GROUP III NITRIDE-BASED MONOLITHIC MICROWAVE INTEGRATED CIRCUITS HAVING MULTI-LAYER METAL-INSULATOR-METAL CAPACITORS

    公开(公告)号:US20230291367A1

    公开(公告)日:2023-09-14

    申请号:US17688952

    申请日:2022-03-08

    Abstract: Semiconductor devices are provided that include a Group III nitride-based semiconductor layer structure. A first metal layer is formed on an upper surface of the semiconductor layer structure, a first dielectric layer is formed on an upper surface of the first metal layer, and a second metal layer is formed on an upper surface of the first dielectric layer. The first metal layer, the first dielectric layer and the second metal layer form a first capacitor. A second dielectric layer is formed on an upper surface of the second metal layer, a third dielectric layer is formed on an upper surface of the second dielectric layer, and a third metal layer is formed on upper surfaces of the second and third dielectric layers. The second metal layer, the second dielectric layer and the third metal layer form a second capacitor that is stacked on the first capacitor.

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