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    LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
    4.
    发明申请
    LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    液晶显示装置及其制造方法

    公开(公告)号：US20160291394A1

    公开(公告)日：2016-10-06

    申请号：US14977179

    申请日：2015-12-21

    Applicant: Samsung Display Co., Ltd

    Inventor： Lei Xie ,  Dae Ho YOON ,  Hyeong Gyu JANG

    IPC: G02F1/1333 ,  G02F1/1341 ,  G02F1/1335 ,  G02F1/1337

    CPC classification number: G02F1/133377 ,  G02F2001/133776 ,  G02F2202/36

    Abstract: A liquid crystal display device according to an exemplary embodiment of the present disclosure includes: a substrate; a thin film transistor disposed on the substrate; a pixel electrode connected to the thin film transistor; a first alignment layer disposed on the pixel electrode; a second alignment layer spaced apart from the first alignment layer by microcavities; and a roof layer disposed on the second alignment layer, in which the first alignment layer comprises a nano structure pattern layer.

    Abstract translation: 根据本公开的示例性实施例的液晶显示装置包括：基板; 设置在所述基板上的薄膜晶体管; 连接到薄膜晶体管的像素电极; 设置在像素电极上的第一取向层; 通过微腔与第一取向层间隔开的第二取向层; 以及设置在所述第二取向层上的屋顶层，其中所述第一取向层包括纳米结构图案层。

    Polarizing plate, TFT substrate including the polarizing plate, and method of manufacturing the polarizing plate
    6.
    发明授权
    Polarizing plate, TFT substrate including the polarizing plate, and method of manufacturing the polarizing plate 有权
    偏光板，包括偏光板的TFT基板以及偏光板的制造方法

    公开(公告)号：US09470829B2

    公开(公告)日：2016-10-18

    申请号：US14691216

    申请日：2015-04-20

    Applicant: Samsung Display Co., Ltd.

    Inventor： Tae Woo Kim ,  Seung Won Park ,  Lei Xie ,  Dae ho Yoon ,  Moon Gyu Lee

    IPC: G02B5/30 ,  H01L27/12

    CPC classification number: G02B5/3058 ,  H01L27/1218 ,  H01L27/124 ,  H01L29/42384 ,  H01L29/78633

    Abstract: A polarizing plate includes a substrate and a conductive pattern layer including a first pattern and a second pattern. The first pattern includes line-shaped structures disposed at intervals with a period shorter than a wavelength of incident light to be isolated from one another, the first pattern configured to transmit first polarized light of the incident light therethrough and reflect second polarized light of the incident light that is perpendicular to the first polarized light. The second pattern is disposed on an outer boundary of the first pattern, the second pattern isolated and insulated from the first pattern, the second pattern including a stem and at least one branch protruding from the stem toward the first pattern.

    Abstract translation: 偏振板包括基板和包括第一图案和第二图案的导电图案层。 第一图案包括以比入射光的波长短的间隔设置的彼此隔离的线状结构，第一图案被配置为透射入射光的第一偏振光并反射入射的第二偏振光 垂直于第一偏振光的光。 第二图案设置在第一图案的外边界上，第二图案与第一图案隔离并绝缘，第二图案包括杆和至少一个从杆朝向第一图案突出的分支。

    Method of forming a fine pattern
    7.
    发明授权
    Method of forming a fine pattern 有权
    形成精细图案的方法

    公开(公告)号：US09365933B2

    公开(公告)日：2016-06-14

    申请号：US14718127

    申请日：2015-05-21

    Applicant: Samsung Display Co., Ltd.

    Inventor： Jung-Ha Son ,  Su-Bin Bae ,  Yu-Gwang Jeong ,  Lei Xie ,  Yun-Jong Yeo ,  Joo-Hyung Lee

    IPC: C23F1/02 ,  H01L21/033 ,  G03F7/00

    CPC classification number: G03F7/0002 ,  C23F1/02 ,  G02F1/133536 ,  G02F2001/133548 ,  G02F2202/36 ,  H01L21/0337 ,  H01L21/32139

    Abstract: A method of forming a fine pattern includes providing a first metal layer on a base substrate, providing a first passivation layer on the first metal layer, providing a mask pattern on the first passivation layer, providing a partitioning wall pattern having a reverse taper shape by etching the first passivation layer, coating a composition having a block copolymer between the partitioning wall patterns adjacent each other, providing a self-aligned pattern by heating the composition, and providing a metal pattern by etching the first metal layer using the self-aligned pattern as a mask.

    Abstract translation: 形成精细图案的方法包括在基底基板上提供第一金属层，在第一金属层上提供第一钝化层，在第一钝化层上提供掩模图案，通过以下步骤提供具有倒锥形的分隔壁图案： 蚀刻第一钝化层，在彼此相邻的分隔壁图案之间涂覆具有嵌段共聚物的组合物，通过加热组合物提供自对准图案，以及通过使用自对准图案蚀刻第一金属层来提供金属图案 作为面具。

    Method of manufacturing wire grid polarizer
    8.
    发明授权
    Method of manufacturing wire grid polarizer 有权
    制造线栅偏振器的方法

    公开(公告)号：US09268075B1

    公开(公告)日：2016-02-23

    申请号：US14678506

    申请日：2015-04-03

    Applicant: Samsung Display Co. Ltd.

    Inventor： Dae Ho Yoon ,  Seung Won Park ,  Moon Gyu Lee ,  Tae Woo Kim ,  Lei Xie

    IPC: G02B5/30 ,  G02B5/18

    CPC classification number: G02B5/3058 ,  G02B5/1809 ,  G02B5/30 ,  G02B5/3075 ,  G03F7/0002

    Abstract: Provided is a method of manufacturing a wire gird polarizer. The method includes sequentially stacking a conductive wire layer and a first neutral layer, forming guide patterns, reducing widths of the guide patterns and patterning the first neutral layer, forming a second neutral layer, applying a first block copolymer, arranging the first block copolymer as a first monomer block and a second monomer block, removing one of the first monomer block and the second monomer block, removing the second neutral layer exposed, removing the remaining monomer block and the guide patterns, applying a second block copolymer, arranging the second block copolymer as a third monomer block and a fourth monomer block, removing one of the third monomer block and the fourth monomer block, and patterning the conductive wire layer to thereby form conductive wire patterns.

    Abstract translation: 提供一种制造线状偏振器的方法。 该方法包括顺序堆叠导线层和第一中性层，形成引导图案，减小引导图案的宽度和图案化第一中性层，形成第二中性层，施加第一嵌段共聚物，将第一嵌段共聚物设置为 第一单体嵌段和第二单体嵌段，除去第一单体嵌段和第二单体嵌段之一，除去暴露的第二中性层，除去剩余的单体嵌段和引导图案，施加第二嵌段共聚物，将第二嵌段 共聚物作为第三单体嵌段和第四单体嵌段，除去第三单体嵌段和第四单体嵌段之一，并对导线层进行图案化从而形成导线图案。

    Patterning method and method of manufacturing wire grid polarizer using the same
    10.
    发明授权
    Patterning method and method of manufacturing wire grid polarizer using the same 有权

    公开(公告)号：US09952366B2

    公开(公告)日：2018-04-24

    申请号：US14628985

    申请日：2015-02-23

    Applicant: Samsung Display Co. Ltd.

    Inventor： Min Hyuck Kang ,  Eun Ae Kwak ,  Lei Xie ,  Moon Gyu Lee ,  Hyeong Gyu Jang

    IPC: G03F7/00 ,  G02B5/30

    CPC classification number: G02B5/3058 ,  G03F7/0002

    Abstract: A patterning method includes forming guide layer patterns, which are separated from each other, on a top surface of a base substrate, forming a neutral layer, which includes a random copolymer comprising first blocks or second blocks, on an entirety of the top surface of the base substrate exposed between the guide layer patterns, forming hydrophobic layer patterns which extend from top surfaces of the guide layer patterns to side surfaces of the guide layer patterns and are separated from each other, coating a block copolymer, which comprises the first blocks and the second blocks, on a top surface of the neutral layer exposed between the hydrophobic layer patterns, alternately arranging the first blocks and the second blocks by heat-treating or solvent-annealing the block copolymer, and forming block copolymer patterns by removing the first blocks or the second blocks.

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