公开(公告)号：US20170069807A1

公开(公告)日：2017-03-09

申请号：US15357000

申请日：2016-11-21

Applicant: Samsung Display Co., Ltd.

Inventor： Young Do KIM ,  Jin Ho JU ,  Min KANG ,  Woo Sub SHIM

IPC: H01L33/58 ,  H01L27/15 ,  H01L33/50 ,  C09K11/06

CPC classification number: H01L33/58 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1025 ,  G02B5/201 ,  H01L27/156 ,  H01L33/504 ,  H05B33/14

Abstract: Provided is a color filter array panel. The color filter array panel according to exemplary embodiments of the present invention includes: a substrate; a color filter disposed on the substrate and including a colorant including at least one of a pigment and a dye, and a solid fluorescent material; and a light source unit supplying light to the color filter, in which the solid fluorescent material is an aggregation induced emission enhancement (AIEE) material of which a liquid state is solidified to increase fluorescence efficiency.

Abstract translation: 提供了一种滤色器阵列面板。 根据本发明的示例性实施例的滤色器阵列面板包括：基板; 滤色片，其设置在所述基板上，并且包括着色剂，所述着色剂包括颜料和染料中的至少一种和固体荧光材料; 以及向滤色器供给光的光源单元，其中固体荧光材料是液态固化的聚集诱发发射增强（AIEE）材料，以提高荧光效率。

公开(公告)号：US20160099263A1

公开(公告)日：2016-04-07

申请号：US14950904

申请日：2015-11-24

Applicant: Samsung Display Co., Ltd.

Inventor： Min KANG ,  Jong Kwang LEE ,  Sang Hee JANG ,  Jin Ho JU

IPC: H01L27/12

CPC classification number: H01L27/1248 ,  H01L27/1218 ,  H01L27/1262 ,  H01L27/3279

Abstract: Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value.

Abstract translation: 提供了显示装置和显示装置的制造方法。 显示装置包括经受一次预处理的基板; 形成在基板上并进行二次预处理的导体; 以及形成在所述基板和所述导体上的绝缘层，其中对所述第一基板的表面能进行高于第一参考值的所述初步预处理，并且对于所述导体的表面能进行二次预处理，所述表面能低于第二基准 参考值。

公开(公告)号：US20160097972A1

公开(公告)日：2016-04-07

申请号：US14794079

申请日：2015-07-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Bongyeon KIM ,  Min KANG ,  Yong SON ,  Hyunjoo LEE ,  Myounggeun CHA ,  Jinho JU

IPC: G03F1/26 ,  G03F7/20

CPC classification number: H01L21/0268 ,  G03F1/30 ,  G03F7/0043 ,  G03F7/20 ,  H01L21/02532 ,  H01L21/02678

Abstract: Provided is a method of manufacturing a display apparatus, the method including forming an amorphous silicon layer on a substrate; changing amorphous silicon in the amorphous silicon layer into crystalline silicon by irradiating the amorphous silicon with a laser beam emitted through a phase shift mask; and forming a display device, the phase shift mask including a base substrate; a barrier layer on the base substrate and including a plurality of transmissive portions which are spaced apart from each other in a first direction; and phase shift portions which alternately fill the plurality of transmissive portions in the first direction.

Abstract translation: 提供一种制造显示装置的方法，所述方法包括在基板上形成非晶硅层; 通过用通过相移掩模发射的激光束照射非晶硅，将非晶硅层中的非晶硅变成晶体硅; 以及形成显示装置，所述相移掩模包括基底基板; 在所述基底基板上的阻挡层，并且包括在第一方向上彼此间隔开的多个透射部; 以及在第一方向交替地填充多个透射部的相移部。

公开(公告)号：US20140162177A1

公开(公告)日：2014-06-12

申请号：US14180234

申请日：2014-02-13

Applicant: Samsung Display Co., Ltd.

Inventor： Bong-Yeon KIM ,  Min KANG ,  Jeong Won KIM ,  Jin Ho JU ,  Jun Hyuk WOO ,  Hyun Joo LEE

IPC: G03F1/38

CPC classification number: G03F1/32 ,  G03F1/38

Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%.

Abstract translation: 提供了用于形成图案的光学掩模。 光掩模包括：基板，其包括形成在基板的部分上的遮光图案，其中遮光图案包括形成在半色调层上的半色调层和遮光层，并且半色调层和遮光层与该重叠部分重叠 至少露出半色调层的边缘部分。 遮光图案的间距可以为约6μm，并且网版层的透射率可以在约10％至约50％的范围内。

公开(公告)号：US20250104654A1

公开(公告)日：2025-03-27

申请号：US18761503

申请日：2024-07-02

Applicant: Samsung Display Co., LTD.

Inventor： Keuk Jin JEONG ,  Won Gyun KIM ,  Ji Hoon YANG ,  Min KANG

IPC: G09G3/3291

Abstract: A display device includes: a light emitting element; a driving voltage line transmitting a driving voltage signal having an active level or a non-active level in a preset period; a data line to which a data signal is applied; a first transistor connected between the driving voltage line and the light emitting element; and a second transistor connected to the driving voltage line and the data line, where a gate electrode of the second transistor is connected to the driving voltage line, and a source electrode of the second transistor is connected to the data line.

公开(公告)号：US20150226897A1

公开(公告)日：2015-08-13

申请号：US14572937

申请日：2014-12-17

Applicant: Samsung Display Co., Ltd.

Inventor： Tae-Woo KIM ,  Cheol-Kyu KIM ,  Min KANG ,  Min-Hyuck KANG ,  Bong-Yeon KIM ,  Seung-Won PARK ,  Moon-Gyu LEE

IPC: G02B5/30

CPC classification number: G02B5/3058 ,  B82Y20/00 ,  G02B5/3041 ,  Y10S977/762

Abstract: A display device includes a reflective polarizer plate including a first substrate defining an opening area and a non-opening area, and a wire grid polarizer which is disposed on a surface of the first substrate and includes a polarizing part including a plurality of nano wire patterns which is arranged in the opening area to be spaced apart from each other, and a reflecting part including a metal film provided in the non-opening area.

Abstract translation: 一种显示装置，包括：反射偏振板，包括限定开口区域和非开口区域的第一基板;以及线栅偏振器，其设置在所述第一基板的表面上，并且包括偏振部件，所述偏振部件包括多个纳米线图案 其布置在彼此间隔开的开口区域中，以及反射部分，其包括设置在非开口区域中的金属膜。

公开(公告)号：US20150212422A1

公开(公告)日：2015-07-30

申请号：US14677823

申请日：2015-04-02

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jeong Won KIM ,  Jin Ho JU ,  Jong Kwang LEE ,  Min KANG ,  Tae Gyun KIM

IPC: G03F7/40 ,  G02F1/1343 ,  G03F7/30

CPC classification number: G03F7/40 ,  G02F1/134309 ,  G02F1/13439 ,  G03F7/0226 ,  G03F7/023 ,  G03F7/30

Abstract: A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.

Abstract translation: 形成图案的方法包括通过将感光性树脂组合物涂布在基板上来形成感光膜，通过包含透光区域和非透光区域的掩模将感光膜曝光，将显影液涂布在 感光性膜，通过烘烤感光性膜形成感光性膜图案，其中，感光性树脂组合物含有碱溶性基础树脂，光致酸产生剂和光活性化合物。

公开(公告)号：US20140127612A1

公开(公告)日：2014-05-08

申请号：US13856477

申请日：2013-04-04

Applicant: Industry-Academic Cooperation Foundation, Yonsei University ,  SAMSUNG DISPLAY CO., LTD.

Inventor： Min KANG ,  Bong-Yeon KIM ,  Jeong Won KIM ,  Hyang-Shik KONG ,  Jin Ho JU ,  Kyoung Sik KIM ,  Seung Hwa BAEK ,  Jun Hyuk WOO ,  Hyun Joo LEE

IPC: G03F1/38 ,  G03F7/20

CPC classification number: G03F1/38 ,  G03F1/50

Abstract: A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.

Abstract translation: 用于曝光的光掩模包括：透明基板; 位于所述透明基板上的遮光图案层; 位于所述遮光图案层上并包括电介质材料的第一电介质层; 以及负折射率层，其位于所述第一电介质层上并且包括金属。 用于曝光的光掩模的表面等离子体激元准结合模式与将光照射到光掩模进行曝光的光曝光器的光源的波长范围重叠。

公开(公告)号：US20130316270A1

公开(公告)日：2013-11-28

申请号：US13835567

申请日：2013-03-15

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Bong-Yeon KIM ,  Min KANG ,  Seung-Bo SHIM ,  Jong-kwang LEE ,  Jin-Ho JU ,  Jeong-Won KIM ,  Tae-Gyun KIM ,  Chul-Won PARK ,  Jun-Hyuk WOO ,  Hyun-Joo LEE

IPC: G03F1/42

CPC classification number: G03F1/42

Abstract: A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.

Abstract translation: 掩模可以包括电路区域和像素区域。 电路区域包括电路图案。 像素区域包括在长度方向上延伸的像素图案和处于像素图案的端部并且与电路区域相邻的辅助图案。

公开(公告)号：US20130122428A1

公开(公告)日：2013-05-16

申请号：US13652911

申请日：2012-10-16

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jong-Kwang LEE ,  Min KANG ,  Jin-Ho JU ,  Bong-Yeon KIM

IPC: G03F7/20 ,  G03B27/72

CPC classification number: G03F7/70575 ,  G03F1/30 ,  G03F7/70283

Abstract: An exposure system includes an exposure apparatus and a phase shift mask. The exposure apparatus emits a multi-wavelength light including a plurality of wavelengths different from each other. The phase shift mask includes a transparent substrate and a light blocking layer. The transparent substrate includes a first surface, and a second surface opposite to the first surface. The multi-wavelength light is incident into the first surface. The transparent substrate further includes a recess which extends from the second surface toward the first surface. The light blocking layer includes a first opening which exposes the second surface of the transparent substrate, and a second opening which is spaced apart from the first opening and exposes the recess of the transparent substrate.

Abstract translation: 曝光系统包括曝光装置和相移掩模。 曝光装置发射包括彼此不同的多个波长的多波长光。 相移掩模包括透明基板和遮光层。 透明基板包括第一表面和与第一表面相对的第二表面。 多波长光入射到第一表面。 透明基板还包括从第二表面朝向第一表面延伸的凹槽。 遮光层包括暴露透明基板的第二表面的第一开口和与第一开口间隔开并暴露透明基板的凹部的第二开口。