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    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
    1.
    发明申请
    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    显示装置及其制造方法

    公开(公告)号：US20150255493A1

    公开(公告)日：2015-09-10

    申请号：US14604480

    申请日：2015-01-23

    Applicant: Samsung Display Co., Ltd.

    Inventor： Seung-Bo SHIM ,  Bong-Yeon KIM ,  Jun-hyuk WOO ,  Jeong-Won KIM ,  Kwang-Woo PARK

    IPC: H01L27/12 ,  G03F1/26

    CPC classification number: H01L27/1288 ,  G03F1/26 ,  G03F1/32 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/1248

    Abstract: A display device includes a substrate comprising a display area and a non-display area. A gate line and a data line are disposed on the substrate. A thin film transistor is disposed on the display area and coupled to the gate line and the data line. A pad is disposed in the non-display area. A passivation layer is disposed on the thin film transistor and the pad. A pixel electrode is coupled to the thin film transistor. The passivation layer has a thickness that is smaller in the non-display area than in the display area, and the passivation layer has a thickness of about 0.1 μm to about 1 μm in the non-display area.

    Abstract translation: 显示装置包括包括显示区域和非显示区域的基板。 栅极线和数据线设置在基板上。 薄膜晶体管设置在显示区域上并耦合到栅极线和数据线。 在非显示区域中设置垫。 钝化层设置在薄膜晶体管和衬垫上。 像素电极耦合到薄膜晶体管。 钝化层的非显示区域的厚度比在显示区域中的厚度小，在非显示区域中钝化层的厚度为约0.1μm至约1μm。

    EXPOSURE SYSTEM, METHOD OF FORMING PATTERN USING THE SAME AND METHOD OF MANUFACTURING DISPLAY SUBSTRATE USING THE SAME
    2.
    发明申请
    EXPOSURE SYSTEM, METHOD OF FORMING PATTERN USING THE SAME AND METHOD OF MANUFACTURING DISPLAY SUBSTRATE USING THE SAME 有权
    曝光系统，使用其形成图案的方法和使用其制造显示器基板的方法

    公开(公告)号：US20130122428A1

    公开(公告)日：2013-05-16

    申请号：US13652911

    申请日：2012-10-16

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Jong-Kwang LEE ,  Min KANG ,  Jin-Ho JU ,  Bong-Yeon KIM

    IPC: G03F7/20 ,  G03B27/72

    CPC classification number: G03F7/70575 ,  G03F1/30 ,  G03F7/70283

    Abstract: An exposure system includes an exposure apparatus and a phase shift mask. The exposure apparatus emits a multi-wavelength light including a plurality of wavelengths different from each other. The phase shift mask includes a transparent substrate and a light blocking layer. The transparent substrate includes a first surface, and a second surface opposite to the first surface. The multi-wavelength light is incident into the first surface. The transparent substrate further includes a recess which extends from the second surface toward the first surface. The light blocking layer includes a first opening which exposes the second surface of the transparent substrate, and a second opening which is spaced apart from the first opening and exposes the recess of the transparent substrate.

    Abstract translation: 曝光系统包括曝光装置和相移掩模。 曝光装置发射包括彼此不同的多个波长的多波长光。 相移掩模包括透明基板和遮光层。 透明基板包括第一表面和与第一表面相对的第二表面。 多波长光入射到第一表面。 透明基板还包括从第二表面朝向第一表面延伸的凹槽。 遮光层包括暴露透明基板的第二表面的第一开口和与第一开口间隔开并暴露透明基板的凹部的第二开口。

    OPTICAL MASK FOR FORMING PATTERN
    3.
    发明申请
    OPTICAL MASK FOR FORMING PATTERN 有权
    用于形成图案的光学掩模

    公开(公告)号：US20140162177A1

    公开(公告)日：2014-06-12

    申请号：US14180234

    申请日：2014-02-13

    Applicant: Samsung Display Co., Ltd.

    Inventor： Bong-Yeon KIM ,  Min KANG ,  Jeong Won KIM ,  Jin Ho JU ,  Jun Hyuk WOO ,  Hyun Joo LEE

    IPC: G03F1/38

    CPC classification number: G03F1/32 ,  G03F1/38

    Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%.

    Abstract translation: 提供了用于形成图案的光学掩模。 光掩模包括：基板，其包括形成在基板的部分上的遮光图案，其中遮光图案包括形成在半色调层上的半色调层和遮光层，并且半色调层和遮光层与该重叠部分重叠 至少露出半色调层的边缘部分。 遮光图案的间距可以为约6μm，并且网版层的透射率可以在约10％至约50％的范围内。

    MASK AND MANUFACTURING METHOD FOR LIQUID CRYSTAL DISPLAY USING THE SAME
    4.
    发明申请
    MASK AND MANUFACTURING METHOD FOR LIQUID CRYSTAL DISPLAY USING THE SAME 审中-公开
    使用该液晶显示器的屏蔽和制造方法

    公开(公告)号：US20160216602A1

    公开(公告)日：2016-07-28

    申请号：US14819270

    申请日：2015-08-05

    Applicant: Samsung Display Co., Ltd.

    Inventor： Seong Woon CHOI ,  Min KANG ,  Jong Hyeok RYU ,  Sung-Mo KANG ,  Keun Ha KIM ,  Bong-Yeon KIM ,  Soon Young KIM ,  In Ho KIM ,  Soo Jin PARK ,  Yong SON ,  Min Jee LEE ,  Yun ku JUNG ,  Hye Ran JEONG ,  Chung Heon HAN

    IPC: G03F1/50 ,  G02F1/1339 ,  G02F1/1362

    CPC classification number: G02F1/13394 ,  G02F1/1303 ,  G02F1/136286 ,  G02F2001/13396 ,  G02F2001/136295

    Abstract: A mask including: a transparent substrate and a light blocking layer thereon. The transparent substrate includes a first transmitting portion and a second transmitting portion each configured to pass light, and a light blocking portion configured to block light. The first transmitting portion includes a first transmitting region configured to pass light and a first light blocking region configured to block light, and area centers of the first transmitting region and the first light blocking region substantially coincide. The second transmitting portion includes a second transmitting region configured to pass light and a second light blocking region configured to block light, and area centers of the second transmitting region and the second light blocking region substantially coincide, so that the first transmitting portion is configured to pass light of a greater intensity and the second transmitting portion is configured to pass light of a lesser intensity.

    Abstract translation: 一种掩模，包括：透明基板和遮光层。 透明基板包括：第一透射部分和第二透射部分，每个被配置成使光通过;以及遮光部，被构造成阻挡光。 第一发送部分包括被配置为使光通过的第一发送区域和被配置为阻挡光的第一遮光区域，并且第一发送区域和第一遮光区域的区域中心基本上重合。 第二发送部包括被配置为使光通过的第二发送区域和被配置为阻挡光的第二遮光区域，并且第二发送区域和第二遮光区域的区域中心基本上一致，使得第一发送部分被配置为 通过更大强度的光，并且第二透射部分被配置为通过较小强度的光。

    MANUFACTURING METHOD OF REFLECTIVE POLARIZER PLATE AND DISPLAY DEVICE INCLUDING THE SAME
    6.
    发明申请
    MANUFACTURING METHOD OF REFLECTIVE POLARIZER PLATE AND DISPLAY DEVICE INCLUDING THE SAME 有权
    反射极化板的制造方法和包括其的显示装置

    公开(公告)号：US20150226897A1

    公开(公告)日：2015-08-13

    申请号：US14572937

    申请日：2014-12-17

    Applicant: Samsung Display Co., Ltd.

    Inventor： Tae-Woo KIM ,  Cheol-Kyu KIM ,  Min KANG ,  Min-Hyuck KANG ,  Bong-Yeon KIM ,  Seung-Won PARK ,  Moon-Gyu LEE

    IPC: G02B5/30

    CPC classification number: G02B5/3058 ,  B82Y20/00 ,  G02B5/3041 ,  Y10S977/762

    Abstract: A display device includes a reflective polarizer plate including a first substrate defining an opening area and a non-opening area, and a wire grid polarizer which is disposed on a surface of the first substrate and includes a polarizing part including a plurality of nano wire patterns which is arranged in the opening area to be spaced apart from each other, and a reflecting part including a metal film provided in the non-opening area.

    Abstract translation: 一种显示装置，包括：反射偏振板，包括限定开口区域和非开口区域的第一基板;以及线栅偏振器，其设置在所述第一基板的表面上，并且包括偏振部件，所述偏振部件包括多个纳米线图案 其布置在彼此间隔开的开口区域中，以及反射部分，其包括设置在非开口区域中的金属膜。

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