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公开(公告)号：US20180348635A1
公开(公告)日：2018-12-06
申请号：US16039341
申请日：2018-07-19
Applicant: Samsung Display Co., Ltd.
Inventor： Min Hyuck Kang , Eun Ae Kwak , Dong Eon Lee , Gug Rae Jo
CPC classification number: G03F7/0751 , C07F7/1804 , C07F7/1872 , C23F1/00 , C23F1/02 , G02B5/3058 , G03F7/0002 , Y02P20/582
Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.
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公开(公告)号：US09903991B2
公开(公告)日：2018-02-27
申请号：US14623708
申请日：2015-02-17
Applicant: Samsung Display Co., Ltd.
Inventor： Eun Ae Kwak , Min Hyuck Kang , Moon Gyu Lee
IPC: G02B5/30 , C09K13/00 , C23F4/00 , H01L21/308 , G02F1/1335 , H01L21/3065 , B81C1/00 , G03F7/004 , H01L21/306
CPC classification number: G02B5/3058 , B81C1/00388 , B81C1/00404 , B81C2201/0149 , C09K13/00 , C23F4/00 , G02F2001/133548 , G03F7/0041 , H01L21/30604 , H01L21/3065 , H01L21/3081 , H01L21/3083 , H01L21/3086 , H01L21/3088
Abstract: A method of fabricating a wire grid polarizer includes sequentially depositing a conductive wire pattern layer, and a plurality of guide patterns which forms one or more trenches therebetween on the conductive wire pattern layer, hydrophobically treating surfaces of the conductive wire pattern layer exposed in the trenches, and the guide patterns, coating the hydrophobically treated conductive wire pattern layer in the trenches with a neutral layer to partially fill the trenches, filling a remainder of the trenches with a block copolymer of two monomers with different etching rates, aligning the block copolymer filled in the trenches, selectively removing blocks of one monomer among the two monomers from the aligned block copolymer, and patterning the conductive wire pattern layer by using blocks of the other monomer among the two monomers remaining in the trenches and the guide patterns as a mask.
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公开(公告)号：US20190146130A1
公开(公告)日：2019-05-16
申请号：US16189448
申请日：2018-11-13
Applicant: Samsung Display Co., Ltd.
Inventor： Eun Ae Kwak , Min Uk Kim , Jun Ho Song , Young Je Cho
Abstract: A reflective display and method of manufacturing reflective display device, the reflective display device including a first substrate, a polarization layer disposed on the first substrate and including a plurality of wire patterns, and a photonic crystal unit including a plurality of nanopatterns arranged over the first substrate at predetermined pitches. As a result, a reflective display device may provide an excellent contrast ratio and an excellent color reproducibility.
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公开(公告)号：US10048530B1
公开(公告)日：2018-08-14
申请号：US15871551
申请日：2018-01-15
Applicant: Samsung Display Co., Ltd.
Inventor： Min Uk Kim , Eun Ae Kwak , Sung Man Kim , Jun Ho Song
IPC: G02F1/1335
Abstract: A display device may include: a substrate; a transparent partition wall disposed on the substrate, the transparent partition configured to define a plurality of openings; a light-shielding member disposed on a top surface and side surfaces of the transparent partition wall, the light-shielding member including a negative photosensitive organic material; and a first color conversion pattern disposed in at least on of the plurality of openings, the first color conversion pattern including a quantum dot material or a fluorescent material.
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公开(公告)号：US09488765B2
公开(公告)日：2016-11-08
申请号：US14924423
申请日：2015-10-27
Applicant: Samsung Display Co. Ltd.
Inventor： Min Hyuck Kang , Hyeong Gyu Jang , Eun Ae Kwak , Moon Gyu Lee
CPC classification number: G02B5/3058 , H01L27/124
Abstract: A wire grid polarizer includes a substrate, and a plurality of wire patterns which is arranged on the substrate at periodic intervals, where the wire patterns include first wire patterns, which are disposed on the substrate, and one or more second wire patterns, which are disposed on one or more of the first wire patterns each of the second wire patterns including at least one of a neutral pattern, a surface treatment pattern and first and second monomer block patterns.
Abstract translation: 线栅偏振器包括基板和以周期性间隔布置在基板上的多个线图案，其中布线图案包括设置在基板上的第一布线图案和一个或多个第二布线图案， 布置在一个或多个第一线图案中，每个第二线图包括中性图案，表面处理图案和第一和第二单体块图案中的至少一个。
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Patent Agency Ranking
公开(公告)号：US10732503B2
公开(公告)日：2020-08-04
申请号：US16039341
申请日：2018-07-19
Applicant: Samsung Display Co., Ltd.
Inventor： Min Hyuck Kang , Eun Ae Kwak , Dong Eon Lee , Gug Rae Jo
Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.
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公开(公告)号：US10509150B2
公开(公告)日：2019-12-17
申请号：US15871186
申请日：2018-01-15
Applicant: Samsung Display Co., Ltd.
Inventor： Eun Ae Kwak , Min Hyuck Kang , Moon Gyu Lee
IPC: G02F1/1335 , G02B5/30
Abstract: A method of fabricating a wire grid polarizer includes sequentially depositing a conductive wire pattern layer, and a plurality of guide patterns which forms one or more trenches therebetween on the conductive wire pattern layer, hydrophobically treating surfaces of the conductive wire pattern layer exposed in the trenches, and the guide patterns, coating the hydrophobically treated conductive wire pattern layer in the trenches with a neutral layer to partially fill the trenches, filling a remainder of the trenches with a block copolymer of two monomers with different etching rates, aligning the block copolymer filled in the trenches, selectively removing blocks of one monomer among the two monomers from the aligned block copolymer, and patterning the conductive wire pattern layer by using blocks of the other monomer among the two monomers remaining in the trenches and the guide patterns as a mask.
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公开(公告)号：US09952366B2
公开(公告)日：2018-04-24
申请号：US14628985
申请日：2015-02-23
Applicant: Samsung Display Co. Ltd.
Inventor： Min Hyuck Kang , Eun Ae Kwak , Lei Xie , Moon Gyu Lee , Hyeong Gyu Jang
CPC classification number: G02B5/3058 , G03F7/0002
Abstract: A patterning method includes forming guide layer patterns, which are separated from each other, on a top surface of a base substrate, forming a neutral layer, which includes a random copolymer comprising first blocks or second blocks, on an entirety of the top surface of the base substrate exposed between the guide layer patterns, forming hydrophobic layer patterns which extend from top surfaces of the guide layer patterns to side surfaces of the guide layer patterns and are separated from each other, coating a block copolymer, which comprises the first blocks and the second blocks, on a top surface of the neutral layer exposed between the hydrophobic layer patterns, alternately arranging the first blocks and the second blocks by heat-treating or solvent-annealing the block copolymer, and forming block copolymer patterns by removing the first blocks or the second blocks.
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公开(公告)号：US10042256B2
公开(公告)日：2018-08-07
申请号：US15168665
申请日：2016-05-31
Applicant: Samsung Display Co., Ltd.
Inventor： Min Hyuck Kang , Eun Ae Kwak , Dong Eon Lee , Gug Rae Jo
Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.
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公开(公告)号：US10005100B2
公开(公告)日：2018-06-26
申请号：US15348305
申请日：2016-11-10
Applicant: Samsung Display Co., Ltd.
Inventor： Eun Ae Kwak , Min Hyuck Kang , Gug Rae Jo
IPC: B05D3/00 , B05D1/00 , B05D3/12 , G02B5/30 , G02F1/1335 , G02F1/1368 , H01L27/12 , H01L29/786
CPC classification number: B05D3/007 , B05D1/005 , B05D3/12 , G02B5/3058 , G02F1/133528 , G02F1/1368 , G02F2001/133548 , H01L27/1222 , H01L29/66765 , H01L29/66969 , H01L29/78603 , H01L29/78633 , H01L29/78678
Abstract: A method of forming fine patterns includes the steps of forming a conductive layer on a base part, forming a sacrificial layer including an adhesive material on the conductive layer, the adhesive material including a catechol group, forming resist patterns on the sacrificial layer, and forming fine patterns by patterning the conductive layer using the resist patterns as a mask.
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