Three-dimensional semiconductor memory device

    公开(公告)号:US11664361B2

    公开(公告)日:2023-05-30

    申请号:US17577647

    申请日:2022-01-18

    Abstract: A three-dimensional semiconductor memory device, including a peripheral circuit structure including a first metal pad and a cell array structure disposed on the peripheral circuit structure and including a second metal pad. The peripheral circuit structure may include a first substrate including a first peripheral circuit region and a second peripheral circuit region, first contact plugs, second contact plugs, and a first passive device on and electrically connected to the second contact plugs. The cell array structure may include a second substrate disposed on the peripheral circuit structure, the second substrate including a cell array region and a contact region. The cell array structure may further include gate electrodes and cell contact plugs. The first passive device is vertically between the gate electrodes and the second contact plugs and includes a first contact line. The first metal pad and the second metal pad may be connected by bonding manner.

    Three-dimensional semiconductor memory device

    公开(公告)号:US11233042B2

    公开(公告)日:2022-01-25

    申请号:US16850493

    申请日:2020-04-16

    Abstract: A three-dimensional semiconductor memory device, including a first chip and a second chip stacked on the first chip may be provided. The first chip may include a first substrate including a first peripheral circuit region and a second peripheral circuit region, first contact plugs, and second contact plugs, and a passive device on and electrically connected to the second contact plugs. The second chip may include a second substrate including a cell array region and a contact region, which vertically overlap the second peripheral circuit region and the first peripheral circuit region of the first chip, respectively. The second chip may further include gate electrodes, and cell contact plugs disposed on the contact region of the second substrate and on end portions of the gate electrodes. The first passive device may be vertically between the gate electrodes and the second contact plugs and may include a first contact line.

    Three-dimensional semiconductor memory device

    公开(公告)号:US11233043B2

    公开(公告)日:2022-01-25

    申请号:US17002149

    申请日:2020-08-25

    Abstract: A three-dimensional semiconductor memory device, including a peripheral circuit structure including a first metal pad and a cell array structure disposed on the peripheral circuit structure and including a second metal pad. The peripheral circuit structure may include a first substrate including a first peripheral circuit region and a second peripheral circuit region, first contact plugs, second contact plugs, and a first passive device on and electrically connected to the second contact plugs. The cell array structure may include a second substrate disposed on the peripheral circuit structure, the second substrate including a cell array region and a contact region. The cell array structure may further include gate electrodes and cell contact plugs. The first passive device is vertically between the gate electrodes and the second contact plugs and includes a first contact line. The first metal pad and the second metal pad may be connected by bonding manner.

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