Three-dimensional semiconductor memory device and method of manufacturing the same

    公开(公告)号:US11145671B2

    公开(公告)日:2021-10-12

    申请号:US16511698

    申请日:2019-07-15

    Abstract: A three-dimensional semiconductor memory device is provided. The memory device includes a substrate with a cell array region and a connection region adjacent to the cell array region, the connection region including a first pad region and a second pad region; an electrode structure including electrodes stacked on the substrate, the electrode structure including an upper portion forming an upper staircase structure; a first dummy structure laterally spaced apart from the upper portion of the electrode structure and provided on the first pad region; and a second dummy structure laterally spaced apart from the upper portion of the electrode structure and provided on the second pad region. Each of the first dummy structure and the second dummy structure includes a dummy staircase structure, and the first dummy structure is located at higher level than the second dummy structure.

    Three-dimensional semiconductor memory devices and methods of fabricating the same

    公开(公告)号:US10971516B2

    公开(公告)日:2021-04-06

    申请号:US16294425

    申请日:2019-03-06

    Abstract: Integrated circuit devices and methods of forming the same are provided. The devices may include a substrate including a cell region and an extension region and conductive layers stacked on the cell region in a vertical direction. The conductive layers may extend onto the extension region and may have a stair-step structure on the extension region. The devices may also include vertical structures on the substrate. Each of the vertical structures may extend in the vertical direction, and the vertical structures may include a first vertical structure on the cell region and a second vertical structure on the extension region. The first vertical structure may extend through the conductive layers and may include a first channel layer, the second vertical structure may be in the stair-step structure and may include a second channel layer, and the second channel layer may be spaced apart from the substrate in the vertical direction.

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