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公开(公告)号：US20210130284A1
公开(公告)日：2021-05-06
申请号：US16633466
申请日：2018-07-26
发明人： Jiro HIKIDA , Dai SHIOTA
IPC分类号： C07C231/02 , C07C231/12 , C08G59/50
摘要： An aromatic amine compound capable of satisfactorily forming a cured product having exceptional alkali resistance by reaction with an epoxy compound; a curing agent for an epoxy compound, the curing agent including the aromatic amine compound; a curable composition including the curing agent for an epoxy compound; a cured product of the curable composition; a method for producing the cured product; and a method for producing the abovementioned aromatic amine compound. The aromatic amine compound has a structure such that a specific position in a central skeleton comprising a fused ring such as a fluorene ring is substituted with a side-chain group including two aromatic groups linked by a flexible bond such as an amide bond, at least one amino group is bonded to the end of the side-chain group, and the structure has no hydroxyl groups.
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公开(公告)号：US20190300674A1
公开(公告)日：2019-10-03
申请号：US16362344
申请日：2019-03-22
发明人： Jiro HIKIDA , Kazuya SOMEYA , Koichi MISUMI , Dai SHIOTA
摘要： A hydrogen barrier agent capable of imparting hydrogen barrier performance to various materials; a hydrogen barrier film forming composition including the hydrogen barrier agent; a hydrogen barrier film including the hydrogen barrier agent; a method for producing a hydrogen barrier film, which uses the composition; and an electronic element provided with the hydrogen barrier film. A salt compound having a specific structure including an imidazolyl group is used as the hydrogen barrier agent. The composition is prepared by blending the hydrogen barrier agent into the base material component. The hydrogen barrier film is formed using the hydrogen barrier film forming composition.
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3.发明申请公开(公告)号：US20190094692A1
公开(公告)日：2019-03-28
申请号：US16136717
申请日：2018-09-20
发明人： Tatsuro ISHIKAWA , Naozumi MATSUMOTO , Dai SHIOTA
IPC分类号： G03F7/031 , G03F7/032 , G03F7/075 , G03F7/016 , G03F7/16 , G03F7/26 , C08K3/04 , C08K5/00 , C09B3/14 , C09B23/01
摘要： A photosensitive resin composition which gives a cured film having high light shielding properties and enables stable curing by baking at low temperature, a cured film obtained by curing the composition, a display device provided with the cured film, and a pattern forming method using the composition. A light shielding film-forming process which does not impart thermal damage to a light-emitting element with respect to a substrate provided with a light-emitting element. In a photosensitive resin composition including a binder resin, a photopolymerizable compound, a photopolymerization initiator, a coloring agent, and a thermosetting compound, a carbon black and/or an inorganic black pigment, and an organic pigment are used in combination as the coloring agent, and a photosensitive resin composition in which T2/T1 is 0.80 or more is used.
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4.发明申请公开(公告)号：US20180230330A1
公开(公告)日：2018-08-16
申请号：US15887572
申请日：2018-02-02
发明人： Hideki SAIJO , Hiroyuki KIKUCHI , Jiro HIKIDA , Dai SHIOTA
IPC分类号： C09D179/08 , C08L79/08 , B05D3/00
CPC分类号： C09D179/08 , B05D3/007 , C08G73/1078 , C08L79/08 , G06F1/00 , C08K5/3445 , C08L1/284
摘要： A resin composition resulting in a cured article which is excellent in balance among mechanical strength, surface smoothness, and light transmittance, a method for producing a cured article, a cured article, and a flexible substrate or flexible display including the cured article. The resin composition includes a polyamic acid having a structural unit represented by the following formula (1), a cellulose compound having a weight average molecular weight of 60,000 or less, and an organic solvent. In the formula (1), A is a tetravalent organic group and B is a divalent organic group.
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公开(公告)号：US20180113383A1
公开(公告)日：2018-04-26
申请号：US15791667
申请日：2017-10-24
CPC分类号： G03F7/0755 , C09B5/62 , C09B57/00 , C09B67/0069 , G03F7/0007 , G03F7/027 , G03F7/028 , G03F7/038 , G03F7/105 , G03F7/16 , G03F7/20 , G03F7/26
摘要： A coloring agent dispersion which contains a satisfactorily dispersed pigment, and results in a photosensitive resin composition capable of forming a cured film when mixed in the photosensitive resin composition; a photosensitive resin composition containing the coloring agent dispersion; a cured product of the composition; an organic EL element provided with the cured product; a method for forming a pattern using the composition; and a method for producing a photosensitive resin composition using the dispersion. In a coloring agent dispersion including a coloring agent which contains a pigment and a dispersant, a dispersant containing a silsesquioxane compound of a specific structure is used.
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公开(公告)号：US20170305848A1
公开(公告)日：2017-10-26
申请号：US15506680
申请日：2015-09-25
发明人： Dai SHIOTA , Kunihiro NODA , Hiroki CHISAKA
IPC分类号： C07C381/12 , G03F7/20 , G03F7/039 , G03F7/004 , G03F7/32 , C07C309/06
CPC分类号： C07C381/12 , C07C309/06 , C09K3/00 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/2004 , G03F7/322
摘要： A novel sulfonium salt having high sensitivity with respect to active energy rays, a photoacid generator including the sulfonium salt, and a photosensitive composition containing the photoacid generator. The sulfonium salt is represented by formula (a1). In the formula, R1 and R2 each independently represent the group that is represented by formula (a2) or an alkyl group that may be substituted by a halogen atom, R1 and R2 are bonded to each other and may form a ring with the sulfur atom within the formula, R3 is the group represented by formula (a3) or the group represented by formula (a4), A1 represents S or the like, X− represents a monovalent anion, and R1 and R2 are not both an alkyl group which may be substituted with a halogen atom. In formulas (a2) to (a4), the ring Z1 represents an aromatic hydrocarbon ring, R4, R6, R9, and R10 each represents a specific monovalent group, R5, R7, and R8 each represents a specific divalent group, A2 and A3 each represents S or the like, m1 represents an integer of 0 or more, and n1 and n2 each represent 0 or more.
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公开(公告)号：US20170275223A1
公开(公告)日：2017-09-28
申请号：US15509168
申请日：2015-09-25
发明人： Dai SHIOTA , Kunihiro NODA , Hiroki CHISAKA , Mayumi KUROKO
CPC分类号： C07C43/215 , C07C43/23 , C08F16/26 , C08F16/32 , C08F20/20 , C08F20/30 , C08F216/125 , C08F216/14 , C08F216/1416 , C08F220/30 , C08F220/32 , C08F222/1006 , C08F2216/1425 , C08F2216/1433 , C08F2216/1441 , C08F2216/145 , C08F2220/301 , C08F2220/302 , C08F2220/303 , C08F2220/306 , C08F2220/307 , C08F2220/308 , C08F2220/325 , C08F2222/102
摘要： A transparent body production method that includes subjecting the compound represented by formula (1) to heating at a temperature equal to or greater than the melting point of said compound. In formula (1), each of W1 and W2 is the group represented by formula (2) in which the ring Z is an aromatic hydrocarbon ring, X is a single bond or —S—, R1 is a single bond or an alkylene group having 1-4 carbon atoms, R2 is a specific substituent, and m is an integer of 0 or higher, the group represented by formula (4) is —OH— or a (meth)acryloyloxy group, each of the rings Y1 and Y2 is an aromatic hydrocarbon ring, R is a single bond or a specific divalent group, each of R3a and R3b is —CN, a halogen group, or a monovalent hydrocarbon group, and each of n1 and n2 is an integer of 0-4.
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公开(公告)号：US20230416924A1
公开(公告)日：2023-12-28
申请号：US18334776
申请日：2023-06-14
发明人： Kenichi YAMAUCHI , Kunihiro NODA , Michihito TAKAHASHI , Saeko HARAGUCHI , Atsushi YAMANOUCHI , Dai SHIOTA
IPC分类号： C23C20/08
CPC分类号： C23C20/08
摘要： Provided are a composition for metal oxide film formation, a method for producing the composition for metal oxide film formation, and a method for producing a metal oxide film using the composition for metal oxide film formation, which allow for a decrease in amount of residual metals after washing.
The composition for metal oxide film formation according to an embodiment of the invention contains metal oxide nanoparticles, a capping agent, a polycarboxylic acid compound, and a solvent, wherein the metal oxide nanoparticles have a size of 5 nm or less; the capping agent includes at least one selected from the group consisting of an alkoxysilane, a phenol, an alcohol, a carboxylic acid, and a carboxylic acid halide; at least one of molecular chain(s) linking any two carboxy groups in the polycarboxylic acid compound has a side chain optionally having a heteroatom, and the side chain has an alkyl group; and in the solid content of the composition for metal oxide film formation, the ratio of the mass of inorganic matter is 25% by mass or more.-
9.发明申请公开(公告)号：US20230049429A1
公开(公告)日：2023-02-16
申请号：US17808218
申请日：2022-06-22
摘要： A metal oxide film-forming composition including a tertiary alkyloxycarbonyloxy group-containing aromatic hydrocarbon ring-modified fluorene compound represented by Formula (1) below; metal oxide nanoparticles surface-treated with a capping agent; and a solvent. In the formula, ring Z1 represents an aromatic hydrocarbon ring, R1a and R1b each independently represents a halogen atom, a cyano group, or an alkyl group, R2a and R2b each independently represents an alkyl group, R3a, R3b, R4a, R4b, R5a, and R5b each independently represents an alkyl group having 1 to 8 carbon atoms, k1 and k2 each independently represents an integer of 0 or more and 4 or less, and m1 and m2 each independently represents an integer of 0 or more and 6 or less
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公开(公告)号：US20220274912A1
公开(公告)日：2022-09-01
申请号：US17652005
申请日：2022-02-22
发明人： Kunihiro NODA , Takanori KOBAYASHI , Hiroki KATO , Dai SHIOTA
IPC分类号： C07C69/96 , C01G23/04 , C07C43/303 , C07C39/17
摘要： A metal oxide film-forming containing a tertiary alkyloxycarbonyl group-modified bisnaphthol fluorene compound represented by formula (1), a metal compound represented by formula L(R6)n1(O)n2, and a solvent. In the formulas, ring Z1 represents a naphthalene ring; R1a and R1b represent a halogen atom; R2a and R2b represent an alkyl group; R3a to R5b represent an alkyl group having 1 to 8 carbon atoms; k1 and k2 represent an integer of 0 to 4; m1 and m2 represent an integer of 0 to 6; R6 is OR7; R7 represents an organic group having 1 to 30 carbon atoms; n1 and n2 represent an integer of 0 or larger; and n1+2×n2 represents a valence depending on the type of L; and L represents Al
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