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公开(公告)号：US10030317B2
公开(公告)日：2018-07-24
申请号：US14517217
申请日：2014-10-17
IPC分类号： C30B15/06 , C30B15/14 , C30B15/22 , C30B15/26 , C30B29/64 , C30B11/00 , C30B15/00 , C30B29/06
摘要： An apparatus may include a crucible configured to contain the melt, the melt having an exposed surface separated from a floor of the crucible by a first distance, a housing comprising a material that is non-contaminating to the melt, the housing comprising a plurality of sidewalls and a top that are configured to contact the melt, and a plurality of heating elements isolated from the melt and disposed along a transverse direction perpendicular to a pulling direction of the crystalline sheet, the plurality of heating elements being individually powered, wherein the plurality of heating elements are disposed at a second set of distances from the exposed surface of the melt that are less than the first distance, and wherein the plurality of heating elements are configured to vary a heat flux profile along the transverse direction when power is supplied individually to the plurality of heating elements.
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公开(公告)号：US20180047864A1
公开(公告)日：2018-02-15
申请号：US14226991
申请日：2014-03-27
发明人： Peter L. Kellerman , Brian Mackintosh , Frederick M. Carlson , David Morrell , Ala Moradian , Nandish Desai , Dawei Sun , Frank Sinclair
CPC分类号： C30B15/06 , C30B15/00 , C30B15/14 , C30B15/20 , C30B29/06 , C30B35/00 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A crystallizer for growing a crystalline sheet from a melt may include a cold block having a cold block surface that faces an exposed surface of the melt, the cold block configured to generate a cold block temperature at the cold block surface that is lower than a melt temperature of the melt at the exposed surface. The system may also include a nozzle disposed within the cold block and configured to deliver a gas jet to the exposed surface, wherein the gas jet and the cold block are interoperative to generate a process zone that removes heat from the exposed surface at a first heat removal rate that is greater than a second heat removal rate from the exposed surface in outer regions outside of the process zone.
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公开(公告)号：US09957636B2
公开(公告)日：2018-05-01
申请号：US14226991
申请日：2014-03-27
发明人： Peter L. Kellerman , Brian Mackintosh , Frederick M. Carlson , David Morrell , Ala Moradian , Nandish Desai , Dawei Sun , Frank Sinclair
CPC分类号： C30B15/06 , C30B15/00 , C30B15/14 , C30B15/20 , C30B29/06 , C30B35/00 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A crystallizer for growing a crystalline sheet from a melt may include a cold block having a cold block surface that faces an exposed surface of the melt, the cold block configured to generate a cold block temperature at the cold block surface that is lower than a melt temperature of the melt at the exposed surface. The system may also include a nozzle disposed within the cold block and configured to deliver a gas jet to the exposed surface, wherein the gas jet and the cold block are interoperative to generate a process zone that removes heat from the exposed surface at a first heat removal rate that is greater than a second heat removal rate from the exposed surface in outer regions outside of the process zone.
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公开(公告)号：US09587324B2
公开(公告)日：2017-03-07
申请号：US14275770
申请日：2014-05-12
IPC分类号： C30B11/14 , C30B15/06 , F27B14/06 , F27B14/14 , C30B15/10 , C30B15/14 , C30B29/06 , C30B29/64 , F27B3/02 , F27B3/10 , F27D99/00
CPC分类号： C30B15/06 , C30B15/10 , C30B15/14 , C30B29/06 , C30B29/64 , F27B3/02 , F27B3/10 , F27B14/06 , F27B14/14 , F27D2099/0013 , Y10T117/1048
摘要： An apparatus for processing a melt may include a crucible configured to contain the melt, where the melt has an exposed surface that is separated from a floor of the crucible by a first distance. The apparatus may further include a submerged heater comprising a heating element and a shell disposed between the heating element and the melt, wherein the heating element does not contact the melt. The heating element may be disposed at a second distance with respect to the exposed surface of the melt that is less than the first distance.
摘要翻译： 用于处理熔体的装置可以包括构造成容纳熔体的坩埚，其中熔体具有从坩埚的地板分离第一距离的暴露表面。 该设备还可以包括一个浸没式加热器，其包括加热元件和设置在加热元件和熔体之间的壳体，其中加热元件不接触熔体。 加热元件可以相对于小于第一距离的熔体的暴露表面设置在第二距离处。
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5.发明申请APPARATUS AND METHOD FOR CONTROLLING THICKNESS OF A CRYSTALLINE SHEET GROWN ON A MELT 审中-公开用于控制熔体上形成的晶体薄片的厚度的装置和方法公开(公告)号：US20160108549A1
公开(公告)日：2016-04-21
申请号：US14517217
申请日：2014-10-17
CPC分类号： C30B15/06 , C30B11/001 , C30B11/003 , C30B11/006 , C30B15/002 , C30B15/14 , C30B15/22 , C30B15/26 , C30B29/06 , C30B29/64 , Y10T117/1044 , Y10T117/1048 , Y10T117/1068
摘要： An apparatus may include a crucible configured to contain the melt, the melt having an exposed surface separated from a floor of the crucible by a first distance, a housing comprising a material that is non-contaminating to the melt, the housing comprising a plurality of sidewalls and a top that are configured to contact the melt, and a plurality of heating elements isolated from the melt and disposed along a transverse direction perpendicular to a pulling direction of the crystalline sheet, the plurality of heating elements being individually powered, wherein the plurality of heating elements are disposed at a second set of distances from the exposed surface of the melt that are less than the first distance, and wherein the plurality of heating elements are configured to vary a heat flux profile along the transverse direction when power is supplied individually to the plurality of heating elements.
摘要翻译： 一种装置可以包括：坩埚，其被配置为容纳熔体，所述熔体具有从坩埚的地板分离第一距离的暴露表面;壳体，包括不污染熔体的材料，所述壳体包括多个 侧壁和顶部，其被配置为接触熔体，以及多个加热元件，其与熔体隔离并且沿着垂直于结晶片的拉出方向的横向方向设置，多个加热元件被单独供电，其中多个 的加热元件设置在与熔体的暴露表面小于第一距离的第二组距离处，并且其中多个加热元件构造成在单独供电时沿横向改变热通量分布 到多个加热元件。
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公开(公告)号：US20150322590A1
公开(公告)日：2015-11-12
申请号：US14275770
申请日：2014-05-12
CPC分类号： C30B15/06 , C30B15/10 , C30B15/14 , C30B29/06 , C30B29/64 , F27B3/02 , F27B3/10 , F27B14/06 , F27B14/14 , F27D2099/0013 , Y10T117/1048
摘要： An apparatus for processing a melt may include a crucible configured to contain the melt, where the melt has an exposed surface that is separated from a floor of the crucible by a first distance. The apparatus may further include a submerged heater comprising a heating element and a shell disposed between the heating element and the melt, wherein the heating element does not contact the melt. The heating element may be disposed at a second distance with respect to the exposed surface of the melt that is less than the first distance.
摘要翻译： 用于处理熔体的装置可以包括构造成容纳熔体的坩埚，其中熔体具有从坩埚的地板分离第一距离的暴露表面。 该设备还可以包括一个浸没式加热器，其包括加热元件和设置在加热元件和熔体之间的壳体，其中加热元件不接触熔体。 加热元件可以相对于小于第一距离的熔体的暴露表面设置在第二距离处。
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