摘要:
In a radiation image read-out apparatus, a stimulable phosphor sheet, on which a radiation image has been stored, is exposed to stimulating rays, which cause the stimulable phosphor sheet to emit light in proportion to the amount of energy stored thereon during its exposure to radiation. The emitted light is detected and photoelectrically converted by a photodetector, and an image signal representing the radiation image is thereby generated by the photodetector. Information corresponding to the amount of energy stored on the stimulable phosphor sheet during its exposure to radiation is inputted from a stored energy amount input device. A light amount adjuster is located in an optical path of the emitted light impinging upon the photodetector in order to adjust the amount of the emitted light impinging upon the photodetector in accordance with the amount of energy stored on the stimulable phosphor sheet, which energy amount is represented by the information having been inputted with the stored energy amount input device.
摘要:
A radiation image read-out method comprises the steps of exposing a stimulable phosphor sheet, on which a radiation image having a background region has been stored, to stimulating rays which cause the stimulable phosphor sheet to emit light in proportion to the amount of energy stored thereon during its exposure to radiation, and detecting the emitted light in order to obtain an image signal representing the radiation image. The shape and location of the background region are determined in advance, and only the area outside of the background region on the stimulable phosphor sheet is exposed to stimulating rays. Light emitted from the area outside of the background region is detected and converted into an image signal. Alternatively, after the shape and location of the background region are determined, the background region is erased. Thereafter, the stimulable phosphor sheet is exposed to stimulating rays, and light emitted by the stimulable phosphor sheet is detected and converted into an image signal.
摘要:
A method for producing a group III-nitride crystal having a large thickness and high quality and a group III-nitride crystal are provided. A method for producing a group III-nitride crystal 13 includes the following steps: A underlying substrate 11 having a major surface 11a tilted toward the direction with respect to the (0001) plane is prepared. The group III-nitride crystal 13 is grown by vapor-phase epitaxy on the major surface 11a of the underlying substrate 11. The major surface 11a of the underlying substrate 11 is preferably a plane tilted at an angle of −5° to 5° from the {01-10} plane.
摘要:
A method for manufacturing a semiconductor device according to the present invention includes the following step: a step (S10) of forming a GaN-based semiconductor layer, a step (S20) of forming an Al film on the GaN-based semiconductor layer, a step (S30, S40) of forming a mask layer composed of a material having a lower etching rate than that of the material constituting the Al film, a step (S50) of partially removing the Al film and the GaN-based semiconductor layer using the mask layer as a mask to form a ridge portion, a step (S60) of retracting the positions of the side walls at the ends of the Al film from the positions of the side walls of the mask layer, a step (S70) of forming a protection film composed of a material having a lower etching rate than that of the material constituting the Al film on the side surfaces of the ridge portion and on the upper surface of the mask layer, and a step (S80) of removing the Al film to remove the mask layer and the protection film formed on the upper surface of the mask layer.
摘要:
A growing method of a group III nitride semiconductor crystal includes the steps of preparing an underlying substrate, and growing a first group III nitride semiconductor crystal doped with silicon by using silicon tetrachloride (SiCl4) gas as doping gas, on the underlying substrate by vapor phase growth. The growth rate of the first group III nitride semiconductor crystal is at least 200 μm/h and not more than 2000 μm/h.
摘要:
A growing method of a group III nitride semiconductor crystal includes the steps of preparing an underlying substrate, and growing a group III nitride semiconductor crystal doped with silicon by using silicon tetrafluoride gas as doping gas, on the underlying substrate by vapor phase growth.
摘要:
A group III nitride semiconductor crystal substrate has a diameter of at least 25 mm and not more than 160 mm. The resistivity of the group III nitride semiconductor crystal substrate is at least 1×10−4 Ω·m and not more than 0.1 Ω·cm. The resistivity distribution in the diameter direction of the group III nitride semiconductor crystal is at least −30% and not more than 30%. The resistivity distribution in the thickness direction of the group III nitride semiconductor crystal is at least −16% and not more than 16%.
摘要:
A radiological imaging apparatus is provided that includes a radiation source, a radiation detection section that detects radiation that passes through a subject, a signal detection section that detects signals from a plurality of signal generating sections disposed on the radiation detection section in a manner such that each signal generating section is in a different location, a signal comparison section that compares the signals detected by the signal detection section, a positional relationship judgment section that makes a judgment as to whether a positional relationship between the radiation detection section and the radiation source is a predetermined positional relationship based on a comparison result, a position control section that controls a position of at least one of the radiation source and the radiation detection section to maintain the positional relationship as the predetermined positional relationship based on a judgment result, a position control holding section that holds the radiation source and the radiation detection section in the position set by the position control section after the positional relationship is set to the prescribed positional relationship, and a notification section that provides notification in a case where the positional relationship judgment section makes a judgment that the positional relationship is not the prescribed positional relationship during holding.
摘要:
One surface of a stimulable phosphor sheet supported at a position for image recording is exposed to radiation, and a radiation image is stored on the stimulable phosphor sheet. Image readout is performed from the side of the other surface of the stimulable phosphor sheet supported at the position for image recording. Energy remaining on the stimulable phosphor sheet is then released by irradiating erasing light to an entire area of the stimulable phosphor sheet with a sheet-shaped erasing light source, which has uniform transmissivity to radiation and is located close to the one surface of the stimulable phosphor sheet supported at the position for image recording.
摘要:
A stimulable phosphor sheet, on which a radiation image of an object has been stored, is scanned with stimulating rays, which cause the stimulable phosphor sheet to emit light in proportion to the amount of energy stored on the stimulable phosphor sheet during exposure of the stimulable phosphor sheet to radiation. The light, which is emitted by the stimulable phosphor sheet when the stimulable phosphor sheet is scanned with the stimulating rays, is detected, and an image signal representing the radiation image of the object is acquired. The scanning of the stimulable phosphor sheet with the stimulating rays is performed from an object image-carrying edge area, in which a radiation image pattern representing the object has been stored, the object image-carrying edge area being one of edge areas of the stimulable phosphor sheet.