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公开(公告)号:US10957733B2
公开(公告)日:2021-03-23
申请号:US16902318
申请日:2020-06-16
Applicant: Sensors Unlimited, Inc.
Inventor: Wei Zhang , Douglas Stewart Malchow , Michael J. Evans , Wei Huang , Paul L. Bereznycky , Namwoong Paik
IPC: H01L27/146 , H01L25/16 , H01L23/00
Abstract: A method of assembling a photodetector assembly includes depositing bumps on a read out integrated circuit (ROIC) without depositing bumps on a photodiode array (PDA). The method includes assembling the PDA and ROIC together wherein each bump electrically interconnects the ROIC with a respective contact of the PDA. A photodetector assembly includes a PDA. A ROIC is assembled to the PDA, wherein the ROIC is electrically interconnected with the PDA through a plurality of electrically conductive bumps. Each bump is confined within a respective pocket between the ROIC and a respective contact of the PDA. The disclosed methods can enable focal plane array manufacturers to achieve low-cost production of ultra-fine pitch, large format imaging arrays.
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公开(公告)号:US11923470B2
公开(公告)日:2024-03-05
申请号:US17972047
申请日:2022-10-24
Applicant: Sensors Unlimited, Inc.
Inventor: Wei Zhang , Douglas Stewart Malchow , Michael J. Evans , Paul L. Bereznycky , Sean T. Houlihan
IPC: H01L31/0304 , H01L21/304 , H01L21/3065 , H01L31/0232 , H01L31/101 , H01L31/08 , H01L31/18
CPC classification number: H01L31/03046 , H01L21/304 , H01L21/3065 , H01L31/02327 , H01L31/101 , H01L31/1844
Abstract: A method includes forming an assembly of layers including an InP cap layer on an InGaAs absorption region layer, wherein the InGaAs layer is on an n-InP layer, and wherein an underlying substrate layer underlies the n-InP layer. The method includes removing a portion of the InP cap and n-InP layer by dry etching.
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公开(公告)号:US20210104638A1
公开(公告)日:2021-04-08
申请号:US16593793
申请日:2019-10-04
Applicant: Sensors Unlimited, Inc.
Inventor: Wei Zhang , Douglas Stewart Malchow , Michael J. Evans , Paul L. Bereznycky , Sean T. Houlihan
IPC: H01L31/0304 , H01L31/18 , H01L31/0232 , H01L31/101 , H01L21/3065 , H01L21/304
Abstract: A method includes forming an assembly of layers including an InP cap layer on an InGaAs absorption region layer, wherein the InGaAs layer is on an n-InP layer, and wherein an underlying substrate layer underlies the n-InP layer. The method includes removing a portion of the InP cap and n-InP layer by dry etching.
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公开(公告)号:US20230050990A1
公开(公告)日:2023-02-16
申请号:US17972047
申请日:2022-10-24
Applicant: Sensors Unlimited, Inc.
Inventor: Wei Zhang , Douglas Stewart Malchow , Michael J. Evans , Paul L. Bereznycky , Sean T. Houlihan
IPC: H01L31/0304 , H01L21/304 , H01L21/3065 , H01L31/0232 , H01L31/101 , H01L31/18
Abstract: A method includes forming an assembly of layers including an InP cap layer on an InGaAs absorption region layer, wherein the InGaAs layer is on an n-InP layer, and wherein an underlying substrate layer underlies the n-InP layer. The method includes removing a portion of the InP cap and n-InP layer by dry etching.
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公开(公告)号:US20200052012A1
公开(公告)日:2020-02-13
申请号:US16057191
申请日:2018-08-07
Applicant: Sensors Unlimited, Inc.
Inventor: Wei Zhang , Michael J. Evans , Douglas Stewart Malchow , Paul L. Bereznycky , Namwoong Paik
IPC: H01L27/146
Abstract: A method of forming an array of photodiodes includes forming a cap layer on a surface of an absorption layer. The method includes forming a plurality of spaced apart pixel diffusion areas in the cap layer. The method includes forming a mesa trench with opposed sidewalls through the cap layer, wherein the mesa trench surrounds each of the pixel diffusion areas separating the pixel diffusion areas from one another. The method includes forming a sidewall passivation layer over the sidewalls of the mesa trench and removing a portion of the sidewall passivation layer to expose a respective contact electrically connected to each of the pixel diffusion areas, but leaving the sidewalls of the mesa trench covered with the sidewall passivation layer wherein the contact is open and uncovered for electrical connection.
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公开(公告)号:US20230307398A1
公开(公告)日:2023-09-28
申请号:US17704341
申请日:2022-03-25
Applicant: Sensors Unlimited, Inc.
Inventor: Wei Huang , Sungjin Kim , Paul L. Bereznycky , Michael J. Evans , De Hsin Chang , Wei Zhang
IPC: H01L23/00
CPC classification number: H01L24/13 , H01L24/14 , H01L24/81 , H01L24/16 , H01L2224/13005 , H01L2224/13014 , H01L2224/1403 , H01L2224/16225 , H01L2224/81201
Abstract: A system includes a die with a first plurality of hybridization bumps extending therefrom, electrically connected to circuitry die. An external circuitry component with a second plurality of hybridization bumps extending therefrom, electrically connected to circuitry in the external circuitry component. The first plurality of hybridization bumps and the second plurality of hybridization bumps are pressed together for electrical communication between the die and the external circuitry component. The first plurality of hybridization bumps have a different material hardness from the second plurality of hybridization bumps. The first plurality of hybridization bumps have a different bump diameter from that of the second plurality of hybridization bumps.
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公开(公告)号:US20200312900A1
公开(公告)日:2020-10-01
申请号:US16902318
申请日:2020-06-16
Applicant: Sensors Unlimited, Inc.
Inventor: Wei Zhang , Douglas Stewart Malchow , Michael J. Evans , Wei Huang , Paul L. Bereznycky , Namwoong Paik
IPC: H01L27/146 , H01L23/00 , H01L25/16
Abstract: A method of assembling a photodetector assembly includes depositing bumps on a read out integrated circuit (ROIC) without depositing bumps on a photodiode array (PDA). The method includes assembling the PDA and ROIC together wherein each bump electrically interconnects the ROIC with a respective contact of the PDA. A photodetector assembly includes a PDA. A ROIC is assembled to the PDA, wherein the ROIC is electrically interconnected with the PDA through a plurality of electrically conductive bumps. Each bump is confined within a respective pocket between the ROIC and a respective contact of the PDA. The disclosed methods can enable focal plane array manufacturers to achieve low-cost production of ultra-fine pitch, large format imaging arrays.
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公开(公告)号:US10727267B2
公开(公告)日:2020-07-28
申请号:US16129402
申请日:2018-09-12
Applicant: Sensors Unlimited, Inc.
Inventor: Wei Zhang , Douglas Stewart Malchow , Michael J. Evans , Wei Huang , Paul L. Bereznycky , Namwoong Paik
IPC: H01L27/146 , H01L25/16 , H01L23/488 , H01L23/00
Abstract: A method of assembling a photodetector assembly includes depositing bumps on a read out integrated circuit (ROIC) without depositing bumps on a photodiode array (PDA). The method includes assembling the PDA and ROIC together wherein each bump electrically interconnects the ROIC with a respective contact of the PDA. A photodetector assembly includes a PDA. A ROIC is assembled to the PDA, wherein the ROIC is electrically interconnected with the PDA through a plurality of electrically conductive bumps. Each bump is confined within a respective pocket between the ROIC and a respective contact of the PDA. The disclosed methods can enable focal plane array manufacturers to achieve low-cost production of ultra-fine pitch, large format imaging arrays.
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公开(公告)号:US20200083272A1
公开(公告)日:2020-03-12
申请号:US16129402
申请日:2018-09-12
Applicant: Sensors Unlimited, Inc.
Inventor: Wei Zhang , Douglas Stewart Malchow , Michael J. Evans , Wei Huang , Paul L. Bereznycky , Namwoong Paik
IPC: H01L27/146 , H01L23/00
Abstract: A method of assembling a photodetector assembly includes depositing bumps on a read out integrated circuit (ROIC) without depositing bumps on a photodiode array (PDA). The method includes assembling the PDA and ROIC together wherein each bump electrically interconnects the ROIC with a respective contact of the PDA. A photodetector assembly includes a PDA. A ROIC is assembled to the PDA, wherein the ROIC is electrically interconnected with the PDA through a plurality of electrically conductive bumps. Each bump is confined within a respective pocket between the ROIC and a respective contact of the PDA. The disclosed methods can enable focal plane array manufacturers to achieve low-cost production of ultra-fine pitch, large format imaging arrays.
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