COATING DEVICE
    1.
    发明公开
    COATING DEVICE 审中-公开

    公开(公告)号:US20240100558A1

    公开(公告)日:2024-03-28

    申请号:US18473395

    申请日:2023-09-25

    IPC分类号: B05C9/12 B05D3/04

    CPC分类号: B05C9/12 B05D3/0453 F26B17/00

    摘要: A coating device is provided with a stage on which a substrate is configured to be placed, an applicator movably arranged relative to the substrate placed on the stage and configured to discharge a coating liquid from a nozzle to form a coating film on the substrate, and a dryer having an air supply port with at least one porous member. The dryer is configured to dry the coating film formed on the substrate by the applicator by supplying air to the coating film from the air supply port. The at least one porous member is configured and arranged to suppress formation of local variations in an amount of air supplied from the air supply port.

    OXIDE FILM DEPOSITION METHOD AND OXIDE FILM DEPOSITION DEVICE
    4.
    发明申请
    OXIDE FILM DEPOSITION METHOD AND OXIDE FILM DEPOSITION DEVICE 有权
    氧化膜沉积方法和氧化膜沉积装置

    公开(公告)号:US20140141170A1

    公开(公告)日:2014-05-22

    申请号:US14131128

    申请日:2011-09-13

    IPC分类号: B05D3/04 B05C5/00

    摘要: The present invention provides a method for forming an oxide film by which normal formation of an oxide film is always achieved without receiving an influence of a change in the atmosphere, a metal oxide film having a low resistance can be formed, and a high efficiency of film formation is obtained. In the present invention, a raw material solution containing an alkyl compound is formed into a mist and ejected to a substrate (100) in the atmosphere. Additionally, an oxidizing agent that exerts an oxidizing effect on the alkyl compound is supplied to the mist of the raw material solution. Through the above-described processes, an oxide film is formed on the substrate in the present invention.

    摘要翻译: 本发明提供一种形成氧化膜的方法,其中始终实现氧化膜的正常形成而不受到大气变化的影响,可以形成具有低电阻的金属氧化物膜,并且高效率 获得成膜。 在本发明中,将含有烷基化合物的原料溶液形成为雾状并喷射到大气中的基板(100)上。 另外,向原料溶液的雾中供给对烷基化合物发挥氧化作用的氧化剂。 通过上述工序,在本发明的基板上形成氧化膜。

    Solvent vapor annealing of organic films
    6.
    发明授权
    Solvent vapor annealing of organic films 有权
    有机薄膜的溶剂蒸汽退火

    公开(公告)号:US07829143B1

    公开(公告)日:2010-11-09

    申请号:US10719040

    申请日:2003-11-21

    IPC分类号: C23C16/00 B05D3/04 B05D3/10

    摘要: Organic films can be annealed by exposure to a solvent vapor. The solvent vapor annealing renders the organic film insoluble even in a solvent of a solution from which it was deposited. This enables deposition of two or more organic films in sequence without having one deposition alter an underlying organic film. Devices can be easily fabricated with organic films annealed in this manner when no other solution processing method is possible.

    摘要翻译: 可以通过暴露于溶剂蒸气来退火有机膜。 溶剂蒸气退火使得有机膜即使在其沉积的溶液的溶剂中也不溶。 这使得可以顺序沉积两个或更多个有机膜,而不需要改变下面的有机膜。 当没有其他溶液处理方法可能时,可以以这种方式退火的有机膜容易地制造器件。

    Method and apparatus for treating organosiloxane coating film
    7.
    发明申请
    Method and apparatus for treating organosiloxane coating film 失效
    有机硅氧烷涂膜处理方法及装置

    公开(公告)号:US20060189161A1

    公开(公告)日:2006-08-24

    申请号:US10553191

    申请日:2004-04-20

    申请人: Shingo Hishiya

    发明人: Shingo Hishiya

    IPC分类号: C23C16/00 H01L21/31

    摘要: A method for processing an organosiloxane film includes loading a target substrate (W) with a coating film formed thereon into a reaction chamber (2), and performing a heat process on the target substrate (W) within the reaction chamber (2) to bake the coating film. The coating film contains a polysiloxane base solution having an organic functional group. The heat process includes a temperature setting step of setting an interior of the reaction chamber (2) at a process temperature by heating, and a supplying step of supplying a baking gas into the reaction chamber (2) set at the process temperature, while activating the baking gas by a gas activation section (14) disposed outside the reaction chamber (2).

    摘要翻译: 一种加工有机硅氧烷膜的方法包括将其上形成有涂膜的目标基材(W)加载到反应室(2)中,并对反应室(2)内的目标基材(W)进行热处理以烘烤 涂膜。 涂膜含有具有有机官能团的聚硅氧烷碱溶液。 热处理包括:通过加热将反应室(2)的内部设定在处理温度的温度设定步骤;以及供给步骤,在设定为处理温度的反应室(2)内供给烘烤气体,同时激活 通过设置在反应室(2)外部的气体活化部分(14)来形成烘烤气体。

    Film forming method
    8.
    发明授权
    Film forming method 失效
    成膜方法

    公开(公告)号:US4996076A

    公开(公告)日:1991-02-26

    申请号:US334207

    申请日:1989-03-24

    摘要: The invention concerns a method for forming a coating with excellent adhesion, water resistance and appearance which comprises the combination of steps of applying on the hydrophobic surfaces having a surface tension of 35 dyne/cm or less of a substrate a dry surface treatment selected from vacuum plasma treatment, corona discharge treatment and ozonization treatment, coating thus treated surfaces with a dispersion type aqueous coating composition comprising an aqueous varnish of at least one aqueous resin whose 1 wt % deionized water solution has a surface tension of 51 dyne/cm or less and which has a water tolerance of 4 or more, and water insoluble resin uniformly dispersed in fine particles in said varnish, the water insoluble resin having a SP value which is 1.0 to 2.2 lower than that of said aqueous resin, and baking the coating. The present method is specifically useful in the coating of automobile bodies, appliances and other high-quality products.

    Razor blade coating and method
    9.
    发明授权
    Razor blade coating and method 失效
    剃刀刀片涂层及方法

    公开(公告)号:US4330576A

    公开(公告)日:1982-05-18

    申请号:US925917

    申请日:1978-07-19

    申请人: Charles G. Dodd

    发明人: Charles G. Dodd

    IPC分类号: B05D3/04 B05D3/12 B05D5/08

    摘要: A razor blade having a fluorinated polymer coating over its cutting edge and a method for its preparation. A hydrocarbon polymer is disposed on the cutting edge, which polymer after appropriate sintering is brought into contact with a fluorine-rich atmosphere resulting in replacement of a plurality of hydrogen atoms by fluorine atoms creating a multiplicity of (--CF.sub.2 --CF.sub.2 --) groups.

    摘要翻译: 具有在其切割边缘上的氟化聚合物涂层的剃刀刀片及其制备方法。 碳氢聚合物设置在切削刃上,适当烧结后的聚合物与富含氟的气氛接触,导致多个氢原子被氟原子取代,形成多个(-CF 2 -CF 2 - )基团。