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公开(公告)号：US08634054B2
公开(公告)日：2014-01-21
申请号：US12537728
申请日：2009-08-07
申请人： Yuli Vladimirsky , James H. Walsh
发明人： Yuli Vladimirsky , James H. Walsh
CPC分类号： G01N21/94 , G01N2021/95676 , G03F7/7085 , G03F7/70916
摘要： Systems and methods are provided for inspecting an object surface. An illumination source illuminates the object surface. An optic intercepts scattered light from the illuminated object surface and projects a real image of an area of the object surface. A sensor receives the projected real image. A computer system, coupled to the sensor, stores and analyzes the real image. The real image is processed to detect particles located on the object surface. This arrangement is particularly useful for detecting contaminants or defects on a reticle of a lithography device.
摘要翻译： 提供了用于检查物体表面的系统和方法。 照明源照亮物体表面。 光学器件拦截来自被照射物体表面的散射光并投射物体表面区域的真实图像。 传感器接收投影的真实图像。 耦合到传感器的计算机系统存储和分析真实图像。 处理真实图像以检测位于物体表面上的颗粒。 这种布置对于检测光刻设备的掩模版上的污染物或缺陷特别有用。
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公开(公告)号：US08692977B2
公开(公告)日：2014-04-08
申请号：US13105364
申请日：2011-05-11
申请人： Lev Ryzhikov , Yuli Vladimirsky , James H. Walsh
发明人： Lev Ryzhikov , Yuli Vladimirsky , James H. Walsh
CPC分类号： G03F7/7015 , G01N21/94 , G02B13/04 , G02B13/18 , G03F1/84 , G03F7/7085 , G03F7/70908
摘要： Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more, from an object surface, and produce imagable radiation. The wide angle input lens group is arranged such that no intermediate focused image is formed within or after the wide angle input lens group. The output lens group is configured to receive the imagable radiation from the wide angle input lens group and focus the imagable radiation onto an image plane to image at least part of the object surface. A detector receives the image of the at least part of the object surface and, based on the received image, detects, for example, contamination on the object surface.
摘要翻译： 使用广角光学系统提供用于检查的系统和方法。 光学系统包括广角输入透镜组和输出透镜组。 广角输入透镜组被配置为从物体表面接收例如具有60度或更大角度扩展的广角辐射，并且产生可成像的辐射。 广角输入透镜组被布置成使得在广角输入透镜组之内或之后不形成中间聚焦图像。 输出透镜组被配置为从广角输入透镜组接收可成像的辐射并将可成像的辐射聚焦到图像平面上以对物体表面的至少一部分进行成像。 检测器接收对象表面的至少一部分的图像，并且基于接收到的图像来检测例如物体表面上的污染物。
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3.发明申请Inspection Apparatus Employing Wide Angle Objective Lens With Optical Window 审中-公开使用具有光学窗口的广角物镜的检查装置公开(公告)号：US20110317136A1
公开(公告)日：2011-12-29
申请号：US13083002
申请日：2011-04-08
申请人： Lev Ryzhikov , Yuli Vladimirsky , James H. Walsh
发明人： Lev Ryzhikov , Yuli Vladimirsky , James H. Walsh
CPC分类号： G03F7/70841 , G03F1/84 , G03F7/70808 , G03F7/7085
摘要： An optical window is used to facilitate best performance for imaging an object placed in a separate ambiance. The window can be in a particle detection system, comprising a separator between first and second environments. The separator comprises an opening and an optical element located within the opening. An object is located in the second environment. An objective lens is located in the first environment and a detector is located in the second environment and is configured to detect particles on a surface of the object.
摘要翻译： 使用光学窗口来促进对放置在单独环境中的物体进行成像的最佳性能。 窗口可以在粒子检测系统中，包括在第一和第二环境之间的分离器。 分离器包括开口和位于开口内的光学元件。 一个对象位于第二个环境中。 物镜位于第一环境中，并且检测器位于第二环境中并被配置为检测物体表面上的颗粒。
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公开(公告)号：US20110279805A1
公开(公告)日：2011-11-17
申请号：US13105364
申请日：2011-05-11
申请人： Lev Ryzhikov , Yuli Vladimirsky , James H. Walsh
发明人： Lev Ryzhikov , Yuli Vladimirsky , James H. Walsh
CPC分类号： G03F7/7015 , G01N21/94 , G02B13/04 , G02B13/18 , G03F1/84 , G03F7/7085 , G03F7/70908
摘要： Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more, from an object surface, and produce imageable radiation. The wide angle input lens group is arranged such that no intermediate focused image is formed within or after the wide angle input lens group. The output lens group is configured to receive the imageable radiation from the wide angle input lens group and focus the imageable radiation onto an image plane to image at least part of the object surface. A detector receives the image of the at least part of the object surface and, based on the received image, detects, for example, contamination on the object surface.
摘要翻译： 使用广角光学系统提供用于检查的系统和方法。 光学系统包括广角输入透镜组和输出透镜组。 广角输入透镜组被配置为从物体表面接收例如具有60度或更大角度扩展的广角辐射，并且产生可成像的辐射。 广角输入透镜组被布置成使得在广角输入透镜组之内或之后不形成中间聚焦图像。 输出透镜组被配置为从广角输入透镜组接收可成像的辐射，并将可成像的辐射聚焦到图像平面上以对物体表面的至少一部分进行成像。 检测器接收对象表面的至少一部分的图像，并且基于接收到的图像来检测例如物体表面上的污染物。
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5.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern 有权用于补偿印刷图案的缝合干扰的方法和系统公开(公告)号：US07773199B2
公开(公告)日：2010-08-10
申请号：US12000523
申请日：2007-12-13
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.
摘要翻译： 提供了使用图案形成装置的方法和系统。 示例性方法包括限定表面上的第一区域，第一区域与图案形成装置的第一元件相关联，限定表面上的第二区域，第二区域与图案形成装置的第二元件相关联， 第一元件以暴露所述重叠区域，以及当所述第一元件处于活动状态时停用所述第二元件。 第一区域和第二区域在重叠区域中重叠。
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6.发明申请Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 审中-公开在无掩模光刻系统中补偿印刷图案的缝合干扰的方法和系统，利用曝光区域与重叠区域中的空间图像的衰减重叠公开(公告)号：US20070146672A1
公开(公告)日：2007-06-28
申请号：US11593076
申请日：2006-11-06
IPC分类号： G03B27/54
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译： 提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。 示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。 暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。 然后在重叠区域内的曝光被衰减。
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7.发明申请System and method for reducing disturbances caused by movement in an immersion lithography system 审中-公开用于减少浸没式光刻系统中运动引起的干扰的系统和方法公开(公告)号：US20060044533A1
公开(公告)日：2006-03-02
申请号：US10927394
申请日：2004-08-27
申请人： Lev Ryzhikov , Yuli Vladimirsky
发明人： Lev Ryzhikov , Yuli Vladimirsky
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70258 , G03F7/70341 , G03F7/709
摘要： In an immersion lithography system, a moveable substrate unit is formed from a substrate and at least one optical element, with immersion liquid between them. The immersion liquid and the optical element move in unison with the substrate. Movement of the substrate unit reduces refractive index disturbance produced by turbulence during exposure scans. The projection optical system is enhanced with a dynamic axial compensation group. Elements in the dynamic axial compensation group can move to compensate aberrations caused by deviation of axial symmetry due to movement of the optical element in the substrate unit. The space in the substrate unit filled with immersion liquid may be dynamically controlled to provide proper working distance. If the optical element in the substrate unit has optical power, both resolution and depth of focus may be enhanced. Even if the optical element has no optical power, depth of focus may still be enhanced.
摘要翻译： 在浸没式光刻系统中，可移动基板单元由基板和至少一个光学元件形成，其间具有浸没液体。 浸没液体和光学元件与基底一致地移动。 衬底单元的移动降低了曝光扫描期间由湍流产生的折射率干扰。 投影光学系统通过动态轴向补偿组增强。 动态轴向补偿组中的元件可以移动以补偿由于基板单元中的光学元件的移动引起的轴对称偏差引起的像差。 填充有浸没液体的基板单元中的空间可以被动态地控制以提供适当的工作距离。 如果基板单元中的光学元件具有光学功率，则可以提高分辨率和聚焦深度。 即使光学元件没有光学功率，仍然可以提高焦深。
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8.发明授权Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction 失效通过利用菲涅尔衍射在临界条件附近通过曝光进行超高分辨率光刻成像和印刷和缺陷减少公开(公告)号：US06383697B1
公开(公告)日：2002-05-07
申请号：US09514304
申请日：2000-02-28
IPC分类号： G03C500
CPC分类号： G03F7/70216 , G03F7/70325 , G03F7/7035 , Y10S430/143 , Y10S430/168
摘要： Ultra-high resolution lithographic imaging and printing refers to the reduction in printed feature size, or “demagnification” obtained by the use of “bias”. A new meaning is given to Next Generation Lithography (NGL) in terms of fidelity in the reproduction of masks. Applying the classical manifestation of Fresnel diffraction, the mask pattern features are “demagnified” by “bias”. Classically, bias is minimized but the invention uses it to advantage so that: (i) mask-wafer gaps are thus enlarged; (ii) mask features are enlarged 3×-6× for a given printed feature size (cf. classically 1:1 in proximity lithography); (iii) the technique is extensible to beyond 25 nm feature sizes and (iv) exposure times are reduced. The invention is specifically demonstrated in proximity X-ray lithography but has a generic extension to all lithographies that can use out of focus imaging to produce ultra-high resolution. In consequence of the diffraction, printing defects due to mask faults are reduced including edge roughness, writing errors, diffraction effects at shielded areas and absorber thickness variations. Moreover the exposure doses from mask features of various sizes are controlled by various techniques.
摘要翻译： 超高分辨率平版印刷成像和印刷是指通过使用“偏压”获得的印刷特征尺寸减小或“缩小”。 新一代平版印刷术（NGL）在面具复制方面的保真度有新意义。 应用菲涅耳衍射的经典表现，掩模图案特征通过“偏差”“缩小”。 通常，偏压被最小化，但是本发明使用它有利于：（i）掩模 - 晶片间隙因此被扩大; （ii）对于给定的印刷特征尺寸，掩模特征被放大3×6x（参见邻近光刻中的经典1：1）; （iii）该技术可扩展到超过25nm的特征尺寸，并且（iv）降低曝光时间。 本发明在接近X射线光刻技术中被具体证明，但是具有可以使用离焦成像以产生超高分辨率的所有平版印刷术的通用扩展。 由于衍射，由于掩模故障引起的印刷缺陷减少，包括边缘粗糙度，写入误差，屏蔽区域的衍射效应和吸收体厚度变化。 此外，各种尺寸的掩模特征的曝光剂量由各种技术控制。
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公开(公告)号：US08681313B2
公开(公告)日：2014-03-25
申请号：US12921559
申请日：2009-04-03
CPC分类号： G03F9/7011 , G03F9/7076
摘要： A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered reflector stack is provided. The diffractive elements are configured to enhance a pre-determined diffraction order used for pre-alignment and to diffract light in a pre-determined direction of a pre-alignment system when illuminated with light of a wavelength used for the pre-alignment. The diffractive elements may occupy at least half of an area of each alignment feature. The diffractive elements may be configured to enhance first or higher order diffractions, while substantially reducing zeroth diffraction orders and specular reflection when illuminated with a wavelength used for reticle prealignment. The dimensions of each diffractive element may be a function of a diffraction grating period of each alignment feature.
摘要翻译： 一种图案形成装置，包括具有由多个衍射元件形成的对准特征的对准目标，每个衍射元件包括吸收体堆叠和多层反射器叠层。 衍射元件被配置为当用用于预对准的波长的光照射时，增强用于预对准的预定衍射级并且在预对准系统的预定方向上衍射光。 衍射元件可以占据每个对准特征的面积的至少一半。 衍射元件可以被配置为增强第一或更高阶衍射，同时当用用于掩模版预对准的波长照射时，基本上减少了零级衍射级和镜面反射。 每个衍射元件的尺寸可以是每个对准特征的衍射光栅周期的函数。
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公开(公告)号：US20110019173A1
公开(公告)日：2011-01-27
申请号：US12921559
申请日：2009-04-03
CPC分类号： G03F9/7011 , G03F9/7076
摘要： A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered reflector stack is provided. The diffractive elements are configured to enhance a pre-determined diffraction order used for pre-alignment and to diffract light in a pre-determined direction of a pre-alignment system when illuminated with light of a wavelength used for the pre-alignment. The diffractive elements may occupy at least half of an area of each alignment feature. The diffractive elements may be configured to enhance first or higher order diffractions, while substantially reducing zeroth diffraction orders and specular reflection when illuminated with a wavelength used for reticle prealignment. The dimensions of each diffractive element may be a function of a diffraction grating period of each alignment feature.
摘要翻译： 一种图案形成装置，包括具有由多个衍射元件形成的对准特征的对准目标，每个衍射元件包括吸收体堆叠和多层反射器叠层。 衍射元件被配置为当用用于预对准的波长的光照射时，增强用于预对准的预定衍射级并且在预对准系统的预定方向上衍射光。 衍射元件可以占据每个对准特征的面积的至少一半。 衍射元件可以被配置为增强第一或更高阶衍射，同时当用用于掩模版预对准的波长照射时，基本上减少了零级衍射级和镜面反射。 每个衍射元件的尺寸可以是每个对准特征的衍射光栅周期的函数。
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