公开(公告)号：US20180158803A1

公开(公告)日：2018-06-07

申请号：US15887242

申请日：2018-02-02

Applicant: Sony Corporation

Inventor： Satoru Wakiyama ,  Masaki Okamoto ,  Yutaka Ooka ,  Reijiroh Shohji ,  Yoshifumi Zaizen ,  Kazunori Nagahata ,  Masaki Haneda

IPC: H01L25/065 ,  H01L27/146 ,  H01L23/48 ,  H01L21/311 ,  H01L23/00 ,  H01L25/00 ,  H01L21/768 ,  H01L21/306

CPC classification number: H01L25/0657 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/76805 ,  H01L21/76877 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/32 ,  H01L24/83 ,  H01L25/50 ,  H01L27/14632 ,  H01L27/14634 ,  H01L27/14636 ,  H01L27/14687 ,  H01L27/1469 ,  H01L2224/32145 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06548 ,  H01L2924/0002 ,  H01L2924/00

Abstract: There is provided a semiconductor device and an electronic apparatus that comprises a semiconductor device, the semiconductor device including a first chip, a second chip that is bonded onto a first surface side of the first chip, a through electrode that is formed to penetrate from a second surface side of the first chip to a second wiring layer on the second semiconductor base substrate, and an insulation layer that is disposed between the through electrode and a semiconductor base substrate in the first chip.

公开(公告)号：US20170069604A1

公开(公告)日：2017-03-09

申请号：US15354871

申请日：2016-11-17

Applicant: Sony Corporation

Inventor： Satoru Wakiyama ,  Masaki Okamoto ,  Yutaka Ooka ,  Reijiroh Shohji ,  Yoshifumi Zaizen ,  Kazunori Nagahata ,  Masaki Haneda

IPC: H01L25/065 ,  H01L27/146 ,  H01L25/00 ,  H01L21/768 ,  H01L21/311 ,  H01L23/48 ,  H01L23/00

CPC classification number: H01L25/0657 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/76805 ,  H01L21/76877 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/32 ,  H01L24/83 ,  H01L25/50 ,  H01L27/14632 ,  H01L27/14634 ,  H01L27/14636 ,  H01L27/14687 ,  H01L27/1469 ,  H01L2224/32145 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06548 ,  H01L2924/0002 ,  H01L2924/00

Abstract: There is provided a semiconductor device and an electronic apparatus that comprises a semiconductor device, the semiconductor device including a first chip, a second chip that is bonded onto a first surface side of the first chip, a through electrode that is formed to penetrate from a second surface side of the first chip to a second wiring layer on the second semiconductor base substrate, and an insulation layer that is disposed between the through electrode and a semiconductor base substrate in the first chip.

Abstract translation: 提供一种包括半导体器件的半导体器件和电子设备，所述半导体器件包括第一芯片，接合到第一芯片的第一表面侧上的第二芯片，形成为从第一芯片穿透的通孔 第一芯片的第二表面侧到第二半导体基底基板上的第二布线层，以及设置在第一芯片中的贯通电极和半导体基板之间的绝缘层。

公开(公告)号：US09524925B2

公开(公告)日：2016-12-20

申请号：US15097093

申请日：2016-04-12

Applicant: Sony Corporation

Inventor： Satoru Wakiyama ,  Masaki Okamoto ,  Yutaka Ooka ,  Reijiroh Shohji ,  Yoshifumi Zaizen ,  Kazunori Nagahata ,  Masaki Haneda

IPC: H01L23/48 ,  H01L21/768 ,  H01L21/306 ,  H01L21/311 ,  H01L23/00 ,  H01L25/00 ,  H01L25/065 ,  H01L27/146

CPC classification number: H01L25/0657 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/76805 ,  H01L21/76877 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/32 ,  H01L24/83 ,  H01L25/50 ,  H01L27/14632 ,  H01L27/14634 ,  H01L27/14636 ,  H01L27/14687 ,  H01L27/1469 ,  H01L2224/32145 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06548 ,  H01L2924/0002 ,  H01L2924/00

Abstract: There is provided a method for manufacturing a semiconductor device including a first semiconductor base substrate, a second semiconductor base substrate that is bonded onto a first surface side of the first semiconductor base substrate, a through electrode that is formed to penetrate from a second surface side of the first semiconductor base substrate to a wiring layer on the second semiconductor base substrate, and an insulation layer that surrounds a circumference of the through electrode formed inside the first semiconductor base substrate.

Abstract translation: 提供一种制造半导体器件的方法，该半导体器件包括：第一半导体基底基板，接合到第一半导体基底基板的第一表面侧上的第二半导体基底基板，形成为从第二表面侧穿透的通孔 第一半导体基底基板的第二半导体基底基板上的布线层，以及围绕形成在第一半导体基板的内部的贯通电极的周围的绝缘层。

公开(公告)号：US11776923B2

公开(公告)日：2023-10-03

申请号：US17180359

申请日：2021-02-19

Applicant: SONY CORPORATION

Inventor： Masaki Haneda

IPC: H01L21/768 ,  H01L23/00 ,  H01L27/14 ,  H01L25/065 ,  H01L27/146 ,  H01L21/3205 ,  H01L23/522 ,  H01L23/532

CPC classification number: H01L24/05 ,  H01L21/3205 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532 ,  H01L24/08 ,  H01L24/80 ,  H01L24/89 ,  H01L25/0657 ,  H01L27/14 ,  H01L27/1469 ,  H01L27/14634 ,  H01L27/14636 ,  H01L24/03 ,  H01L2224/0345 ,  H01L2224/0346 ,  H01L2224/03616 ,  H01L2224/05007 ,  H01L2224/0566 ,  H01L2224/05082 ,  H01L2224/05147 ,  H01L2224/05181 ,  H01L2224/05186 ,  H01L2224/05618 ,  H01L2224/05639 ,  H01L2224/05655 ,  H01L2224/05657 ,  H01L2224/0801 ,  H01L2224/08121 ,  H01L2224/08145 ,  H01L2224/08147 ,  H01L2224/80009 ,  H01L2224/80097 ,  H01L2224/80895 ,  H01L2224/80896 ,  H01L2224/80948 ,  H01L2224/80986 ,  H01L2924/0104 ,  H01L2924/01012 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01025 ,  H01L2924/05442 ,  H01L2224/05655 ,  H01L2924/00014 ,  H01L2224/05657 ,  H01L2924/00014 ,  H01L2224/0566 ,  H01L2924/00014 ,  H01L2224/05618 ,  H01L2924/00014 ,  H01L2224/05639 ,  H01L2924/00014 ,  H01L2224/80986 ,  H01L2224/80896 ,  H01L2224/8082

Abstract: Connection pads are formed in interlayer films provided respectively in interconnection layers of a sensor substrate on which a sensor surface having pixels is formed and a signal processing substrate configured to perform signal processing on the sensor substrate to make an electrical connection between the sensor substrate and the signal processing substrate. Then, a metal oxide film is formed between the interlayer films of the sensor substrate and the signal processing substrate, between the connection pad formed on a side toward the sensor substrate and the interlayer film on a side toward the signal processing substrate, and between the connection pad formed on the side toward the signal processing substrate and the interlayer film on the side toward the sensor substrate. The present technology can be applied to a laminated-type CMOS image sensor, for example.

公开(公告)号：US11063020B2

公开(公告)日：2021-07-13

申请号：US16521215

申请日：2019-07-24

Applicant: Sony Corporation

Inventor： Satoru Wakiyama ,  Masaki Okamoto ,  Yutaka Ooka ,  Reijiroh Shohji ,  Yoshifumi Zaizen ,  Kazunori Nagahata ,  Masaki Haneda

IPC: H01L25/065 ,  H01L21/768 ,  H01L27/146 ,  H01L23/48 ,  H01L21/306 ,  H01L25/00 ,  H01L21/311 ,  H01L23/00

Abstract: There is provided a semiconductor device a method for manufacturing a semiconductor device, and an electronic apparatus that comprises a semiconductor device, the semiconductor device including a first chip, a second chip that is bonded onto a first surface side of the first chip, a through electrode that is formed to penetrate from a second surface side of the first chip to a wiring layer on the second semiconductor base substrate, and an insulation layer that is disposed between the through electrode and a semiconductor base substrate in the first chip.

公开(公告)号：US20150179546A1

公开(公告)日：2015-06-25

申请号：US14409634

申请日：2013-06-19

Applicant: SONY CORPORATION

Inventor： Satoru Wakiyama ,  Masaki Okamoto ,  Yutaka Ooka ,  Reijiroh Shohji ,  Yoshifumi Zaizen ,  Kazunori Nagahata ,  Masaki Haneda

IPC: H01L23/48 ,  H01L21/306 ,  H01L21/768 ,  H01L25/065 ,  H01L25/00

CPC classification number: H01L25/0657 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/76805 ,  H01L21/76877 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/32 ,  H01L24/83 ,  H01L25/50 ,  H01L27/14632 ,  H01L27/14634 ,  H01L27/14636 ,  H01L27/14687 ,  H01L27/1469 ,  H01L2224/32145 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06548 ,  H01L2924/0002 ,  H01L2924/00

Abstract: There is provided a semiconductor device including a first semiconductor base substrate, a second semiconductor base substrate that is bonded onto a first surface side of the first semiconductor base substrate, a through electrode that is formed to penetrate from a second surface side of the first semiconductor base substrate to a wiring layer on the second semiconductor base substrate, and an insulation layer that surrounds a circumference of the through electrode formed inside the first semiconductor base substrate.

Abstract translation: 提供了一种半导体器件，其包括第一半导体基底基板，接合到第一半导体基底基板的第一表面侧的第二半导体基底基板，形成为从第一半导体基板的第二表面侧穿透的通孔 基底基板连接到第二半导体基底基板上的布线层，以及包围形成在第一半导体基底基板内部的贯通电极的周围的绝缘层。

公开(公告)号：US10373934B2

公开(公告)日：2019-08-06

申请号：US15887242

申请日：2018-02-02

Applicant: Sony Corporation

Inventor： Satoru Wakiyama ,  Masaki Okamoto ,  Yutaka Ooka ,  Reijiroh Shohji ,  Yoshifumi Zaizen ,  Kazunori Nagahata ,  Masaki Haneda

IPC: H01L23/48 ,  H01L25/065 ,  H01L27/146 ,  H01L21/768 ,  H01L21/306 ,  H01L25/00 ,  H01L21/311 ,  H01L23/00

Abstract: There is provided a semiconductor device and an electronic apparatus that comprises a semiconductor device, the semiconductor device including a first chip, a second chip that is bonded onto a first surface side of the first chip, a through electrode that is formed to penetrate from a second surface side of the first chip to a second wiring layer on the second semiconductor base substrate, and an insulation layer that is disposed between the through electrode and a semiconductor base substrate in the first chip.

公开(公告)号：US09922961B2

公开(公告)日：2018-03-20

申请号：US15354871

申请日：2016-11-17

Applicant: Sony Corporation

Inventor： Satoru Wakiyama ,  Masaki Okamoto ,  Yutaka Ooka ,  Reijiroh Shohji ,  Yoshifumi Zaizen ,  Kazunori Nagahata ,  Masaki Haneda

IPC: H01L23/48 ,  H01L25/065 ,  H01L27/146 ,  H01L21/768 ,  H01L21/306 ,  H01L25/00 ,  H01L21/311 ,  H01L23/00

CPC classification number: H01L25/0657 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/76805 ,  H01L21/76877 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/32 ,  H01L24/83 ,  H01L25/50 ,  H01L27/14632 ,  H01L27/14634 ,  H01L27/14636 ,  H01L27/14687 ,  H01L27/1469 ,  H01L2224/32145 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06548 ,  H01L2924/0002 ,  H01L2924/00

Abstract: There is provided a semiconductor device and an electronic apparatus that comprises a semiconductor device, the semiconductor device including a first chip, a second chip that is bonded onto a first surface side of the first chip, a through electrode that is formed to penetrate from a second surface side of the first chip to a second wiring layer on the second semiconductor base substrate, and an insulation layer that is disposed between the through electrode and a semiconductor base substrate in the first chip.

公开(公告)号：US20160247746A1

公开(公告)日：2016-08-25

申请号：US15097093

申请日：2016-04-12

Applicant: Sony Corporation

Inventor： Satoru Wakiyama ,  Masaki Okamoto ,  Yutaka Ooka ,  Reijiroh Shohji ,  Yoshifumi Zaizen ,  Kazunori Nagahata ,  Masaki Haneda

IPC: H01L23/48 ,  H01L21/306 ,  H01L27/146 ,  H01L23/00 ,  H01L25/00 ,  H01L25/065 ,  H01L21/768 ,  H01L21/311

CPC classification number: H01L25/0657 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/76805 ,  H01L21/76877 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/32 ,  H01L24/83 ,  H01L25/50 ,  H01L27/14632 ,  H01L27/14634 ,  H01L27/14636 ,  H01L27/14687 ,  H01L27/1469 ,  H01L2224/32145 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06548 ,  H01L2924/0002 ,  H01L2924/00

Abstract: There is provided a method for manufacturing a semiconductor device including a first semiconductor base substrate, a second semiconductor base substrate that is bonded onto a first surface side of the first semiconductor base substrate, a through electrode that is formed to penetrate from a second surface side of the first semiconductor base substrate to a wiring layer on the second semiconductor base substrate, and an insulation layer that surrounds a circumference of the through electrode formed inside the first semiconductor base substrate.

Abstract translation: 提供一种制造半导体器件的方法，该半导体器件包括：第一半导体基底基板，接合到第一半导体基底基板的第一表面侧上的第二半导体基底基板，形成为从第二表面侧穿透的通孔 第一半导体基底基板的第二半导体基底基板上的布线层，以及围绕形成在第一半导体基板的内部的贯通电极的周围的绝缘层。

公开(公告)号：US09343392B2

公开(公告)日：2016-05-17

申请号：US14409634

申请日：2013-06-19

Applicant: SONY CORPORATION

Inventor： Satoru Wakiyama ,  Masaki Okamoto ,  Yutaka Ooka ,  Reijiroh Shohji ,  Yoshifumi Zaizen ,  Kazunori Nagahata ,  Masaki Haneda

IPC: H01L51/05 ,  H01L23/48 ,  H01L27/146 ,  H01L21/768 ,  H01L25/065 ,  H01L21/306 ,  H01L25/00

CPC classification number: H01L25/0657 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/76805 ,  H01L21/76877 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/32 ,  H01L24/83 ,  H01L25/50 ,  H01L27/14632 ,  H01L27/14634 ,  H01L27/14636 ,  H01L27/14687 ,  H01L27/1469 ,  H01L2224/32145 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06548 ,  H01L2924/0002 ,  H01L2924/00

Abstract: There is provided a semiconductor device including a first semiconductor base substrate, a second semiconductor base substrate that is bonded onto a first surface side of the first semiconductor base substrate, a through electrode that is formed to penetrate from a second surface side of the first semiconductor base substrate to a wiring layer on the second semiconductor base substrate, and an insulation layer that surrounds a circumference of the through electrode formed inside the first semiconductor base substrate.

Abstract translation: 提供了一种半导体器件，其包括第一半导体基底基板，接合到第一半导体基底基板的第一表面侧的第二半导体基底基板，形成为从第一半导体基板的第二表面侧穿透的通孔 基底基板连接到第二半导体基底基板上的布线层，以及包围形成在第一半导体基底基板内部的贯通电极的周围的绝缘层。