MULTI-FUNCTIONAL APPARATUS FOR TESTING AND ETCHING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
    1.
    发明申请
    MULTI-FUNCTIONAL APPARATUS FOR TESTING AND ETCHING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME 审中-公开
    用于测试和蚀刻基板和基板处理装置的多功能装置

    公开(公告)号:US20140182785A1

    公开(公告)日:2014-07-03

    申请号:US13902698

    申请日:2013-05-24

    Abstract: A multi-functional apparatus for testing and etching a substrate capable of increasing spatial efficiency and manufacturing efficiency by performing testing and etching operations in a same chamber body and a substrate processing apparatus including the same, the multi-functional apparatus including a chamber body having an entrance into which the substrate is injected in one of its sides and an exit from which the substrate is ejected in another one of its sides; a transfer unit disposed inside of the chamber body and for transferring the injected substrate in a direction from the entrance to the exit; a laser etching unit disposed on an upper portion of the transfer unit and for etching a part of the substrate disposed on the transfer unit; and a testing unit for testing the substrate disposed on the transfer unit.

    Abstract translation: 一种用于测试和蚀刻基板的多功能设备,其能够通过在相同的室主体中进行测试和蚀刻操作来提高空间效率和制造效率,以及包括其的基板处理设备,所述多功能设备包括具有 基板在其一侧注入基板的入口和基板在其另一侧排出的出口; 传送单元,设置在所述室主体的内部,并用于沿着从所述入口到所述出口的方向传送所述注入的基板; 激光蚀刻单元,设置在所述转印单元的上部并用于蚀刻设置在所述转印单元上的所述基板的一部分; 以及用于测试设置在转印单元上的基板的测试单元。

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