Method of manufacturing a display substrate using two etch masks
    5.
    发明授权
    Method of manufacturing a display substrate using two etch masks 有权
    使用两个蚀刻掩模制造显示器基板的方法

    公开(公告)号:US09418861B2

    公开(公告)日:2016-08-16

    申请号:US14455771

    申请日:2014-08-08

    Abstract: Provided are a display substrate, a display device, and a method of manufacturing the display substrate. The display substrate includes: a substrate in which a pixel region is defined; a gate electrode and a gate pad are formed on the substrate; a gate insulating layer formed on the gate electrode and the gate pad; a buffer layer pattern overlaps the gate electrode and is formed on the gate insulating layer; an insulating film pattern formed on the buffer layer pattern; an oxide semiconductor pattern formed on the insulating film pattern; a source electrode formed on the oxide semiconductor pattern; and a drain electrode formed on the oxide semiconductor pattern and is separated from the source electrode.

    Abstract translation: 提供了显示基板,显示装置和制造显示基板的方法。 显示基板包括:限定像素区域的基板; 在基板上形成栅电极和栅极焊盘; 形成在栅极电极和栅极焊盘上的栅极绝缘层; 缓冲层图案与栅电极重叠并形成在栅极绝缘层上; 形成在缓冲层图案上的绝缘膜图案; 形成在所述绝缘膜图案上的氧化物半导体图案; 形成在所述氧化物半导体图案上的源电极; 以及形成在氧化物半导体图案上并与源电极分离的漏电极。

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