公开(公告)号：US20180369983A1

公开(公告)日：2018-12-27

申请号：US15566281

申请日：2017-03-03

申请人： ERWIN JUNKER MASCHINENFABRIK GMBH

发明人： Erwin Junker

IPC分类号： B24B27/00 ,  B24B19/00 ,  B24B5/04 ,  B24B19/02 ,  B24B41/06 ,  B23F1/02 ,  B23Q3/155

CPC分类号： B24B27/0076 ,  B23F1/02 ,  B23Q3/155 ,  B24B5/04 ,  B24B19/009 ,  B24B19/022 ,  B24B41/062 ,  B24B41/065 ,  B24B53/053 ,  F04C2230/10 ,  F04C2240/20

摘要： Described is a method for grinding workpieces, which comprise at least one cylindrical and profiled portion each, on one and the same grinding machine. The workpiece is ground initially in a first grinding operation in a first clamping in the grinding machine, said first grinding operation being followed by a second grinding operation once the first clamping has been released and then, before the start of the second grinding operation, a second clamping has been generated.

公开(公告)号：US09457450B2

公开(公告)日：2016-10-04

申请号：US14187048

申请日：2014-02-21

申请人： TERA XTAL TECHNOLOGY CORPORATION

发明人： Jun-Wen Chung ,  Tzu-Hsuan Dai ,  Wen-Yen Shen ,  Kuang-Ling Wei ,  Chuan-Lang Lu

IPC分类号： B24B53/017 ,  B24D18/00 ,  B24B53/053 ,  B24B53/02

CPC分类号： B24B53/017 ,  B24B53/02 ,  B24B53/053 ,  B24D18/00

摘要： A pad conditioning tool includes a sapphire chip having a side surface defining a polishing surface and a plurality of sapphire grains formed on the polishing surface in an integral manner. Each of the sapphire grains had a three-dimensional geometric structure. The sapphire grains are arranged on the polishing surface in a specific form so as to possess a specific pattern.

摘要翻译： 垫调节工具包括具有限定抛光表面的侧表面的蓝宝石芯片和以整体方式形成在抛光表面上的多个蓝宝石晶粒。 每个蓝宝石颗粒都具有三维几何结构。 蓝宝石晶粒以特定形式布置在抛光表面上，以具有特定的图案。

公开(公告)号：US20160023324A1

公开(公告)日：2016-01-28

申请号：US14875410

申请日：2015-10-05

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Hsiu-Ming Yeh ,  Feng-Inn Wu

IPC分类号： B24B53/017 ,  H01L21/306

CPC分类号： B24B53/017 ,  B24B53/003 ,  B24B53/02 ,  B24B53/053 ,  B24B53/12 ,  H01L21/30625

摘要： A chemical mechanical polishing (CMP) apparatus is provided that includes a conditioning disc for conditioning a polishing pad of the CMP apparatus. The conditioning disc includes a plurality of portions of subsystem discs. The portions may be regions of the disc that are concentric. Each portion of the disc is operable to rotate at a different angular velocity. In some embodiments, a different applied loading is provided to each of the portions of the disc in addition to or in lieu of the different angular velocities.

公开(公告)号：US09149906B2

公开(公告)日：2015-10-06

申请号：US13227155

申请日：2011-09-07

申请人： Hsiu-Ming Yeh ,  Feng-Inn Wu

发明人： Hsiu-Ming Yeh ,  Feng-Inn Wu

IPC分类号： B24B53/017 ,  B24B53/12

CPC分类号： B24B53/017 ,  B24B53/003 ,  B24B53/02 ,  B24B53/053 ,  B24B53/12 ,  H01L21/30625

摘要： A chemical mechanical polishing (CMP) apparatus is provided that includes a conditioning disc for conditioning a polishing pad of the CMP apparatus. The conditioning disc includes a plurality of portions of subsystem discs. The portions may be regions of the disc that are concentric. Each portion of the disc is operable to rotate at a different angular velocity. In some embodiments, a different applied loading is provided to each of the portions of the disc in addition to or in lieu of the different angular velocities.

摘要翻译： 提供了一种化学机械抛光（CMP）装置，其包括用于调节CMP设备的抛光垫的调节盘。 调节盘包括多个子系统盘部分。 这些部分可以是同心的盘的区域。 盘的每个部分可操作以以不同的角速度旋转。 在一些实施例中，除了不同的角速度之外或代替不同的角速度，将不同的施加的载荷提供给盘的每个部分。

公开(公告)号：US09108294B2

公开(公告)日：2015-08-18

申请号：US13319533

申请日：2010-06-14

申请人： Tsuyoshi Yagi ,  Koji Ono

发明人： Tsuyoshi Yagi ,  Koji Ono

IPC分类号： B24B53/02 ,  B24B53/053

CPC分类号： B24B53/053

摘要： A grinding device includes a dresser head (7) at the front end of a spindle (1), and a dresser tool (8) mounted on the dresser head (7) for dressing the grinder (6). The dresser tool (8) is configured such that while the workpiece (W) is being ground by the grinder (6), the dresser tool (8) is out of contact with the grinder (6), and while the grinder (6) is being dressed by the dresser tool (8), the chuck (3) is out of contact with the grinder (6). Thus it is possible to press the dresser tool (8) against the grinder (6) using relative movement between the spindle (1) and the grinder shaft (4). The dresser head (7) can be rotated by rotating the spindle (1). The grinder (6) can thus be dressed without the need to mount the dresser tool (8) every time the grinder is to be dressed.

摘要翻译： 研磨装置包括在主轴（1）的前端处的修整器头（7）和安装在修整器头部（7）上用于修整研磨机（6）的修整器工具（8）。 修整器工具（8）构造成使得当工件（W）被研磨机（6）磨削时，修整器工具（8）与研磨机（6）脱离接触，并且当研磨机（6） 正在被修整工具（8）穿着，卡盘（3）与研磨机（6）脱离接触。 因此，可以使用主轴（1）和研磨轴（4）之间的相对运动将修整器工具（8）压靠研磨机（6）。 梳妆台头（7）可以通过旋转主轴（1）旋转。 因此，磨削机（6）可以在每次研磨机要被打磨的同时不需要安装修整器工具（8）。

公开(公告)号：US09011208B2

公开(公告)日：2015-04-21

申请号：US13752488

申请日：2013-01-29

申请人： Hans Georg Boehringer

发明人： Hans Georg Boehringer

IPC分类号： B24B5/42 ,  B24B53/12 ,  B24B53/053 ,  B24B53/06 ,  B24B27/00 ,  B24B53/14 ,  B24B5/04

CPC分类号： B24B53/053 ,  B24B5/04 ,  B24B5/42 ,  B24B27/0076 ,  B24B53/06 ,  B24B53/14

摘要： A machining apparatus has a frame carrying a headstock capable of gripping one end of an elongated workpiece and rotating the workpiece about a machining axis. A turntable support is spaced axially from the headstock on the frame. A tailstock carried on the support can be aligned with the machining axis in a machining position of the support. A machining drive is carried on the frame and itself carries a rotatable grinding disk engageable radially of the machining axis with the workpiece when the workpiece is engaged between the headstock and tailstock. A dressing tool carried on the support axially offset from the support axis and angularly offset about the support axis from the tailstock is engageable in a dressing position of the support with the grinding disk for dressing same in the dressing position with the workpiece engaged between the headstock and tailstock.

摘要翻译： 一种加工装置具有支承头架的框架，该主轴箱能够夹紧细长工件的一端并​​使工件围绕加工轴线旋转。 转盘支架与框架上的主轴箱轴向间隔开。 在支撑件的加工位置，承载在支撑件上的尾座可以与加工轴对齐。 在框架上承载加工驱动装置，并且当工件与头架和尾架之间接合时，其自身携带可旋转的研磨盘，该可磨削的圆盘可与加工轴的径向接合。 承载在支撑件上的修整工具轴向地偏离支撑轴线并且围绕支架轴线从尾架角度偏移地接合在支撑件的修整位置与研磨盘，用于在修整位置上进行修整，其中工件接合在头架 和尾座。

公开(公告)号：US20110045739A1

公开(公告)日：2011-02-24

申请号：US12767202

申请日：2010-04-26

申请人： Peter Keijzer ,  Christophe Huber

发明人： Peter Keijzer ,  Christophe Huber

IPC分类号： B24B5/04 ,  B24B5/37 ,  B24B53/007

CPC分类号： B24B5/37 ,  B24B5/167 ,  B24B53/053

摘要： In one aspect, a process for roll grinding employs a grinding wheel that is porous and permeable. In another aspect, a process for grinding mill rolls includes dressing the grinding wheel as the wheel traverses the surface of a mill roll. Other aspects relate to a system, e.g., a mill roll grinding machine, or parts thereof, in which a dressing tool contacts the wheel as the wheel grinds the surface of the mill roll. In specific examples, the wheel and a rotary dressing tool are maintained in contact as the wheel traverses the surface of the mill roll.

摘要翻译： 一方面，辊磨的方法采用多孔和可渗透的砂轮。 另一方面，用于研磨轧辊的方法包括在车轮横过轧辊表面时修整砂轮。 其他方面涉及一种系统，例如轧辊研磨机或其部件，其中当砂轮研磨轧辊的表面时，修整工具与轮接触。 在具体示例中，当车轮横过轧辊的表面时，轮和旋转修整工具保持接触。

公开(公告)号：US20040087255A1

公开(公告)日：2004-05-06

申请号：US10275940

申请日：2003-04-25

发明人： Robert Schlechter ,  Andreas Paskuda ,  Harald Kulmitzer

IPC分类号： B24B001/00

CPC分类号： B24B7/02 ,  B24B53/053

摘要： The invention relates to a method for grinding metallic workpieces containing, in particular, nickel, whereby a rotationally driven grinding wheel (2) is continuously dressed by a rotationally driven dressing wheel (3) during the grinding of the workpiece (1) by the continual advance (vfrd) of the dressing wheel. In order to increase the grinding capacity, the invention provides that with a dressing advance velocity of 1 to 2 nullm per rotation of the grinding wheel and with a circumferential velocity of the grinding wheel (vs) of at least 45 m/s, the advance (table velocity vt) is set such that the rate of metal removal is at least 90 mm3/mms.

摘要翻译： 本发明涉及一种用于研磨包含特别是镍的金属工件的方法，由此在通过连续的研磨工件（1）期间，由旋转驱动的修整轮（3）连续地修整旋转驱动的砂轮（2） 提前（vfrd）的修整轮。 为了增加研磨能力，本发明提供了一种每磨削砂轮的1-2毫米的修整进给速度和至少45米/秒的砂轮的圆周速度（vs），提前 （表速度vt）设定为使得金属去除速率至少为90mm 3 / mms。

公开(公告)号：US06244939B1

公开(公告)日：2001-06-12

申请号：US09376002

申请日：1999-08-19

申请人： Hitoshi Ohmori ,  Yutaka Yamagata

发明人： Hitoshi Ohmori ,  Yutaka Yamagata

IPC分类号： B24B700

CPC分类号： B24B53/053 ,  B24B53/001

摘要： There are provided an electrically conductive grindstone 12 for machining a workpiece 1, a disc-shaped discharge electrode 14 having an outer peripheral edge 14a which can be disposed in the vicinity of a machining surface 12a of the grindstone, an electrode rotating unit 16 for rotating the electrode around an axial center Z, a position controller 18 for controlling a relative position of the outer peripheral edge of the electrode and the grindstone, a voltage applying unit 20 for applying a predetermined voltage between the grindstone and the electrode in a pulse manner, and a machining liquid supply unit 22 for supplying an alkaline liquid between the grindstone and the electrode. By stably generating micro-discharge between the outer peripheral edge 14a of the rotating discharge electrode 14 and the machining surface 12a of the electrically conductive grindstone 12, a metal bonded portion of the electrically conductive grindstone is molten/removed with no contact therewith and with high efficiency and precision, and a grindstone surface is corrected to a desired shape.

摘要翻译： 设置有用于加工工件1的导电磨石12，具有可设置在磨石加工表面12a附近的外周边缘14a的圆盘形放电电极14，用于旋转的电极旋转单元16 围绕轴心Z的电极，用于控制电极和磨石的外周边缘的相对位置的位置控制器18，用于以脉冲方式在磨石与电极之间施加预定电压的电压施加单元20， 以及用于在磨石与电极之间供给碱性液体的加工液供给单元22。 通过在旋转放电电极14的外周边缘14a和导电磨石12的加工面12a之间稳定地产生微电镀，导电磨石的金属接合部熔融/去除，不与其接触，并具有高的 效率和精度，并且磨石表面被校正为期望的形状。

公开(公告)号：US5291691A

公开(公告)日：1994-03-08

申请号：US828105

申请日：1992-01-30

申请人： Kunihiko Unno ,  Masato Kitajima ,  Hajime Fukami ,  Akimitsu Kamiya ,  Shinji Soma

发明人： Kunihiko Unno ,  Masato Kitajima ,  Hajime Fukami ,  Akimitsu Kamiya ,  Shinji Soma

IPC分类号： B24B53/00 ,  B24B47/22 ,  B24B53/053 ,  B24B49/00

CPC分类号： B24B53/053 ,  B24B47/22

摘要： A dressing apparatus for dressing an electroplated grinding wheel by crushing the top portions of the abrasive grains thereof. The abrasive grains are diamond grains or CBN grains. A role made of ceramics, or a ferrous role holding diamond grains on its outer periphery is used for crushing the abrasive grains. The grinding wheel is rotated in one direction and the role is rotated in the opposite direction so that the difference in surface speed between the role and the grinding wheel becomes substantially zero. The role is then advanced toward the grinding wheel to crush the top portions of the abrasive grains, so that the heights of the abrasive grains are roughly equalized, and many sharp cutting edges are formed at the top portions of the abrasive grains.

摘要翻译： 一种用于通过粉碎其磨粒的顶部来修整电镀砂轮的修整装置。 磨粒是金刚石颗粒或CBN颗粒。 陶瓷的作用或在其外周上保持金刚石颗粒的铁质作用用于破碎磨粒。 砂轮沿一个方向旋转，角色沿相反的方向转动，使得作用与砂轮之间的表面速度差基本为零。 然后，该作用朝向研磨轮前进，以磨碎磨粒的顶部，使得磨粒的高度大致相等，并且在磨粒的顶部形成许多锋利的切削刃。