PLASMA MONITORING APPARATUS AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20230130913A1

    公开(公告)日:2023-04-27

    申请号:US17859623

    申请日:2022-07-07

    Abstract: A plasma monitoring apparatus includes a flow control portion including a first port through which an emission light emitted from a plasma is introduced or discharged, and a second port through which the emission light emitted from the plasma is introduced or discharged and has a shape different from a shape of the first port, a transparent glass window extended to the flow control portion and passing an emission light, and a spectroscopic apparatus optically connected to the transparent glass window through an optical fiber and detecting an intensity of the emission light.

    SUBSTRATE AND DISPLAY DEVICE INCLUDING THE SAME

    公开(公告)号:US20200161404A1

    公开(公告)日:2020-05-21

    申请号:US16595357

    申请日:2019-10-07

    Abstract: A display device includes: a substrate having a first surface, a second surface opposite to the first surface, and an inner side surface defining through holes; a first wiring and a second wiring disposed on the first surface; and a first conductor and a second conductor disposed in one of the through holes. The first conductor is connected to the first wiring, the second conductor is connected to the second wiring, and the first and second conductors are insulated from each other.

    CHEMICAL VAPOR DEPOSITION SYSTEM
    8.
    发明申请

    公开(公告)号:US20180340258A1

    公开(公告)日:2018-11-29

    申请号:US15990051

    申请日:2018-05-25

    Abstract: A chemical vapor deposition (CVD) system may include a chamber, a susceptor provided in the chamber to support a substrate, a gas distribution part provided over the susceptor, a first ground strap bar provided on a down-side surface of the chamber and electrically connected to the chamber, a second ground strap bar provided on a bottom surface of the susceptor and electrically connected to the susceptor, and a plurality of ground straps electrically connected to the first and second ground strap bars, each of the plurality of ground straps including two opposite portions that are fastened to the first and second ground strap bars, respectively.

    VAPOR DEPOSITION APPARATUS AND METHOD
    9.
    发明申请
    VAPOR DEPOSITION APPARATUS AND METHOD 审中-公开
    蒸气沉积装置和方法

    公开(公告)号:US20160168707A1

    公开(公告)日:2016-06-16

    申请号:US14736337

    申请日:2015-06-11

    Abstract: A vapor deposition apparatus includes a deposition unit having a plurality of nozzle parts sequentially arranged in a first direction and a plurality of exhaustion parts alternately arranged with the plurality of nozzle parts, a substrate mounting unit on which a substrate is mounted and which is reciprocally movable a plurality of times below the deposition unit along a straight line parallel to the first direction, and a control unit that controls movement of the substrate mounting unit. A start point of a reciprocal movement of the substrate mounting unit is variable for each reciprocal movement.

    Abstract translation: 一种蒸镀装置,具备:具有沿着第一方向依次排列的多个喷嘴部和与上述多个喷嘴部交替配置的多个排气部的沉积部,具备基板安装部的基板安装部, 沿着与第一方向平行的直线沉积单元下方多次;以及控制单元,其控制基板安装单元的移动。 基板安装单元的往复移动的起始点对于每个往复运动是可变的。

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