PHOTORESIST RESIN COMPOSITION AND METHOD OF FORMING PATTERNS BY USING THE SAME
    1.
    发明申请
    PHOTORESIST RESIN COMPOSITION AND METHOD OF FORMING PATTERNS BY USING THE SAME 审中-公开
    光催化剂树脂组合物和使用它们形成图案的方法

    公开(公告)号:US20150212422A1

    公开(公告)日:2015-07-30

    申请号:US14677823

    申请日:2015-04-02

    Abstract: A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.

    Abstract translation: 形成图案的方法包括通过将感光性树脂组合物涂布在基板上来形成感光膜,通过包含透光区域和非透光区域的掩模将感光膜曝光,将显影液涂布在 感光性膜,通过烘烤感光性膜形成感光性膜图案,其中,感光性树脂组合物含有碱溶性基础树脂,光致酸产生剂和光活性化合物。

    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
    2.
    发明申请
    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    显示装置及其制造方法

    公开(公告)号:US20160099263A1

    公开(公告)日:2016-04-07

    申请号:US14950904

    申请日:2015-11-24

    CPC classification number: H01L27/1248 H01L27/1218 H01L27/1262 H01L27/3279

    Abstract: Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value.

    Abstract translation: 提供了显示装置和显示装置的制造方法。 显示装置包括经受一次预处理的基板; 形成在基板上并进行二次预处理的导体; 以及形成在所述基板和所述导体上的绝缘层,其中对所述第一基板的表面能进行高于第一参考值的所述初步预处理,并且对于所述导体的表面能进行二次预处理,所述表面能低于第二基准 参考值。

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