provided comprising a polymer comprising recurring units (a) having an oxazolidinedione, thioxooxazolidinone, thiazolidinedione or thioxothiazolidinone structure and recurring unit (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group. The resist composition suppresses acid diffusion, exhibits a high resolution, and forms a pattern of satisfactory profile with low edge roughness.
摘要:
A polymer compound (I) with bacteria-adhesion inhibition properties against bacteria such as P. aeruginosa Xen 5, E. coli Xen 14, S. typhimurium Xen 26, S. aureus Xen 36 and K. pneumoniae Xen 39 is described. The group R is provided by a substituted furanone linked by an alkyl chain or, more preferably a hydrophilic moiety such as oligo(ethylene oxide) ((CH2—CH2—O)i) to the polymer backbone. The group R may be the same or different along the polymer backbone. The invention also provides nanofibers and coatings which include a polymer compound as defined above.
摘要:
A resin composition of the present invention includes a maleimide derivative (A) represented by a general formula (1) and a bis-maleimide compound (B) represented by a general formula (2). In the general formula (1), R1 represents a straight chain or branched alkylene group having 1 or more carbon atoms, R2 represents a straight chain or branched alkyl group having 5 or more carbon atoms, and the sum of carbon atoms of R1 and R2 is 10 or less. In the general formula (2), X1 represents —O—, —COO—, or -—OCOO—R3, represents a straight chain or branched alkylene group having 1 to 5 carbon atoms, R4 represents a straight chain or branched alkylene group having 3 to 6 carbon atoms, and m is an integer of 1 or more and 50 or less.
摘要:
Disclosed herein is a copolymer, which may include side chains which may decrease the surface energy of an insulating layer, thereby improving the alignment of a semiconductor material, and side chains including photoreactive functional groups having an increased degree of cross-linking, thereby improving the characteristics of an organic thin film transistor manufactured using the same, an organic insulating layer composition including the copolymer, an organic insulating layer, an organic thin film transistor, an electronic device including the same and methods of fabricating the same. According to the copolymer of example embodiments, the surface energy of an insulating layer may be decreased, so that the alignment of a semiconductor material may be improved, thereby improving the threshold voltage and charge mobility and decreasing the generation of hysteresis at the time of driving the transistor.
摘要:
The present invention relates to bismaleimide resins and curable compositions for One Drop Fill sealant applications using such resins, particularly in liquid crystal display assembly applications. The inventive compositions can be cured by a UV, thermal or a combination of UV and thermal.
摘要:
A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequester metals in nanoparticulate form, and as a way for shaping human hair in hairdressing operations.