公开(公告)号：US20240342764A1

公开(公告)日：2024-10-17

申请号：US18342333

申请日：2023-06-27

申请人： Ellie Ginsberg

发明人： Ellie Ginsberg ,  Muhammad Salaman Habib ,  Malik Ahsan Maqsood

IPC分类号： B08B7/00 ,  C09J175/16

CPC分类号： B08B7/0028 ,  B08B7/0014 ,  C09J175/16

摘要： A new product, method and system for the removal of pet hair from fabric, furniture and other household items is provided. The inventive system utilizes a non-aerosol, non-toxic, light adhesive spray product that is formulated so that it sticks to pet hair. When applied and set, the spray product enables one to easily ball up the pet hair that is located on fabric, furniture and other household items using one's hand, a rag, or a squeegee. As a result, disposal of unwanted pet hair is easily achieved, thereby leaving the surfaces of fabric, furniture and other household items free of pet hair.

公开(公告)号：US20240316603A1

公开(公告)日：2024-09-26

申请号：US18598317

申请日：2024-03-07

申请人： CANON KABUSHIKI KAISHA

发明人： KEN KATSUTA

IPC分类号： B08B7/00

CPC分类号： B08B7/0014

摘要： A method for removing a foreign substance includes forming a first trapping film between a plate and a first region where a foreign substance should be removed and separating the plate from the first region together with the first trapping film, forming a second trapping film between the plate holding the first trapping film and a second region where a foreign substance should be removed, and separating the plate from the second region together with the first trapping film and the second trapping film. The second region is larger than the first region. A value obtained by dividing a volume of the second trapping film by an area of the second region is larger than a value obtained by dividing a volume of the first trapping film by an area of the first region.

公开(公告)号：US20240269716A1

公开(公告)日：2024-08-15

申请号：US18022270

申请日：2021-08-26

申请人： YAMAHA ROBOTICS HOLDINGS CO., LTD.

发明人： Michael KIRKBY ,  Ysmaldo Jose LANDAEZ GARCIA ,  Hiroshi MUNAKATA

IPC分类号： B08B3/12 ,  B08B7/00 ,  B08B7/04 ,  H01L21/02

CPC分类号： B08B3/12 ,  B08B7/0014 ,  B08B7/04 ,  H01L21/02079

摘要： An ultrasonic cleaning method of the invention includes: a cleaning liquid coating step (S101), coating a cleaning liquid on a front surface of an electronic component held on a cleaning stage; a pealing step (S103), irradiating the front surface of the electronic component coated with the cleaning liquid with ultrasonic waves from ultrasonic speakers installed to an acoustic head and peeling off a foreign matter attached to the front surface from the front surface; and an attracting step (S104), concentrating the ultrasonic waves generated from the ultrasonic speakers at a gap between a casing and a holding surface of the cleaning stage to form a low pressure region whose pressure is lower than atmospheric pressure at a central lower part of the casing, and attracting the foreign matter peeled off from the front surface of the electronic component and the cleaning liquid coated on the front surface.

公开(公告)号：US20240238852A1

公开(公告)日：2024-07-18

申请号：US18123522

申请日：2023-03-20

申请人： UNITED MICROELECTRONICS CORP.

发明人： Chih-Chieh TSAI ,  Yi-Wei CHEN

IPC分类号： B08B7/00 ,  H01L21/67

CPC分类号： B08B7/0014 ,  H01L21/67288

摘要： A monitor wafer is provided. The monitor wafer includes a substrate and a cleaning layer. The cleaning layer is disposed on a bottom surface of the substrate. The cleaning layer is configured to remove particles from the substrate and/or a processing tool.

公开(公告)号：US20240162054A1

公开(公告)日：2024-05-16

申请号：US18508972

申请日：2023-11-14

申请人： SCREEN Holdings Co., Ltd.

发明人： Noritake SUMI

IPC分类号： H01L21/67 ,  B08B3/04 ,  B08B5/02 ,  B08B7/00

CPC分类号： H01L21/67034 ,  B08B3/04 ,  B08B5/02 ,  B08B7/0014 ,  B08B7/0021 ,  H01L21/68707

摘要： A substrate processing method in accordance with the present invention includes forming a liquid film on an upper surface of a substrate by a wet processing apparatus; carrying the substrate having the liquid film formed thereon into a chamber of a supercritical processing apparatus by a conveyor device; and processing a substrate by a processing fluid in a supercritical state in the chamber by the supercritical processing apparatus. The method further includes blowing a gas toward a lower surface of the substrate supported in a horizontal posture by a gas discharger for at least a part of a period after the formation of the liquid film on the substrate during which the substrate is outside the chamber.

公开(公告)号：US20240100576A1

公开(公告)日：2024-03-28

申请号：US18276530

申请日：2022-02-14

申请人： KAO CORPORATION

发明人： Yuto JOCHI ,  Noriaki USHIO

IPC分类号： B08B7/00

CPC分类号： B08B7/0014

摘要： A method of removing pollutants attached on a surface of interest, the method comprising the steps of: forming a coating film by applying a self-peelable film forming composition containing components (A) to (C) to a surface of interest on which pollutants are attached; drying the coating film; and removing the pollutants together with the coating film by self-peeling of the coating film due to the drying: (A) a film-forming component; (B) a volatile solvent; and (C) a silicone compound.

公开(公告)号：US11938589B2

公开(公告)日：2024-03-26

申请号：US17949165

申请日：2022-09-20

申请人： GUANGDONG UNIVERSITY OF TECHNOLOGY

发明人： Guan Wang ,  Guohua Chen ,  Sihao Lin ,  Junxian Li ,  Jieyu Zhu

IPC分类号： B24C1/00 ,  B08B7/00 ,  B08B9/087 ,  B08B13/00 ,  B24C9/00 ,  G01N23/046

CPC分类号： B24C1/003 ,  B08B7/0014 ,  B08B7/0092 ,  B08B9/087 ,  B08B13/00 ,  B24C9/00 ,  G01N23/046 ,  B08B2209/08 ,  G01N2223/633 ,  G01N2223/635 ,  G01N2223/639

摘要： Disclosed are a dry ice cleaning and recycling device and a method a connecting rod. The device includes a dry ice ejector module, a clamping module, and a box, and the dry ice ejector module and the clamp module are both arranged in the box; the dry ice ejector module includes a spray gun guide rail and a cleaning nozzle vertically and slidably connected to the spray gun guide rail; and the clamp module includes a clamp guide rail and a clamp horizontally and slidably connected to the clamp guide rail. The device further includes a dry ice recycling device, the dry ice recycling device includes a dry ice recycling collector and a condenser pipe, and two ends of the condenser pipe are communicated with the box and the dry ice recycling collector respectively.

公开(公告)号：US11769663B2

公开(公告)日：2023-09-26

申请号：US17859346

申请日：2022-07-07

申请人： SCREEN Holdings Co., Ltd.

发明人： Masayuki Otsuji ,  Hiroaki Takahashi ,  Masahiko Kato ,  Yu Yamaguchi ,  Yuta Sasaki

IPC分类号： B08B7/00 ,  H01L21/02 ,  B08B3/08 ,  H01L21/687 ,  H01L21/67

CPC分类号： H01L21/02101 ,  B08B3/08 ,  B08B7/0014 ,  H01L21/67034 ,  H01L21/68764

摘要： To dry a substrate formed with a pattern on a front surface satisfactorily and with excellent drying performance, a substrate processing method comprises: a liquid film formation step of forming a liquid film of a processing liquid, in which cyclohexanone oxime is dissolved in a solvent, on a front surface of a substrate formed with a pattern by supplying the processing liquid to the front surface of the substrate; a solidified film formation step of forming a solidified film of the cyclohexanone oxime by solidifying the liquid film of the processing liquid; and a sublimation step of removing the solidified film from the front surface of the substrate by sublimating the solidified film.

公开(公告)号：US20180193886A1

公开(公告)日：2018-07-12

申请号：US15849794

申请日：2017-12-21

申请人： SCREEN Holdings Co., Ltd.

发明人： Hiroshi ABE ,  Manabu OKUTANI ,  Naohiko YOSHIHARA

IPC分类号： B08B7/00 ,  H01L21/02 ,  H01L21/67 ,  H01L21/687 ,  B08B3/08 ,  B08B3/10

CPC分类号： B08B7/0014 ,  B08B3/08 ,  B08B3/106 ,  B08B2203/007 ,  H01L21/02057 ,  H01L21/67034 ,  H01L21/67167 ,  H01L21/68714

摘要： A substrate processing method includes a substrate holding step that a substrate is held by a substrate holding unit that holds the substrate horizontally, a sealing step of sealing an internal space of a chamber in a state where the substrate holding unit that holds the substrate is housed in the internal space of the chamber, a liquid film forming step of forming a liquid film of processing liquid, which processes an upper surface of the substrate, by supplying the processing liquid to the upper surface of the substrate which is held horizontally, a pressurizing step of pressurizing the internal space until a pressure of the internal space reaches a first pressure which is higher than an atmospheric pressure, by supplying a gas to the internal space, a heating step of heating the substrate such that a vapor layer of processing liquid is formed between the liquid film and the substrate in a state where the pressure of the internal space reaches the first pressure, and a liquid film excluding step of excluding the liquid film from the substrate by evaporating the processing liquid, by reducing the pressure of the internal space until the pressure of the internal space reaches a second pressure, which is lower than the first pressure, while keeping a state where the vapor layer of the processing liquid between the liquid film and the substrate is formed.

公开(公告)号：US20180155557A1

公开(公告)日：2018-06-07

申请号：US15645461

申请日：2017-07-10

申请人： Packaging Service Co., Inc.

发明人： John S. Ledford ,  Lynn Place ,  Jean-Pierre Baizan ,  Mark Vorderbruggen

IPC分类号： C09D9/02 ,  C09D9/04 ,  C09D9/00 ,  B08B3/08 ,  B08B7/00

CPC分类号： C09D9/02 ,  B08B3/08 ,  B08B7/0014 ,  B08B2220/01 ,  C09D9/005 ,  C09D9/04

摘要： Abrasive paint remover compositions including a solvent system or composition and an abrasive system or composition and methods for making and using same, where the compositions may be formulated with no methylene chloride (MC).